DK220776A - METHOD OF PRECIPITATION OF METALLIC RUTHENIUM - Google Patents

METHOD OF PRECIPITATION OF METALLIC RUTHENIUM

Info

Publication number
DK220776A
DK220776A DK220776A DK220776A DK220776A DK 220776 A DK220776 A DK 220776A DK 220776 A DK220776 A DK 220776A DK 220776 A DK220776 A DK 220776A DK 220776 A DK220776 A DK 220776A
Authority
DK
Denmark
Prior art keywords
precipitation
metallic ruthenium
ruthenium
metallic
Prior art date
Application number
DK220776A
Other languages
Danish (da)
Inventor
J N Crosby
R S Hanley
Original Assignee
Int Nickel Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Int Nickel Ltd filed Critical Int Nickel Ltd
Publication of DK220776A publication Critical patent/DK220776A/en

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/06—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of metallic material
    • C23C16/18—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of metallic material from metallo-organic compounds

Landscapes

  • Chemical & Material Sciences (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Chemical Vapour Deposition (AREA)
  • Apparatuses And Processes For Manufacturing Resistors (AREA)
  • Physical Vapour Deposition (AREA)
  • Manufacture And Refinement Of Metals (AREA)
  • Electrolytic Production Of Metals (AREA)
  • Contacts (AREA)
DK220776A 1975-05-20 1976-05-19 METHOD OF PRECIPITATION OF METALLIC RUTHENIUM DK220776A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
GB21497/75A GB1499549A (en) 1975-05-20 1975-05-20 Deposition of ruthenium

Publications (1)

Publication Number Publication Date
DK220776A true DK220776A (en) 1976-11-21

Family

ID=10163942

Family Applications (1)

Application Number Title Priority Date Filing Date
DK220776A DK220776A (en) 1975-05-20 1976-05-19 METHOD OF PRECIPITATION OF METALLIC RUTHENIUM

Country Status (14)

Country Link
JP (1) JPS51141738A (en)
AT (1) ATA366276A (en)
AU (1) AU1369576A (en)
BE (1) BE842027A (en)
CA (1) CA1087040A (en)
CH (1) CH603809A5 (en)
DE (1) DE2622181A1 (en)
DK (1) DK220776A (en)
ES (1) ES448043A1 (en)
FR (1) FR2311859A1 (en)
GB (1) GB1499549A (en)
NL (1) NL7605002A (en)
SE (1) SE7605668L (en)
ZA (1) ZA762641B (en)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH01301865A (en) * 1988-05-30 1989-12-06 Nippon Telegr & Teleph Corp <Ntt> Method and apparatus for growing thin film
JP2799763B2 (en) * 1990-07-11 1998-09-21 同和鉱業株式会社 Production method of thin film using organometallic complex
JP2802676B2 (en) * 1990-07-13 1998-09-24 同和鉱業株式会社 Method for producing thin film using 1,3-diketone organometallic complex
AT410757B (en) * 1993-12-10 2003-07-25 Tyrolia Freizeitgeraete ski brake
JP5792438B2 (en) * 2010-08-12 2015-10-14 東京エレクトロン株式会社 Film forming apparatus and film forming method
US9725794B2 (en) 2014-12-17 2017-08-08 Kennametal Inc. Cemented carbide articles and applications thereof

Also Published As

Publication number Publication date
ES448043A1 (en) 1977-07-01
DE2622181A1 (en) 1976-12-09
ATA366276A (en) 1977-12-15
GB1499549A (en) 1978-02-01
NL7605002A (en) 1976-11-23
AU1369576A (en) 1977-11-10
SE7605668L (en) 1976-11-21
JPS51141738A (en) 1976-12-06
CH603809A5 (en) 1978-08-31
ZA762641B (en) 1977-04-27
CA1087040A (en) 1980-10-07
FR2311859A1 (en) 1976-12-17
BE842027A (en) 1976-11-22

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