DE893496C - Process for the production of highly dispersed silica - Google Patents

Process for the production of highly dispersed silica

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Publication number
DE893496C
DE893496C DED3519D DED0003519D DE893496C DE 893496 C DE893496 C DE 893496C DE D3519 D DED3519 D DE D3519D DE D0003519 D DED0003519 D DE D0003519D DE 893496 C DE893496 C DE 893496C
Authority
DE
Germany
Prior art keywords
production
highly dispersed
dispersed silica
silica
flammable
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
DED3519D
Other languages
German (de)
Inventor
Harry Dr Kloepfer
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Evonik Operations GmbH
Original Assignee
Degussa GmbH
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Degussa GmbH filed Critical Degussa GmbH
Priority to DED3519D priority Critical patent/DE893496C/en
Application granted granted Critical
Publication of DE893496C publication Critical patent/DE893496C/en
Expired legal-status Critical Current

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Classifications

    • BPERFORMING OPERATIONS; TRANSPORTING
    • B82NANOTECHNOLOGY
    • B82YSPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y30/00Nanotechnology for materials or surface science, e.g. nanocomposites
    • CCHEMISTRY; METALLURGY
    • C01INORGANIC CHEMISTRY
    • C01BNON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B13/00Oxygen; Ozone; Oxides or hydroxides in general
    • C01B13/14Methods for preparing oxides or hydroxides in general
    • C01B13/145After-treatment of oxides or hydroxides, e.g. pulverising, drying, decreasing the acidity
    • CCHEMISTRY; METALLURGY
    • C01INORGANIC CHEMISTRY
    • C01BNON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B13/00Oxygen; Ozone; Oxides or hydroxides in general
    • C01B13/14Methods for preparing oxides or hydroxides in general
    • C01B13/20Methods for preparing oxides or hydroxides in general by oxidation of elements in the gaseous state; by oxidation or hydrolysis of compounds in the gaseous state
    • C01B13/22Methods for preparing oxides or hydroxides in general by oxidation of elements in the gaseous state; by oxidation or hydrolysis of compounds in the gaseous state of halides or oxyhalides
    • CCHEMISTRY; METALLURGY
    • C01INORGANIC CHEMISTRY
    • C01BNON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B13/00Oxygen; Ozone; Oxides or hydroxides in general
    • C01B13/14Methods for preparing oxides or hydroxides in general
    • C01B13/20Methods for preparing oxides or hydroxides in general by oxidation of elements in the gaseous state; by oxidation or hydrolysis of compounds in the gaseous state
