DK0725161T3 - Method of Plasma Treatment of Subjects - Google Patents

Method of Plasma Treatment of Subjects

Info

Publication number
DK0725161T3
DK0725161T3 DK95119817T DK95119817T DK0725161T3 DK 0725161 T3 DK0725161 T3 DK 0725161T3 DK 95119817 T DK95119817 T DK 95119817T DK 95119817 T DK95119817 T DK 95119817T DK 0725161 T3 DK0725161 T3 DK 0725161T3
Authority
DK
Denmark
Prior art keywords
plasma treatment
workpieces
electrons
ions
subjects
Prior art date
Application number
DK95119817T
Other languages
Danish (da)
Inventor
Joerg Dr Vetter
Siegfried Maxam
Manfred Schmidt-Mauer
Original Assignee
Metaplas Ionon Oberflochenvere
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Metaplas Ionon Oberflochenvere filed Critical Metaplas Ionon Oberflochenvere
Application granted granted Critical
Publication of DK0725161T3 publication Critical patent/DK0725161T3/en

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/02—Pretreatment of the material to be coated
    • C23C14/021—Cleaning or etching treatments
    • C23C14/022—Cleaning or etching treatments by means of bombardment with energetic particles or radiation

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Organic Chemistry (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Analytical Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
  • Treatments Of Macromolecular Shaped Articles (AREA)
  • Cleaning In General (AREA)

Abstract

Plasma treatment is claimed of workpieces by means of ions and electrons (in particular, before plasma coating in vacuum by a PVD process), according to which the workpieces (2) are respectively cleaned and heated by alternating bombardment with ions and electrons. The ion and electron bombardment is achieved by means of direct current sources (4,5) which are independent of one another and the coating process, and are adapted to given conditions. By means of an adjustable pulse device, these sources are alternatingly connected (with their negative and positive poles) to a workpiece carrier (3).
DK95119817T 1995-01-06 1995-12-15 Method of Plasma Treatment of Subjects DK0725161T3 (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE19500262A DE19500262C1 (en) 1995-01-06 1995-01-06 Plasma treatment of workpieces

Publications (1)

Publication Number Publication Date
DK0725161T3 true DK0725161T3 (en) 1999-02-08

Family

ID=7751068

Family Applications (1)

Application Number Title Priority Date Filing Date
DK95119817T DK0725161T3 (en) 1995-01-06 1995-12-15 Method of Plasma Treatment of Subjects

Country Status (5)

Country Link
EP (1) EP0725161B1 (en)
AT (1) ATE165122T1 (en)
DE (2) DE19500262C1 (en)
DK (1) DK0725161T3 (en)
ES (1) ES2116668T3 (en)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE19546826C1 (en) * 1995-12-15 1997-04-03 Fraunhofer Ges Forschung Substrate surface treatment prior to vacuum coating
DE19703338C2 (en) * 1996-12-27 1998-11-12 Ardenne Anlagentech Gmbh Process for preheating workpieces during vacuum coating
GB2323855B (en) * 1997-04-01 2002-06-05 Ion Coat Ltd Method and apparatus for depositing a coating on a conductive substrate
ES2256948T3 (en) 1997-06-16 2006-07-16 Robert Bosch Gmbh PROCEDURE AND DEVICE FOR COATING IN A VACUUM PHASE OF A SUBSTRATE.
JP2002527628A (en) * 1998-10-21 2002-08-27 シーメンス アクチエンゲゼルシヤフト Product purification method and coating method and apparatus therefor

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DD268715A1 (en) * 1988-02-09 1989-06-07 Robotron Elektronik DEVICE FOR PRE-ORDERING SUBSTRATES
DE4034842A1 (en) * 1990-11-02 1992-05-07 Thyssen Edelstahlwerke Ag METHOD FOR PLASMA MECHANICAL CLEANING FOR A SUBSEQUENT PVD OR PECVD COATING
DE4035131C2 (en) * 1990-11-05 1995-09-21 Balzers Hochvakuum Method and device for uniform heating of heating material, in particular of substrates to be coated, in a vacuum chamber
CA2121266C (en) * 1992-08-14 1998-06-09 Simon K. Nieh Surface preparation and deposition method for titanium nitride onto carbonaceous

Also Published As

Publication number Publication date
EP0725161B1 (en) 1998-04-15
ES2116668T3 (en) 1998-07-16
EP0725161A1 (en) 1996-08-07
DE59501907D1 (en) 1998-05-20
DE19500262C1 (en) 1995-09-28
ATE165122T1 (en) 1998-05-15

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