DEP0046615DA - Process for the treatment of etched electrodes for electrolytic capacitors - Google Patents
Process for the treatment of etched electrodes for electrolytic capacitorsInfo
- Publication number
- DEP0046615DA DEP0046615DA DEP0046615DA DE P0046615D A DEP0046615D A DE P0046615DA DE P0046615D A DEP0046615D A DE P0046615DA
- Authority
- DE
- Germany
- Prior art keywords
- treatment
- electrolytic capacitors
- etched electrodes
- electrodes
- etched
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 238000000034 method Methods 0.000 title claims description 4
- 239000003990 capacitor Substances 0.000 title description 7
- 239000002253 acid Substances 0.000 claims description 4
- 150000007524 organic acids Chemical class 0.000 claims description 3
- 235000005985 organic acids Nutrition 0.000 claims description 3
- 150000007522 mineralic acids Chemical class 0.000 claims description 2
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 6
- 238000005530 etching Methods 0.000 description 4
- 150000003839 salts Chemical class 0.000 description 3
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 2
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 2
- BUGBHKTXTAQXES-UHFFFAOYSA-N Selenium Chemical compound [Se] BUGBHKTXTAQXES-UHFFFAOYSA-N 0.000 description 2
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 2
- 150000007513 acids Chemical class 0.000 description 2
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 2
- 229910052782 aluminium Inorganic materials 0.000 description 2
- 239000003792 electrolyte Substances 0.000 description 2
- 239000011888 foil Substances 0.000 description 2
- 229910052711 selenium Inorganic materials 0.000 description 2
- 239000011669 selenium Substances 0.000 description 2
- 239000000243 solution Substances 0.000 description 2
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 1
- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 description 1
- QAOWNCQODCNURD-UHFFFAOYSA-L Sulfate Chemical compound [O-]S([O-])(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-L 0.000 description 1
- 239000003929 acidic solution Substances 0.000 description 1
- 230000001476 alcoholic effect Effects 0.000 description 1
- 230000001680 brushing effect Effects 0.000 description 1
- 239000003518 caustics Substances 0.000 description 1
- 239000000460 chlorine Substances 0.000 description 1
- 229910052801 chlorine Inorganic materials 0.000 description 1
- -1 chlorine ions Chemical class 0.000 description 1
- 230000006378 damage Effects 0.000 description 1
- 239000012153 distilled water Substances 0.000 description 1
- 230000008030 elimination Effects 0.000 description 1
- 238000003379 elimination reaction Methods 0.000 description 1
- 229910052739 hydrogen Inorganic materials 0.000 description 1
- 239000001257 hydrogen Substances 0.000 description 1
- 150000002500 ions Chemical class 0.000 description 1
- 229910052742 iron Inorganic materials 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 229910017604 nitric acid Inorganic materials 0.000 description 1
- 235000021110 pickles Nutrition 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 210000003462 vein Anatomy 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Chemical compound O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
Description
SIiMemtsGiLe Apparate fabrikSIiMemtsGiLe Apparatus factory
G.ßi.b .H.
IiixBberg9 Plat east ras a β 66.G.ßi.b .H.
IiixBberg 9 Plat east ras a β 66.
es an/Hr fflcktrolytkondensatoren.. it on / Hr flcktrolyte capacitors .. 
Zm Vergrösserung der Oberfläche von Aluminiumfolie η für Anoden und Kathoden, insbesondere für Elektrolyt*» kondensatoren oder als trägerplatte für Selengleichrichter and Photozellen werden die Pollen oder Platten, die aus Aluminium oder, im Falle der Selengleichrichter auch aus Iis« bestehen, mit starken anorganischen Säuren, vornehmlich Salzsäure, Schwefelsäure, Salpetersäure und dgl· oder deren Mischungen, behandelt. Auch wird häufig unter Yanvendung von Salzen und Säuren die Ätzung durchgeführt. Dabei kann die .Uzkung durch Verwendung von elektrischem Strom gesteigert oder genauer dosiert werden. To increase the surface area of aluminum foil η for anodes and cathodes, especially for electrolyte capacitors or as a carrier plate for selenium rectifiers and photocells, the pollen or plates, which are made of aluminum or, in the case of selenium rectifiers, also of Iis, are mixed with strong inorganic acids , mainly hydrochloric acid, sulfuric acid, nitric acid and the like or mixtures thereof. The etching is also often carried out using salts and acids. The use can be increased or more precisely dosed by using electric current.