    • C01B13/22Methods for preparing oxides or hydroxides in general by oxidation of elements in the gaseous state; by oxidation or hydrolysis of compounds in the gaseous state of halides or oxyhalides
    • C01B13/30Removal and cooling of the oxide-containing suspension
    • CCHEMISTRY; METALLURGY
    • C01INORGANIC CHEMISTRY
    • C01BNON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B33/00Silicon; Compounds thereof
    • C01B33/113Silicon oxides; Hydrates thereof
    • C01B33/12Silica; Hydrates thereof, e.g. lepidoic silicic acid
    • C01B33/18Preparation of finely divided silica neither in sol nor in gel form; After-treatment thereof
    • C01B33/181Preparation of finely divided silica neither in sol nor in gel form; After-treatment thereof by a dry process
    • C01B33/183Preparation of finely divided silica neither in sol nor in gel form; After-treatment thereof by a dry process by oxidation or hydrolysis in the vapour phase of silicon compounds such as halides, trichlorosilane, monosilane
    • CCHEMISTRY; METALLURGY
    • C01INORGANIC CHEMISTRY
    • C01GCOMPOUNDS CONTAINING METALS NOT COVERED BY SUBCLASSES C01D OR C01F
    • C01G23/00Compounds of titanium
    • C01G23/04Oxides; Hydroxides
    • C01G23/047Titanium dioxide
    • C01G23/07Producing by vapour phase processes, e.g. halide oxidation
    • CCHEMISTRY; METALLURGY
    • C01INORGANIC CHEMISTRY
    • C01GCOMPOUNDS CONTAINING METALS NOT COVERED BY SUBCLASSES C01D OR C01F
    • C01G23/00Compounds of titanium
    • C01G23/04Oxides; Hydroxides
    • C01G23/047Titanium dioxide
    • C01G23/07Producing by vapour phase processes, e.g. halide oxidation
    • C01G23/075Evacuation and cooling of the gaseous suspension containing the oxide; Desacidification and elimination of gases occluded in the separated oxide
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09CTREATMENT OF INORGANIC MATERIALS, OTHER THAN FIBROUS FILLERS, TO ENHANCE THEIR PIGMENTING OR FILLING PROPERTIES ; PREPARATION OF CARBON BLACK  ; PREPARATION OF INORGANIC MATERIALS WHICH ARE NO SINGLE CHEMICAL COMPOUNDS AND WHICH ARE MAINLY USED AS PIGMENTS OR FILLERS
    • C09C3/00Treatment in general of inorganic materials, other than fibrous fillers, to enhance their pigmenting or filling properties
    • C09C3/04Physical treatment, e.g. grinding, treatment with ultrasonic vibrations
    • C09C3/043Drying, calcination
    • CCHEMISTRY; METALLURGY
    • C01INORGANIC CHEMISTRY
    • C01PINDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2004/00Particle morphology
    • C01P2004/60Particles characterised by their size
    • C01P2004/64Nanometer sized, i.e. from 1-100 nanometer
    • CCHEMISTRY; METALLURGY
    • C01INORGANIC CHEMISTRY
    • C01PINDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2006/00Physical properties of inorganic compounds
    • C01P2006/80Compositional purity

