DK118002B - Fremgangsmåde til fremstilling af et lysfølsomt fotografisk lag. - Google Patents
Fremgangsmåde til fremstilling af et lysfølsomt fotografisk lag.Info
- Publication number
- DK118002B DK118002B DK101667AA DK101667A DK118002B DK 118002 B DK118002 B DK 118002B DK 101667A A DK101667A A DK 101667AA DK 101667 A DK101667 A DK 101667A DK 118002 B DK118002 B DK 118002B
- Authority
- DK
- Denmark
- Prior art keywords
- producing
- photographic layer
- photosensitive photographic
- photosensitive
- layer
- Prior art date
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D219/00—Heterocyclic compounds containing acridine or hydrogenated acridine ring systems
- C07D219/04—Heterocyclic compounds containing acridine or hydrogenated acridine ring systems with hetero atoms or with carbon atoms having three bonds to hetero atoms with at the most one bond to halogen, e.g. ester or nitrile radicals, directly attached to carbon atoms of the ring system
- C07D219/08—Nitrogen atoms
- C07D219/10—Nitrogen atoms attached in position 9
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03C—PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
- G03C1/00—Photosensitive materials
- G03C1/695—Compositions containing azides as the photosensitive substances
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/008—Azides
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
- Closures For Containers (AREA)
- Plural Heterocyclic Compounds (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US52992366A | 1966-02-25 | 1966-02-25 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| DK118002B true DK118002B (da) | 1970-06-22 |
Family
ID=24111763
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| DK101667AA DK118002B (da) | 1966-02-25 | 1967-02-24 | Fremgangsmåde til fremstilling af et lysfølsomt fotografisk lag. |
Country Status (9)
| Country | Link |
|---|---|
| US (1) | US3519424A (de) |
| BE (1) | BE694177A (de) |
| CH (1) | CH462624A (de) |
| DE (1) | DE1547774A1 (de) |
| DK (1) | DK118002B (de) |
| FR (1) | FR1511485A (de) |
| GB (1) | GB1173793A (de) |
| NO (1) | NO119206B (de) |
| SE (1) | SE327140B (de) |
Families Citing this family (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE1772813A1 (de) * | 1968-07-08 | 1971-06-09 | Agfa Gevaert Ag | Trockenkopierverfahren |
| US3835139A (en) * | 1972-07-19 | 1974-09-10 | Syntex Inc | N-substituted acridone carboxylic acids and derivatives |
| DE2242106A1 (de) * | 1972-08-26 | 1974-03-21 | Agfa Gevaert Ag | Lichtempfindliches photographisches material |
| US3923522A (en) * | 1973-07-18 | 1975-12-02 | Oji Paper Co | Photosensitive composition |
| US4622284A (en) * | 1984-03-01 | 1986-11-11 | Digital Recording Corporation | Process of using metal azide recording media with laser |
Family Cites Families (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| NL96874C (de) * | 1954-04-03 | |||
| GB763288A (en) * | 1954-06-16 | 1956-12-12 | Kodak Ltd | Improvements in photo mechanical processes and materials therefor |
| DE1258265B (de) * | 1960-02-05 | 1968-01-04 | Eastman Kodak Co | Lichtempfindliche photographische Schicht |
| US3062650A (en) * | 1960-05-05 | 1962-11-06 | Eastman Kodak Co | Photographic printout system comprising an organic azide |
| US3072485A (en) * | 1960-08-24 | 1963-01-08 | Eastman Kodak Co | Optically sensitized azido polymers for photomechanical resist compositions |
| US3284198A (en) * | 1963-09-11 | 1966-11-08 | Martin Marietta Corp | Method for making photolithographic plate |
| US3387976A (en) * | 1964-07-22 | 1968-06-11 | Harris Intertype Corp | Photopolymer and lithographic plates |
-
1966
- 1966-02-25 US US529923A patent/US3519424A/en not_active Expired - Lifetime
-
1967
- 1967-02-07 DE DE19671547774 patent/DE1547774A1/de active Pending
- 1967-02-16 FR FR95117A patent/FR1511485A/fr not_active Expired
- 1967-02-16 BE BE694177D patent/BE694177A/xx unknown
- 1967-02-20 NO NO166925A patent/NO119206B/no unknown
- 1967-02-20 GB GB8000/67A patent/GB1173793A/en not_active Expired
- 1967-02-23 SE SE02471/67A patent/SE327140B/xx unknown
- 1967-02-24 DK DK101667AA patent/DK118002B/da unknown
- 1967-02-24 CH CH277867A patent/CH462624A/fr unknown
Also Published As
| Publication number | Publication date |
|---|---|
| US3519424A (en) | 1970-07-07 |
| CH462624A (fr) | 1968-09-15 |
| DE1547774A1 (de) | 1970-01-08 |
| NO119206B (de) | 1970-04-06 |
| BE694177A (de) | 1967-07-31 |
| FR1511485A (fr) | 1968-01-26 |
| GB1173793A (en) | 1969-12-10 |
| SE327140B (de) | 1970-08-10 |
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