DK2329319T3 - Forbedret nanoimprint fremgangsmåde - Google Patents
Forbedret nanoimprint fremgangsmådeInfo
- Publication number
- DK2329319T3 DK2329319T3 DK09782221.7T DK09782221T DK2329319T3 DK 2329319 T3 DK2329319 T3 DK 2329319T3 DK 09782221 T DK09782221 T DK 09782221T DK 2329319 T3 DK2329319 T3 DK 2329319T3
- Authority
- DK
- Denmark
- Prior art keywords
- nanoimprint
- procedure
- improved
- nanoimprint procedure
- improved nanoimprint
- Prior art date
Links
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
- B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
- B29C59/00—Surface shaping of articles, e.g. embossing; Apparatus therefor
- B29C59/02—Surface shaping of articles, e.g. embossing; Apparatus therefor by mechanical means, e.g. pressing
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/0002—Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
- B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
- B29C33/00—Moulds or cores; Details thereof or accessories therefor
- B29C33/38—Moulds or cores; Details thereof or accessories therefor characterised by the material or the manufacturing process
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
- B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
- B29C35/00—Heating, cooling or curing, e.g. crosslinking or vulcanising; Apparatus therefor
- B29C35/02—Heating or curing, e.g. crosslinking or vulcanizing during moulding, e.g. in a mould
- B29C35/08—Heating or curing, e.g. crosslinking or vulcanizing during moulding, e.g. in a mould by wave energy or particle radiation
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y40/00—Manufacture or treatment of nanostructures
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/24—Structurally defined web or sheet [e.g., overall dimension, etc.]
- Y10T428/24479—Structurally defined web or sheet [e.g., overall dimension, etc.] including variation in thickness
- Y10T428/24612—Composite web or sheet
Landscapes
- Engineering & Computer Science (AREA)
- Chemical & Material Sciences (AREA)
- Nanotechnology (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Crystallography & Structural Chemistry (AREA)
- Manufacturing & Machinery (AREA)
- Health & Medical Sciences (AREA)
- Mathematical Physics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Mechanical Engineering (AREA)
- Theoretical Computer Science (AREA)
- Toxicology (AREA)
- Oral & Maxillofacial Surgery (AREA)
- Thermal Sciences (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Shaping Of Tube Ends By Bending Or Straightening (AREA)
- Application Of Or Painting With Fluid Materials (AREA)
- Coating Apparatus (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE102008041623 | 2008-08-27 | ||
PCT/EP2009/061005 WO2010023227A1 (de) | 2008-08-27 | 2009-08-26 | Verbessertes nanoimprint-verfahren |
Publications (1)
Publication Number | Publication Date |
---|---|
DK2329319T3 true DK2329319T3 (da) | 2013-10-21 |
Family
ID=41258238
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DK09782221.7T DK2329319T3 (da) | 2008-08-27 | 2009-08-26 | Forbedret nanoimprint fremgangsmåde |
Country Status (9)
Country | Link |
---|---|
US (1) | US8795775B2 (da) |
EP (1) | EP2329319B1 (da) |
JP (1) | JP2012501084A (da) |
KR (1) | KR101512876B1 (da) |
CN (1) | CN102144188B (da) |
AU (1) | AU2009286690A1 (da) |
CA (1) | CA2734952A1 (da) |
DK (1) | DK2329319T3 (da) |
WO (1) | WO2010023227A1 (da) |
Families Citing this family (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US9337100B2 (en) | 2009-06-03 | 2016-05-10 | Qualcomm Incorporated | Apparatus and method to fabricate an electronic device |
DE102010044133B4 (de) * | 2010-11-18 | 2016-03-03 | Schott Ag | Ätzverfahren zur Oberflächenstrukturierung und Ätzmaske |
US20130189428A1 (en) * | 2011-06-27 | 2013-07-25 | Cedric TROADEC | Method for transferring target particles between substrates |
DE102014100005B4 (de) | 2013-05-29 | 2024-08-14 | Amo Gmbh | Beschichtung aus Resist auf ein Substrat für ultrahochauflösende Lithographie |
CN104690969B (zh) * | 2015-02-10 | 2017-04-19 | 西安交通大学 | 基于3d喷射打印技术的仿生异型微纳复合结构制造工艺 |
CN106876277B (zh) * | 2017-02-20 | 2020-03-17 | 武汉华星光电技术有限公司 | 薄膜晶体管的制备方法、显示面板的制备方法 |
