DK3427285T3 - Anordning til modulering af intensiteten af en ladet partikelstråle, fremgangsmåde til afbøjning af en ladet partikelstråle fra emissionsaksen med anordningen og system indbefattende denne anordning - Google Patents

Anordning til modulering af intensiteten af en ladet partikelstråle, fremgangsmåde til afbøjning af en ladet partikelstråle fra emissionsaksen med anordningen og system indbefattende denne anordning Download PDF

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Publication number
DK3427285T3
DK3427285T3 DK17713353.5T DK17713353T DK3427285T3 DK 3427285 T3 DK3427285 T3 DK 3427285T3 DK 17713353 T DK17713353 T DK 17713353T DK 3427285 T3 DK3427285 T3 DK 3427285T3
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DK
Denmark
Prior art keywords
bread
load particle
defending
modulating
intensity
Prior art date
Application number
DK17713353.5T
Other languages
English (en)
Inventor
Pierre Salou
Daniel Fink
Original Assignee
Pantechnik
A D A M Sa
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Pantechnik, A D A M Sa filed Critical Pantechnik
Application granted granted Critical
Publication of DK3427285T3 publication Critical patent/DK3427285T3/da

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Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement, ion-optical arrangement
    • H01J37/147—Arrangements for directing or deflecting the discharge along a desired path
    • G—PHYSICS
    • G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21K—TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
    • G21K1/00—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating
    • G21K1/08—Deviation, concentration or focusing of the beam by electric or magnetic means
    • G21K1/087—Deviation, concentration or focusing of the beam by electric or magnetic means by electrical means
    • G—PHYSICS
    • G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21K—TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
    • G21K1/00—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating
    • G21K1/08—Deviation, concentration or focusing of the beam by electric or magnetic means
    • G21K1/093—Deviation, concentration or focusing of the beam by electric or magnetic means by magnetic means
    • G—PHYSICS
    • G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21K—TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
    • G21K5/00—Irradiation devices
    • G21K5/04—Irradiation devices with beam-forming means
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement, ion-optical arrangement
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H7/00—Details of devices of the types covered by groups H05H9/00, H05H11/00, H05H13/00
    • H05H7/04—Magnet systems, e.g. undulators, wigglers; Energisation thereof
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H7/00—Details of devices of the types covered by groups H05H9/00, H05H11/00, H05H13/00
    • H05H7/08—Arrangements for injecting particles into orbits
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/30—Electron or ion beam tubes for processing objects
    • H01J2237/317—Processing objects on a microscale
    • H01J2237/31701—Ion implantation
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H7/00—Details of devices of the types covered by groups H05H9/00, H05H11/00, H05H13/00
    • H05H7/04—Magnet systems, e.g. undulators, wigglers; Energisation thereof
    • H05H2007/046—Magnet systems, e.g. undulators, wigglers; Energisation thereof for beam deflection
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H7/00—Details of devices of the types covered by groups H05H9/00, H05H11/00, H05H13/00
    • H05H7/08—Arrangements for injecting particles into orbits
    • H05H2007/085—Arrangements for injecting particles into orbits by electrostatic means
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H7/00—Details of devices of the types covered by groups H05H9/00, H05H11/00, H05H13/00
    • H05H7/08—Arrangements for injecting particles into orbits
    • H05H2007/087—Arrangements for injecting particles into orbits by magnetic means

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Engineering & Computer Science (AREA)
  • High Energy & Nuclear Physics (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Plasma & Fusion (AREA)
  • Optics & Photonics (AREA)
  • Particle Accelerators (AREA)
DK17713353.5T 2016-03-08 2017-03-08 Anordning til modulering af intensiteten af en ladet partikelstråle, fremgangsmåde til afbøjning af en ladet partikelstråle fra emissionsaksen med anordningen og system indbefattende denne anordning DK3427285T3 (da)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
FR1651912A FR3048846B1 (fr) 2016-03-08 2016-03-08 Dispositif de modulation de l'intensite d'un faisceau de particules d'une source de particules chargees
PCT/FR2017/050510 WO2017153680A1 (fr) 2016-03-08 2017-03-08 Dispositif de modulation de l'intensite d'un faisceau de particules d'une source de particules chargees

Publications (1)

Publication Number Publication Date
DK3427285T3 true DK3427285T3 (da) 2020-04-27

Family

ID=56896632

Family Applications (1)

Application Number Title Priority Date Filing Date
DK17713353.5T DK3427285T3 (da) 2016-03-08 2017-03-08 Anordning til modulering af intensiteten af en ladet partikelstråle, fremgangsmåde til afbøjning af en ladet partikelstråle fra emissionsaksen med anordningen og system indbefattende denne anordning

Country Status (8)

Country Link
US (1) US10586675B2 (da)
EP (1) EP3427285B1 (da)
KR (1) KR102432303B1 (da)
CN (1) CN109196616B (da)
DK (1) DK3427285T3 (da)
ES (1) ES2787301T3 (da)
FR (1) FR3048846B1 (da)
WO (1) WO2017153680A1 (da)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN112086332A (zh) * 2020-09-27 2020-12-15 北京中科科仪股份有限公司 一种静电偏转装置及其偏转方法

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3286123A (en) 1962-06-01 1966-11-15 Goldberg Jacob Apparatus for charged-particle deflection modulation
US4953192A (en) * 1986-04-14 1990-08-28 The University Of Rochester Scanning equalization radiography
JPH10302711A (ja) * 1997-02-27 1998-11-13 Jeol Ltd オメガ型エネルギーフィルタ
JP4071473B2 (ja) * 2001-10-26 2008-04-02 株式会社日立ハイテクノロジーズ モノクロメータ付走査形電子顕微鏡
JP2008525968A (ja) * 2004-12-22 2008-07-17 フォックス・チェイス・キャンサー・センター レーザ加速された陽子線治療器およびその超電導電磁石システム
US20070252089A1 (en) 2006-04-26 2007-11-01 Virgin Islands Microsystems, Inc. Charged particle acceleration apparatus and method
JP4685115B2 (ja) * 2007-02-20 2011-05-18 株式会社アドバンテスト 電子ビーム露光方法
EP2213147B1 (en) 2007-10-29 2015-01-21 Ion Beam Applications S.A. Device and method for fast beam current modulation in a particle accelerator
DE102008014406A1 (de) 2008-03-14 2009-09-24 Siemens Aktiengesellschaft Partikeltherapieanlage und Verfahren zur Modulation eines in einem Beschleuniger erzeugten Partikelstrahls
US9111715B2 (en) 2011-11-08 2015-08-18 Fei Company Charged particle energy filter
EP2867915B1 (en) * 2012-06-29 2016-07-13 FEI Company Multi species ion source

Also Published As

Publication number Publication date
US20190080880A1 (en) 2019-03-14
EP3427285A1 (fr) 2019-01-16
FR3048846A1 (fr) 2017-09-15
KR102432303B1 (ko) 2022-08-11
CN109196616A (zh) 2019-01-11
US10586675B2 (en) 2020-03-10
KR20190120691A (ko) 2019-10-24
FR3048846B1 (fr) 2018-04-13
EP3427285B1 (fr) 2020-01-22
CN109196616B (zh) 2021-02-02
WO2017153680A1 (fr) 2017-09-14
ES2787301T3 (es) 2020-10-15

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