Bei diesen Ätzmethoden hat sich ImmeT ergeben, dass es sehr schwierig ist, die geätzte Folie von den unerwünscht ten Besten der Ätzlösung, bzeu deren Salzen, zu befreien. Auch ist bekannt, dass bereits Spuren solcher Ätzmittel die Güte des Kondensators wesentlich benachteiligen können und frühzeitig zur eventuellen Zerstörung des Kondensators beitragen. line vollständige Befreiung der geätzten folie von Besten der Ätzlosungen ist praktisch kaum mit einem noch so grossen Aaftsad an Mitteln, insbesondere Spulen mit Saschaasser und destilliertem Wasser erzielbar.With these etching methods, ImmeT has found that it is very difficult to remove the etched foil from the undesired the best of the etching solution and its salts. It is also known that there are already traces of such caustic agents can significantly disadvantage the quality of the capacitor and at an early stage to the possible destruction of the capacitor contribute. line complete elimination of the etched film from the best of the etching solutions is practical hardly with a large amount of resources, especially spools of Saschaasser and distilled water achievable.
20.6.1949 Br.Ja/B.June 20, 1949 Br.Ja / B.
laoM» auch ©is mmhM si sokes Bnttexnen der Vsruexeinigungeti an den gsätzien Oberflächen des IltisiaiffiBBa @i»a dorak Bürsten, nicht möglich ist, sirä gen&ss der Sxfindung sn die Itsung οine weitere chemische Behanilung aageschl ssen und sraar mit Säuren, welche keine Giox, Sulfat- oder Mitxat-Ionen aufweisen, a la ο ait organischen Saaren8 die insbesondere si säe et ens mm Iarbo^Kyl-G-xqppe (-COOH-&ruppei enthalt en- Allgeaein sind alle organischen Säuren bzr,. deren SaLze iß saurer lösung brauchbar, welche Al aufzulösen ?ermögen. laoM »also © is mmhM si sokes Bnttexnen the Vsruexeinigungeti on the gsät zi en surfaces of the IltisiaiffiBB a @i» a dorak brushing, is not possible, sirä gen & ss the finding sn the itsung ο another chemical treatment, which ssen and sraar with acids have no Giox, sulfate or mitxate ions, a la ο ait organic acids 8 which in particular si säe et ens mm Iarbo ^ Kyl- G-xqppe (-COOH- & ruppei contain en- Generally all organic acids or their salts Eat acidic solutions that allow Al to dissolve?
Sa hat sich nun ge&eigt, dass.dazüh eine Nachbehandlung mit einer derartigen Säure, z.B. Essigsäure, nicht nur erreicht ntal, dass die Oberfllohe durch die Wasserstoffenfcwioklang bein BeisVoygaBg ve a den Chlor-Ionen ustsu weitgehende! befreit sird* sondexB es konnte festgestellt werden* üam gle iehzeitig mmh &im Iexgrosserang der lufrauhuug erzielt ~urd, ?iie Xapazitätsateesungen ergeben haben»It has now become agreed that an after-treatment with such an acid, e.g. acetic acid, not only achieved that the surface caused by the hydrogen enfcwio sounded at BeisVoygaBg ve a the chlorine ions ustsu extensive! exempted * sondexB it could be determined * at the same time mmh & in the Iexgrosserang the lufrauhuug achieved ~ and? the xcapacity readings have resulted »
Z.B. ergaben Anoden, die sit Salzsäure ader eise© SäuregeBiisoh geätzt waren, eise Kapazität iron 3. - 5 uF pro ?l^heneinheit. lach einer Sadi behandlung si.B. mit 2Q$iger Essigsäure warden 5 - 8 u?. erzielt, also eine Yexgxösisersing der Oberfläche ms ca. SO g>*For example, revealed anodes sit hydrochloric vein else © Säurege Biisoh etched were else capacity iron 3 - 5 uF per l ^ height unit?. laughing at a Sadi treatment si.B. with 2Q acetic acid, 5 - 8 u ?. achieved, i.e. a Yexgxösisersing of the surface ms approx. SO g> *
Bss ferfshxen ist nicht nur für Folien geeignet, sondern auch zum lachbeizen vm jeglichen Xapaaitatsträgem, also auch fur Anoden von naasen und halbnassen Elekt rollkondensator en, deren Elektrolyt aus wässerigen, alkoholischen und ähnlich« Xidsungen besteht and ebenso fix das Vexgxöss er η und Beinigen der Oberflächen der oft als Xathode beeei zeichneten Stxoaaufühiungselektrode der Elektx o3jikondensatoren. Ferfshxen bss is suitable not only for films but also for laughing pickle vm any Xapaaitatsträgem, al so also for anodes of naasen and semi-wet Elect roll capacitor s whose electrolyte consists of aqueous, alcoholic and similar "Xidsungen and also fix the Vexgxöss he η and legged the surfaces of the electrostatic discharge electrode, often referred to as the xathode, of the electrolytic capacitor.
Claims (2)
Family
ID=
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