BE694177A - - Google Patents

Info

Publication number
BE694177A
BE694177A BE694177DA BE694177A BE 694177 A BE694177 A BE 694177A BE 694177D A BE694177D A BE 694177DA BE 694177 A BE694177 A BE 694177A
Authority
BE
Belgium
Application number
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Publication of BE694177A publication Critical patent/BE694177A/xx

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07DHETEROCYCLIC COMPOUNDS
    • C07D219/00Heterocyclic compounds containing acridine or hydrogenated acridine ring systems
    • C07D219/04Heterocyclic compounds containing acridine or hydrogenated acridine ring systems with hetero atoms or with carbon atoms having three bonds to hetero atoms with at the most one bond to halogen, e.g. ester or nitrile radicals, directly attached to carbon atoms of the ring system
    • C07D219/08Nitrogen atoms
    • C07D219/10Nitrogen atoms attached in position 9
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03CPHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
    • G03C1/00Photosensitive materials
    • G03C1/695Compositions containing azides as the photosensitive substances
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/008Azides

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Closures For Containers (AREA)
  • Plural Heterocyclic Compounds (AREA)
BE694177D 1966-02-25 1967-02-16 BE694177A (xx)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US52992366A 1966-02-25 1966-02-25

Publications (1)

Publication Number Publication Date
BE694177A true BE694177A (xx) 1967-07-31

Family

ID=24111763

Family Applications (1)

Application Number Title Priority Date Filing Date
BE694177D BE694177A (xx) 1966-02-25 1967-02-16

Country Status (9)

Country Link
US (1) US3519424A (xx)
BE (1) BE694177A (xx)
CH (1) CH462624A (xx)
DE (1) DE1547774A1 (xx)
DK (1) DK118002B (xx)
FR (1) FR1511485A (xx)
GB (1) GB1173793A (xx)
NO (1) NO119206B (xx)
SE (1) SE327140B (xx)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE1772813A1 (de) * 1968-07-08 1971-06-09 Agfa Gevaert Ag Trockenkopierverfahren
US3835139A (en) * 1972-07-19 1974-09-10 Syntex Inc N-substituted acridone carboxylic acids and derivatives
DE2242106A1 (de) * 1972-08-26 1974-03-21 Agfa Gevaert Ag Lichtempfindliches photographisches material
US3923522A (en) * 1973-07-18 1975-12-02 Oji Paper Co Photosensitive composition
US4622284A (en) * 1984-03-01 1986-11-11 Digital Recording Corporation Process of using metal azide recording media with laser

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
NL96874C (xx) * 1954-04-03
GB763288A (en) * 1954-06-16 1956-12-12 Kodak Ltd Improvements in photo mechanical processes and materials therefor
DE1258265B (de) * 1960-02-05 1968-01-04 Eastman Kodak Co Lichtempfindliche photographische Schicht
US3062650A (en) * 1960-05-05 1962-11-06 Eastman Kodak Co Photographic printout system comprising an organic azide
US3072485A (en) * 1960-08-24 1963-01-08 Eastman Kodak Co Optically sensitized azido polymers for photomechanical resist compositions
US3284198A (en) * 1963-09-11 1966-11-08 Martin Marietta Corp Method for making photolithographic plate
US3387976A (en) * 1964-07-22 1968-06-11 Harris Intertype Corp Photopolymer and lithographic plates

Also Published As

Publication number Publication date
NO119206B (xx) 1970-04-06
FR1511485A (fr) 1968-01-26
DK118002B (da) 1970-06-22
DE1547774A1 (de) 1970-01-08
US3519424A (en) 1970-07-07
SE327140B (xx) 1970-08-10
GB1173793A (en) 1969-12-10
CH462624A (fr) 1968-09-15

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