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Inorganic Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • General Life Sciences & Earth Sciences (AREA)
  • Geology (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Nanotechnology (AREA)
  • Physics & Mathematics (AREA)
  • Composite Materials (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Materials Engineering (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Silicon Compounds (AREA)

Description

Verfahren zur Herstellung hochdisperser Kieselsäure Die Erfindung Ibetrifft Maßna#hmen zur teel-iniologischen Weiterbildung von Verfahren zur Herstellung von feinstverteilter hochaktiver Kieselsäure, die 4en Gegenst#and von älteren Vorschlägen bilden und eine weitere Verbesserung der Eigenschaften durch gesteuerte Veränderung Ader Teilchengröße beinhalten.Process for the preparation of highly disperse silica. The invention I concerns measures for the tea-iniological further training of manufacturing processes of finely divided highly active silica, the 4th item from older proposals form and a further improvement of the properties through controlled change Or include particle size.

Nach älteren Vorschlägen erfotIgt die Herstellung von feinverteilten Metall- bzw. Metalloidoxyden, unter anderem auch von Siliciumdioxyd, durch kontinuierliche Zersetzung von flüchtigen Metall- oder Metalloidverbindungen in gasförmigem Zustand in Gegenwart von brennbaren und/oder unbrennbaren, vorzugsweise von sauerstoff)haltiggen Gasen in einer Flamme. Dabei werden die flüchtigen Verbindungen, in vorliegendem Fall z. B. Siliciumtetrachlorid, zusammen mit brennbaren, insbesondere Wasserstoff enthaltenden oder Wasserstoff bildenden und gegebenenfalls sauerstoffhaltigen Gasen der Flaimme kontinuierlich über Brenner bei Temperaturen unterhalb des Schmelzpunktes der Kieselsäure und mit horhen Strömungsgeschwindigkeiten zugeleitet. Die Temperaturen und die Strömungsgeschwindigkeiten werden so bemessen und die Flammeent-emperatur und die Verweilz-eit der zweckmäßig in Gegenwart von Wasserdampf gebilideten festen Oxydteilchen in der Reaktionszone derart aufeinander abgestimmt, daß unerwünschte Oberflächenveränderung,en, z. B. Rekristallisationen an den Oxydteilchen, vermieden werden. Die Strömungsgeschwindigkeit kann gegebenenfalls so hoch gewählt werden, daß die Umsetzung der Reaktionskomponenten erst in einem gewissen Abstand von der Brennermündung stattfindet. Weiterhin werden die Reaktionsprodukte rasch aus der Flammenzone entfernt und unter Aufrechterhaltung von Temperaturen oberhalb des Taupunktes der bei der Umsetzung entstandenen, leicht kondensierbaren gasförmigen Reaktionsprodulkte abgekühlt. Nach den erwähnten älteren Vorschlägen werden die Oxyde, also z. B. Kieselsäurt, als Aerosole gebildet, durch KoaguJation in die Aerogelforrn übergefährt und so abgeschieden bzw. gewonnen. Die Abscheidung dieser Oxyde 'kann in an sich bekannten Vorrichtungen, wie Filtern, Zyklonen oder elektrischen Abscheidern, z. B. nach dem Cottrell-Verfahren, oder auch an gekühlten, gegebenenfalls bewegten Flüchen, vorteilhaft an Walzen, erfC1gen, wobei dann zweckmäßig durch geei,-neteAbstreifvorri.c,htung" dafür So-rge getragen wird,daß die einmad abgeschiedenen Oxydteilchen vor erneuter Einwirkung der Flamine geschützt werden.According to older proposals, the production of finely divided Metal or metalloid oxides, including silicon dioxide, by continuous Decomposition of volatile metal or metalloid compounds in a gaseous state in the presence of combustible and / or non-combustible, preferably oxygen) containing Gases in a flame. In doing so, the volatile compounds, in the present Case z. B. silicon tetrachloride, together with flammable, especially hydrogen containing or hydrogen-forming and optionally oxygen-containing gases the flaimme continuously over burners at temperatures below the melting point the silica and fed at high flow rates. The temperatures and the flow velocities are measured and the flame ent-emperatur and the dwell time of the solids expediently formed in the presence of water vapor Oxide particles in the reaction zone matched to one another in such a way that undesired Surface change, s, e.g. B. Recrystallizations on the oxide particles avoided will. The flow rate can optionally be chosen so high that that the implementation of the reaction components only in a certain Distance from the burner mouth takes place. Furthermore, the reaction products rapidly removed from the flame zone and while maintaining temperatures above the dew point of the easily condensable formed during the implementation gaseous reaction products cooled. According to the older proposals mentioned the oxides, so z. B. Silicic acid, formed as aerosols, by coagulation transferred into the airgel form and thus deposited or obtained. The deposition this Oxyde 'can be in known devices, such as filters, or cyclones electrical separators, e.g. B. according to the Cottrell process, or also on cooled, possibly moving curses, advantageously on rollers, in which case it is expedient by suitable stripping equipment, so-rge is worn that the unmarried deposited oxide particles are protected from renewed exposure to the flamines.

