DK123832B - Method of making thin film on a substrate and apparatus for performing the method. - Google Patents

Method of making thin film on a substrate and apparatus for performing the method.

Info

Publication number
DK123832B
DK123832B DK618468A DK618468A DK123832B DK 123832 B DK123832 B DK 123832B DK 618468 A DK618468 A DK 618468A DK 618468 A DK618468 A DK 618468A DK 123832 B DK123832 B DK 123832B
Authority
DK
Denmark
Prior art keywords
substrate
thin film
making thin
making
film
Prior art date
Application number
DK618468A
Other languages
Danish (da)
Inventor
O Christensen
Original Assignee
Disa Elektronik As
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Disa Elektronik As filed Critical Disa Elektronik As
Priority to DK618468A priority Critical patent/DK123832B/en
Priority to GB1289978D priority patent/GB1289978A/en
Publication of DK123832B publication Critical patent/DK123832B/en

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C23C14/3435—Applying energy to the substrate during sputtering
    • C23C14/345—Applying energy to the substrate during sputtering using substrate bias
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C23C14/35—Sputtering by application of a magnetic field, e.g. magnetron sputtering
    • C23C14/354—Introduction of auxiliary energy into the plasma
    • C23C14/355—Introduction of auxiliary energy into the plasma using electrons, e.g. triode sputtering

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Physical Vapour Deposition (AREA)
DK618468A 1968-12-17 1968-12-17 Method of making thin film on a substrate and apparatus for performing the method. DK123832B (en)

Priority Applications (2)

Application Number Priority Date Filing Date Title
DK618468A DK123832B (en) 1968-12-17 1968-12-17 Method of making thin film on a substrate and apparatus for performing the method.
GB1289978D GB1289978A (en) 1968-12-17 1969-12-16

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DK618468A DK123832B (en) 1968-12-17 1968-12-17 Method of making thin film on a substrate and apparatus for performing the method.

Publications (1)

Publication Number Publication Date
DK123832B true DK123832B (en) 1972-08-07

Family

ID=8147886

Family Applications (1)

Application Number Title Priority Date Filing Date
DK618468A DK123832B (en) 1968-12-17 1968-12-17 Method of making thin film on a substrate and apparatus for performing the method.

Country Status (2)

Country Link
DK (1) DK123832B (en)
GB (1) GB1289978A (en)

Also Published As

Publication number Publication date
GB1289978A (en) 1972-09-20

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