DK141557C - Apparatus for the manufacture of unilaterally closed tubes of semiconductor material - Google Patents

Apparatus for the manufacture of unilaterally closed tubes of semiconductor material

Info

Publication number
DK141557C
DK141557C DK564772A DK564772A DK141557C DK 141557 C DK141557 C DK 141557C DK 564772 A DK564772 A DK 564772A DK 564772 A DK564772 A DK 564772A DK 141557 C DK141557 C DK 141557C
Authority
DK
Denmark
Prior art keywords
manufacture
semiconductor material
closed tubes
unilaterally closed
unilaterally
Prior art date
Application number
DK564772A
Other languages
Danish (da)
Other versions
DK141557B (en
Inventor
A Kasper
W Dietze
Original Assignee
Siemens Ag
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Siemens Ag filed Critical Siemens Ag
Publication of DK141557B publication Critical patent/DK141557B/en
Application granted granted Critical
Publication of DK141557C publication Critical patent/DK141557C/en

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10STECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S148/00Metal treatment
    • Y10S148/073Hollow body
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10STECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S148/00Metal treatment
    • Y10S148/122Polycrystalline

Landscapes

  • Chemical & Material Sciences (AREA)
  • Inorganic Chemistry (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Silicon Compounds (AREA)
  • Crystals, And After-Treatments Of Crystals (AREA)
  • Chemical Vapour Deposition (AREA)
  • Carbon And Carbon Compounds (AREA)
DK564772A 1971-11-24 1972-11-14 Apparatus for the manufacture of unilaterally closed tubes of semiconductor material DK141557C (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE2158257A DE2158257A1 (en) 1971-11-24 1971-11-24 ARRANGEMENT FOR THE MANUFACTURING OF SINGLE-SIDED TUBES FROM SEMICONDUCTOR MATERIAL
DE2158257 1971-11-24

Publications (2)

Publication Number Publication Date
DK141557B DK141557B (en) 1980-04-21
DK141557C true DK141557C (en) 1980-09-08

Family

ID=5826011

Family Applications (1)

Application Number Title Priority Date Filing Date
DK564772A DK141557C (en) 1971-11-24 1972-11-14 Apparatus for the manufacture of unilaterally closed tubes of semiconductor material

Country Status (13)

Country Link
US (1) US3793984A (en)
JP (1) JPS5743526B2 (en)
AT (1) AT324434B (en)
BE (1) BE787577R (en)
CH (1) CH550609A (en)
DD (1) DD105727A6 (en)
DE (1) DE2158257A1 (en)
DK (1) DK141557C (en)
FR (1) FR2160903B2 (en)
GB (1) GB1370988A (en)
IT (1) IT1046828B (en)
NL (1) NL7212471A (en)
SE (1) SE375555B (en)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5478787A (en) * 1991-12-26 1995-12-26 Uop Discrete molecular sieve and use
US5453233A (en) * 1993-04-05 1995-09-26 Cvd, Inc. Method of producing domes of ZNS and ZNSE via a chemical vapor deposition technique
AU747260B2 (en) 1997-07-25 2002-05-09 Nichia Chemical Industries, Ltd. Nitride semiconductor device
JP3770014B2 (en) 1999-02-09 2006-04-26 日亜化学工業株式会社 Nitride semiconductor device
EP1168539B1 (en) * 1999-03-04 2009-12-16 Nichia Corporation Nitride semiconductor laser device
TWI362769B (en) * 2008-05-09 2012-04-21 Univ Nat Chiao Tung Light emitting device and fabrication method therefor

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB450959A (en) * 1934-10-22 1936-07-22 Robert Calvert Knight Young Electric resistance heaters
US2271838A (en) * 1939-11-06 1942-02-03 Dow Chemical Co Electric furnace resistor element
US2355343A (en) * 1941-07-23 1944-08-08 Ind De L Aluminum Sa Furnace for the electrothermal production of magnesium
US2858403A (en) * 1956-04-23 1958-10-28 Carborundum Co Silicon carbide immersion heating device
US2955566A (en) * 1957-04-16 1960-10-11 Chilean Nitrate Sales Corp Dissociation-deposition unit for the production of chromium
GB944009A (en) * 1960-01-04 1963-12-11 Texas Instruments Ltd Improvements in or relating to the deposition of silicon on a tantalum article
US3451772A (en) * 1967-06-14 1969-06-24 Air Reduction Production of ultrapure titanium nitride refractory articles
US3717439A (en) * 1970-11-18 1973-02-20 Tokyo Shibaura Electric Co Vapour phase reaction apparatus

Also Published As

Publication number Publication date
SE375555B (en) 1975-04-21
US3793984A (en) 1974-02-26
CH550609A (en) 1974-06-28
NL7212471A (en) 1973-05-28
AT324434B (en) 1975-08-25
BE787577R (en) 1972-12-01
JPS5743526B2 (en) 1982-09-16
FR2160903B2 (en) 1976-08-20
DD105727A6 (en) 1974-05-12
IT1046828B (en) 1980-07-31
DK141557B (en) 1980-04-21
FR2160903A2 (en) 1973-07-06
JPS4863976A (en) 1973-09-05
DE2158257A1 (en) 1973-05-30
GB1370988A (en) 1974-10-23

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