DK117649B - Method and apparatus for controllably heating a target material in a high vacuum electron beam apparatus. - Google Patents

Method and apparatus for controllably heating a target material in a high vacuum electron beam apparatus.

Info

Publication number
DK117649B
DK117649B DK299966AA DK299966A DK117649B DK 117649 B DK117649 B DK 117649B DK 299966A A DK299966A A DK 299966AA DK 299966 A DK299966 A DK 299966A DK 117649 B DK117649 B DK 117649B
Authority
DK
Denmark
Prior art keywords
electron beam
high vacuum
target material
vacuum electron
controllably heating
Prior art date
Application number
DK299966AA
Other languages
Danish (da)
Inventor
R Fisk
Original Assignee
Libbey Owens Ford Glass Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Libbey Owens Ford Glass Co filed Critical Libbey Owens Ford Glass Co
Publication of DK117649B publication Critical patent/DK117649B/en

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/305—Electron-beam or ion-beam tubes for localised treatment of objects for casting, melting, evaporating or etching

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)
  • Detergent Compositions (AREA)
  • Welding Or Cutting Using Electron Beams (AREA)
  • Electron Sources, Ion Sources (AREA)
DK299966AA 1965-06-11 1966-06-10 Method and apparatus for controllably heating a target material in a high vacuum electron beam apparatus. DK117649B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US463190A US3394217A (en) 1965-06-11 1965-06-11 Method and apparatus for controlling plural electron beams

Publications (1)

Publication Number Publication Date
DK117649B true DK117649B (en) 1970-05-19

Family

ID=23839207

Family Applications (1)

Application Number Title Priority Date Filing Date
DK299966AA DK117649B (en) 1965-06-11 1966-06-10 Method and apparatus for controllably heating a target material in a high vacuum electron beam apparatus.

Country Status (11)

Country Link
US (1) US3394217A (en)
AT (1) AT278187B (en)
BE (1) BE681839A (en)
CH (1) CH452731A (en)
DE (1) DE1565881B2 (en)
DK (1) DK117649B (en)
GB (1) GB1141594A (en)
LU (1) LU51261A1 (en)
NL (1) NL6608065A (en)
NO (1) NO117547B (en)
SE (1) SE346196B (en)

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3475542A (en) * 1967-09-13 1969-10-28 Air Reduction Apparatus for heating a target in an electron beam furnace
US3535428A (en) * 1968-07-17 1970-10-20 Air Reduction Apparatus for producing and directing an electron beam
FR2244014B1 (en) * 1973-09-17 1976-10-08 Bosch Gmbh Robert
IT1037702B (en) * 1975-04-29 1979-11-20 Varian Associates ELECTRONIC BEAM HEATING AND EVAPORATION EQUIPMENT
US3999097A (en) * 1975-06-30 1976-12-21 International Business Machines Corporation Ion implantation apparatus utilizing multiple aperture source plate and single aperture accel-decel system
SU782571A1 (en) * 1976-05-12 1983-09-23 Институт ядерной физики СО АН СССР Method for radiation treatment of round-section products
DD204947A1 (en) * 1982-04-20 1983-12-14 Manfred Neumann EQUIPMENT FOR ELECTRON RADIATION STEAMING BROADER
JP3092717B2 (en) * 1990-03-02 2000-09-25 バリアン・セミコンダクター・エクイップメント・アソシエイツ・インコーポレイテッド Charge neutralizer for ion implantation system
US5136171A (en) * 1990-03-02 1992-08-04 Varian Associates, Inc. Charge neutralization apparatus for ion implantation system
JP3275166B2 (en) * 1997-02-28 2002-04-15 住友重機械工業株式会社 Vacuum deposition system with plasma beam bias correction mechanism
US6476340B1 (en) 1999-04-14 2002-11-05 The Boc Group, Inc. Electron beam gun with grounded shield to prevent arc-down and gas bleed to protect the filament

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3046936A (en) * 1958-06-04 1962-07-31 Nat Res Corp Improvement in vacuum coating apparatus comprising an ion trap for the electron gun thereof
US3105275A (en) * 1960-05-27 1963-10-01 Stauffer Chemical Co Electron-beam furnace with double-coil magnetic beam guidance
FR1374335A (en) * 1962-12-13 1964-10-09 Electronique & Physique Device for manufacturing a blade of high purity material

Also Published As

Publication number Publication date
AT278187B (en) 1970-01-26
SE346196B (en) 1972-06-26
BE681839A (en) 1966-10-31
DE1565881B2 (en) 1971-01-21
LU51261A1 (en) 1966-08-16
NO117547B (en) 1969-08-25
US3394217A (en) 1968-07-23
DE1565881A1 (en) 1970-03-19
NL6608065A (en) 1966-12-12
GB1141594A (en) 1969-01-29
CH452731A (en) 1968-03-15

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