DK93587A - Fotonuklear transmutationsdoping af halvledere - Google Patents

Fotonuklear transmutationsdoping af halvledere

Info

Publication number
DK93587A
DK93587A DK093587A DK93587A DK93587A DK 93587 A DK93587 A DK 93587A DK 093587 A DK093587 A DK 093587A DK 93587 A DK93587 A DK 93587A DK 93587 A DK93587 A DK 93587A
Authority
DK
Denmark
Prior art keywords
dopping
semiconductors
photonuclear
transmutation
photonuclear transmutation
Prior art date
Application number
DK093587A
Other languages
English (en)
Other versions
DK93587D0 (da
Inventor
David James Sorley Findlay
Original Assignee
Atomic Energy Authority Uk
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Atomic Energy Authority Uk filed Critical Atomic Energy Authority Uk
Publication of DK93587D0 publication Critical patent/DK93587D0/da
Publication of DK93587A publication Critical patent/DK93587A/da

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/26Bombardment with radiation
    • H01L21/261Bombardment with radiation to produce a nuclear reaction transmuting chemical elements

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • High Energy & Nuclear Physics (AREA)
  • Power Engineering (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Computer Hardware Design (AREA)
  • Manufacturing & Machinery (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Chemical & Material Sciences (AREA)
  • General Chemical & Material Sciences (AREA)
  • Toxicology (AREA)
  • Health & Medical Sciences (AREA)
  • Particle Accelerators (AREA)
  • Silicon Compounds (AREA)
  • Led Device Packages (AREA)
  • Luminescent Compositions (AREA)
  • Crystals, And After-Treatments Of Crystals (AREA)
DK093587A 1986-02-25 1987-02-24 Fotonuklear transmutationsdoping af halvledere DK93587A (da)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
GB868604583A GB8604583D0 (en) 1986-02-25 1986-02-25 Photonuclear doping of semiconductors

Publications (2)

Publication Number Publication Date
DK93587D0 DK93587D0 (da) 1987-02-24
DK93587A true DK93587A (da) 1987-08-26

Family

ID=10593604

Family Applications (1)

Application Number Title Priority Date Filing Date
DK093587A DK93587A (da) 1986-02-25 1987-02-24 Fotonuklear transmutationsdoping af halvledere

Country Status (6)

Country Link
EP (1) EP0238206A1 (da)
JP (1) JPS62204522A (da)
KR (1) KR870008375A (da)
CN (1) CN87100971A (da)
DK (1) DK93587A (da)
GB (2) GB8604583D0 (da)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6563123B1 (en) * 1998-03-17 2003-05-13 Jacques Pierre Friedrich Sellschop Method of producing carbon with electrically active sites
CN103681261A (zh) * 2012-09-17 2014-03-26 中国科学院微电子研究所 一种功率器件缓冲层或截流子存储层的制备方法
JP2023157126A (ja) * 2022-04-14 2023-10-26 国立研究開発法人理化学研究所 不純物ドープ半導体の製造方法

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE2439430C2 (de) * 1974-08-16 1983-02-17 Siemens AG, 1000 Berlin und 8000 München Verfahren zum Herstellen von homogen dotiertem Halbleitermaterial mit p-Leitfähigkeit

Also Published As

Publication number Publication date
GB2187041A (en) 1987-08-26
KR870008375A (ko) 1987-09-26
DK93587D0 (da) 1987-02-24
EP0238206A1 (en) 1987-09-23
CN87100971A (zh) 1987-09-09
GB8703536D0 (en) 1987-03-25
GB8604583D0 (en) 1986-04-03
JPS62204522A (ja) 1987-09-09

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Legal Events

Date Code Title Description
ATS Application withdrawn