DK471787A - Stabiliserede oploesninger af photopolymere - Google Patents
Stabiliserede oploesninger af photopolymereInfo
- Publication number
- DK471787A DK471787A DK471787A DK471787A DK471787A DK 471787 A DK471787 A DK 471787A DK 471787 A DK471787 A DK 471787A DK 471787 A DK471787 A DK 471787A DK 471787 A DK471787 A DK 471787A
- Authority
- DK
- Denmark
- Prior art keywords
- photopolymers
- stabilized solutions
- stabilized
- solutions
- Prior art date
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K5/00—Use of organic ingredients
- C08K5/16—Nitrogen-containing compounds
- C08K5/17—Amines; Quaternary ammonium compounds
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K5/00—Use of organic ingredients
- C08K5/16—Nitrogen-containing compounds
- C08K5/32—Compounds containing nitrogen bound to oxygen
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
- G03F7/0388—Macromolecular compounds which are rendered insoluble or differentially wettable with ethylenic or acetylenic bands in the side chains of the photopolymer
Landscapes
- Physics & Mathematics (AREA)
- Chemical & Material Sciences (AREA)
- General Physics & Mathematics (AREA)
- Health & Medical Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Organic Chemistry (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Compositions Of Macromolecular Compounds (AREA)
- Epoxy Resins (AREA)
- Phenolic Resins Or Amino Resins (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE19863630993 DE3630993A1 (de) | 1986-09-11 | 1986-09-11 | Stabilisierte loesungen von photopolymeren |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| DK471787D0 DK471787D0 (da) | 1987-09-10 |
| DK471787A true DK471787A (da) | 1988-03-12 |
Family
ID=6309394
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| DK471787A DK471787A (da) | 1986-09-11 | 1987-09-10 | Stabiliserede oploesninger af photopolymere |
Country Status (6)
| Country | Link |
|---|---|
| EP (1) | EP0259728A3 (da) |
| JP (1) | JPS6370843A (da) |
| KR (1) | KR880004016A (da) |
| DE (1) | DE3630993A1 (da) |
| DK (1) | DK471787A (da) |
| FI (1) | FI873942A (da) |
Family Cites Families (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5729692B2 (da) * | 1974-09-17 | 1982-06-24 |
-
1986
- 1986-09-11 DE DE19863630993 patent/DE3630993A1/de not_active Withdrawn
-
1987
- 1987-08-28 EP EP87112573A patent/EP0259728A3/de not_active Withdrawn
- 1987-09-07 JP JP62223837A patent/JPS6370843A/ja active Pending
- 1987-09-10 DK DK471787A patent/DK471787A/da not_active Application Discontinuation
- 1987-09-11 FI FI873942A patent/FI873942A/fi not_active Application Discontinuation
- 1987-09-11 KR KR870010085A patent/KR880004016A/ko not_active Application Discontinuation
Also Published As
| Publication number | Publication date |
|---|---|
| FI873942A (fi) | 1988-03-12 |
| JPS6370843A (ja) | 1988-03-31 |
| KR880004016A (ko) | 1988-06-01 |
| FI873942A0 (fi) | 1987-09-11 |
| EP0259728A2 (de) | 1988-03-16 |
| DE3630993A1 (de) | 1988-03-17 |
| DK471787D0 (da) | 1987-09-10 |
| EP0259728A3 (de) | 1990-01-17 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| AHB | Application shelved due to non-payment |