CN112794277A (zh) * | 2021-03-05 | 2021-05-14 | 深圳清华大学研究院 | 一种大尺度超滑器件及其加工制作方法 |
TW202343134A (zh) | 2022-04-28 | 2023-11-01 | 聯華電子股份有限公司 | 利用二次奈米壓印在基板上製作圖案的方法 |
Family Cites Families (21)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5116548A (en) * | 1989-08-29 | 1992-05-26 | American Bank Note Holographics, Inc. | Replicaton of microstructures by casting in controlled areas of a substrate |
JPH0580530A (ja) * | 1991-09-24 | 1993-04-02 | Hitachi Ltd | 薄膜パターン製造方法 |
US5330799A (en) * | 1992-09-15 | 1994-07-19 | The Phscologram Venture, Inc. | Press polymerization of lenticular images |
DE69405451T2 (de) * | 1993-03-16 | 1998-03-12 | Koninkl Philips Electronics Nv | Verfahren und Vorrichtung zur Herstellung eines strukturierten Reliefbildes aus vernetztem Photoresist auf einer flachen Substratoberfläche |
US6180239B1 (en) * | 1993-10-04 | 2001-01-30 | President And Fellows Of Harvard College | Microcontact printing on surfaces and derivative articles |
EP1003078A3 (en) * | 1998-11-17 | 2001-11-07 | Corning Incorporated | Replicating a nanoscale pattern |
WO2002003142A2 (en) | 2000-06-30 | 2002-01-10 | President And Fellows Of Harvard College | Electric microcontact printing method and apparatus |
JP4683769B2 (ja) * | 2001-05-31 | 2011-05-18 | 三井金属鉱業株式会社 | 銅メッキ回路層付銅張積層板及びその銅メッキ回路層付銅張積層板を用いたプリント配線板の製造方法 |
US6714350B2 (en) * | 2001-10-15 | 2004-03-30 | Eastman Kodak Company | Double sided wire grid polarizer |
CA2380114C (en) * | 2002-04-04 | 2010-01-19 | Obducat Aktiebolag | Imprint method and device |
EP1546804A1 (en) * | 2002-08-27 | 2005-06-29 | Obducat AB | Device for transferring a pattern to an object |
KR100950133B1 (ko) * | 2002-12-27 | 2010-03-30 | 엘지디스플레이 주식회사 | 인쇄방식에 의한 패턴형성방법 |
US7070406B2 (en) * | 2003-04-29 | 2006-07-04 | Hewlett-Packard Development Company, L.P. | Apparatus for embossing a flexible substrate with a pattern carried by an optically transparent compliant media |
US6860956B2 (en) * | 2003-05-23 | 2005-03-01 | Agency For Science, Technology & Research | Methods of creating patterns on substrates and articles of manufacture resulting therefrom |
AU2005282060A1 (en) * | 2004-09-08 | 2006-03-16 | Nil Technology Aps | A flexible nano-imprint stamp |
US7281919B2 (en) * | 2004-12-07 | 2007-10-16 | Molecular Imprints, Inc. | System for controlling a volume of material on a mold |
SG159515A1 (en) * | 2005-02-17 | 2010-03-30 | Agency Science Tech & Res | Method of low temperature imprinting process with high pattern transfer yield |
JP2008194838A (ja) * | 2007-02-08 | 2008-08-28 | Sii Nanotechnology Inc | ナノインプリントリソグラフィーのモールド検査方法及び樹脂残渣除去方法 |
US20080229941A1 (en) * | 2007-03-19 | 2008-09-25 | Babak Heidari | Nano-imprinting apparatus and method |
US8027086B2 (en) * | 2007-04-10 | 2011-09-27 | The Regents Of The University Of Michigan | Roll to roll nanoimprint lithography |
US8142702B2 (en) * | 2007-06-18 | 2012-03-27 | Molecular Imprints, Inc. | Solvent-assisted layer formation for imprint lithography |
-
2009
- 2009-08-26 AU AU2009286690A patent/AU2009286690A1/en not_active Abandoned
- 2009-08-26 KR KR1020117006979A patent/KR101512876B1/ko active IP Right Grant
- 2009-08-26 CN CN200980133236XA patent/CN102144188B/zh active Active
- 2009-08-26 CA CA2734952A patent/CA2734952A1/en not_active Abandoned
- 2009-08-26 DK DK09782221.7T patent/DK2329319T3/da active
- 2009-08-26 EP EP09782221.7A patent/EP2329319B1/de active Active
- 2009-08-26 WO PCT/EP2009/061005 patent/WO2010023227A1/de active Application Filing
- 2009-08-26 JP JP2011524367A patent/JP2012501084A/ja active Pending
-
2011
- 2011-02-25 US US13/035,602 patent/US8795775B2/en active Active
Also Published As
Publication number | Publication date |
---|---|
AU2009286690A1 (en) | 2010-03-04 |
US8795775B2 (en) | 2014-08-05 |
JP2012501084A (ja) | 2012-01-12 |
CN102144188A (zh) | 2011-08-03 |
EP2329319B1 (de) | 2013-07-17 |
CN102144188B (zh) | 2013-05-01 |
EP2329319A1 (de) | 2011-06-08 |
CA2734952A1 (en) | 2010-03-04 |
KR101512876B1 (ko) | 2015-04-16 |
WO2010023227A1 (de) | 2010-03-04 |
US20110171432A1 (en) | 2011-07-14 |
KR20110061585A (ko) | 2011-06-09 |
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