Es hat sich nun gezeigt, daß die Teilchengröße der nach den verschiedenen Verfahren gewonnenen hochdispersen Kieselsä * ure wesentlich von der Beladung des jeweilig verwendeten Traggases mit Siliciumhalogeniddampf abhängt, wobei mit der Veränderung der Teilchengröße auch. die- Eigenschaften -der als Aerogel gewonnenen Kieselsäure schwanken. Es wurde nun gefunden, daß Kieselsäure mit verbesserten Eigenschaften, beispielsweise hinsichtlich der Aktivität, erhalten wird, wenn man je Kubikmeter Traggas eine Beladung von weniger als 2500-, vorzugsweise weniger als el 2ooo g' an Siliciumhalogemd aufrechterhält. je geringer die Beladung des Traggases ist, um so feiner fall-en die Oxydteilchen an. Aus wirtschaftlichen Gründen wird man im Interesse eines guten Durchsatzes mit der Beladung nicht zu tief, z. B. nicht unter 5oo. g/cbm, hinuntergehen. Erfindungsgemäß werden sehr gute Ergebnisse erhalten, wenn eine Traggasbeladung von etwa iooo,g Siliciumhalogenid je Kubikmeter gewählt wird. Wird die Beladung des Traggases dagegen auf mehr als 250CK9 Silicium-hälogenid gesteigert, so tritt eine stärkere Vergröberung der Teilchen. ein, wobei die Aktivität und auch die sonstigen wertvollen Eigenschaften der erfindungsgemäß hergestellten Kieselsäure, beispielsweise ihre Fähigkeit, Flüssigkeiten zu verdicken, relativ rasch abnehmen. - Als Traggag im Sinne der vorliegenden Erfindung, gelten alle brennbaren oder nichtbrennbaren Gase mit Ausnahme -des Siliciumhalogeniddampfes, also etwa Wasserstoff, Methan, Ltuchtgas, Wassergas, Kokereigas und andere, gegebenenfalls zusammen mit Sauerstoff.It has now been found that the particle size of the obtained by the various processes fumed Kieselsä * ure significantly from the loading of the carrier gas used in each case depends with Siliciumhalogeniddampf, wherein with the change of the particle size. the properties of the silica obtained as an airgel vary. It has now been found that silica with improved properties, for example in terms of activity, is obtained if a load of less than 2500, preferably less than el 2,000 g ' of silicon halide is maintained per cubic meter of carrier gas. the lower the load on the carrier gas, the finer the oxide particles. For economic reasons, in the interest of a good throughput, the load is not too deep, e.g. B. not below 5oo. g / cbm, go down. According to the invention, very good results are obtained if a carrier gas loading of about 100 g silicon halide per cubic meter is selected. If, on the other hand, the loading of the carrier gas is increased to more than 250CK9 silicon-halide, the particles become more coarse. a, the activity and also the other valuable properties of the silica prepared according to the invention, for example its ability to thicken liquids, decrease relatively quickly. - As Traggag in the sense of the present invention, all flammable or non-flammable gases with the exception of silicon halide vapor, so about hydrogen, methane, air gas, water gas, coke oven gas and others, optionally together with oxygen.

Claims (1)

PATENTANTSPRUCH: Verfahren zur Herstellung hochdisperser Kieselsäure durch Verbrennung von mit Siliciumhalo,-,eniddarnpf beladenen brennbaren und/ oder nichtbrennbaren, vorzugsweise sauerstaffhaltigen Gasen, dadurch gekennzeichnet, daß die Beladung des Traggases mit Siliciumhalogenid weniger als 2,5oo -, vorzugsweise weniger als 2ooo.g, z. B. etwa iooo g/cl)rn beträgt.PATENT CLAIM: Process for the production of highly dispersed silica by combustion of flammable and / or non-flammable, preferably oxygen-containing, gases loaded with silicon halide, eniddam, characterized in that the loading of the carrier gas with silicon halide is less than 2.5oo , preferably less than 2ooo.g , e.g. B. is about 100 g / cl) rn.
DED3519D 1943-07-14 1943-07-14 Process for the production of highly dispersed silica Expired DE893496C (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
DED3519D DE893496C (en) 1943-07-14 1943-07-14 Process for the production of highly dispersed silica

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DED3519D DE893496C (en) 1943-07-14 1943-07-14 Process for the production of highly dispersed silica
DE1007493X 1948-12-31

Publications (1)

Publication Number Publication Date
DE893496C true DE893496C (en) 1953-10-15

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DED3519D Expired DE893496C (en) 1943-07-14 1943-07-14 Process for the production of highly dispersed silica

Country Status (1)

Country Link
DE (1) DE893496C (en)

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