DE846805C - Process for cleaning metal foil that has been roughened by etching - Google Patents

Process for cleaning metal foil that has been roughened by etching

Info

Publication number
DE846805C
DE846805C DEP6759A DEP0006759A DE846805C DE 846805 C DE846805 C DE 846805C DE P6759 A DEP6759 A DE P6759A DE P0006759 A DEP0006759 A DE P0006759A DE 846805 C DE846805 C DE 846805C
Authority
DE
Germany
Prior art keywords
etching
metal foil
roughened
cleaning metal
cleaning
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
DEP6759A
Other languages
German (de)
Inventor
Hildegard Dipl-Ing Dahle
Hermann Rosenfeld
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
FRIEDRICH UHLMANN DIPL ING
Original Assignee
FRIEDRICH UHLMANN DIPL ING
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by FRIEDRICH UHLMANN DIPL ING filed Critical FRIEDRICH UHLMANN DIPL ING
Priority to DEP6759A priority Critical patent/DE846805C/en
Application granted granted Critical
Publication of DE846805C publication Critical patent/DE846805C/en
Expired legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23F—NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
    • C23F1/00—Etching metallic material by chemical means
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23G—CLEANING OR DE-GREASING OF METALLIC MATERIAL BY CHEMICAL METHODS OTHER THAN ELECTROLYSIS
    • C23G5/00—Cleaning or de-greasing metallic material by other methods; Apparatus for cleaning or de-greasing metallic material with organic solvents

Description

Verfahren zum Reinigen von durch Ätzen aufgerauhter Metallfolie Es ist bekannt, die Oberfläche von Metallfolie, beispielsweise Aluminiumfolie, durch Ätzen aufzuraulien und dadurch zu vergrößern. Auf diese Weise behandelte Metallfolie muß vor ihrer Weiterverweiidung gereinigt werden. Nach den bekannten Reinigungsverfahren konnte die geätzte Folie aller bisher nicht restlos von den Ätzmitteln, z.13. von Chlorionen, befreit werden. Dieser Umstand ist z. B. dann von großem Nachteil, wenn die h@ili<# zur Ilerstellung von Elektrolytkondensatoren ver@@ endet «-erden soll. Die bisher unvermeidlich zurückbleibenden Verunreinigungen verursacliten einen urierwünscht großen Reststrom. l'berdies setzten sie die Betriebssicherheit des Kondensators herab. Da finit zunehmendem Ätzen die Oberfläche, aller auch der Verunreinigungsgrad, wächst, konnte man die Oberflächenvergrößerung mit Rücksicht darauf nicht so weit treiben, wie es ati sich möglich gewesen wäre.Process for cleaning metal foil roughened by etching Es is known to pass the surface of metal foil, for example aluminum foil To curl up the etching and thereby enlarge it. Metal foil treated in this way must be cleaned before they can be further grazed. According to the known cleaning process could the etched foil of all so far not completely from the etching agents, z.13. from Chlorine ions, are released. This fact is z. B. then of great disadvantage when the h @ ili <# for the production of electrolytic capacitors ends «-grounds target. The so far inevitable remaining impurities cause one urierwishes large residual current. In addition, they set the operational safety of the Capacitor down. Since the surface finitely increasing etching, all also the degree of contamination, grows, one could not increase the surface area so far with that in mind drift as it would have been possible ati.

Dieser 'Mangel wird durch das Reinigungsverfahren gemäß der Erfindung beseitigt. Es kennzeichnet sich dadurch, daß die geätzte Folie, gegebenenfalls nach Anwendung der bekannten Reinigungsverfahren, strömendem Wasserdampf ausgesetzt wird. Auf diese Weise werden auch die letzten Spuren von Verunreinigungen entfernt. Infolgedessen kann die chemische Ätzung, also die ( )berflächenvergrößerung, viel weiter getrieben -,verden als es bisher möglich war. Der Reststrom sinkt dadurch auf den praktisch erreichbaren Mindestwert; für gleiche Leistung kann eine kleinere Koiidensatorfläche verwendet werden. Der fertige Kondensator nimmt dadurch einen geringeren Ratini ein und hat ein kleineres Gewicht. Zugleich nehmen seine Betriebssicherheit und seine Lebensdauer zu.This deficiency is made up by the cleaning method according to the invention eliminated. It is characterized in that the etched film, if necessary after Using the known cleaning process, exposed to flowing water vapor. This also removes the last traces of contamination. Consequently chemical etching, i.e. the () enlargement of the surface, can be taken much further -, verden than it was previously possible. The residual current drops to the practically achievable minimum value; a smaller capacitor area can be used for the same output be used. The finished capacitor thus takes a lower ratio one and has a smaller weight. Simultaneously take its operational safety and its lifespan too.

Claims (1)

PATENTANSPRÜCHE: i. Verfahren zum Reinigen von durch Ätzen aufgerauhter Metallfolie, dadurch gekennzeichnet, daß sie strömendem Wasserdampf ausgesetzt wird. z. `'erfahren nach Anspruch i. dadurch gekennzeichnet, daß die -Metallfolie nach Anwendung der bekannten Reinigungsverfahren strömendem Wasserdampf ausgesetzt wird.PATENT CLAIMS: i. Process for cleaning roughened by etching Metal foil, characterized in that it is exposed to flowing water vapor. z. '' experience according to claim i. characterized in that the metal foil after Application of the known cleaning process is exposed to flowing steam.
DEP6759A 1948-10-02 1948-10-02 Process for cleaning metal foil that has been roughened by etching Expired DE846805C (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
DEP6759A DE846805C (en) 1948-10-02 1948-10-02 Process for cleaning metal foil that has been roughened by etching

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DEP6759A DE846805C (en) 1948-10-02 1948-10-02 Process for cleaning metal foil that has been roughened by etching

Publications (1)

Publication Number Publication Date
DE846805C true DE846805C (en) 1952-08-18

Family

ID=7360817

Family Applications (1)

Application Number Title Priority Date Filing Date
DEP6759A Expired DE846805C (en) 1948-10-02 1948-10-02 Process for cleaning metal foil that has been roughened by etching

Country Status (1)

Country Link
DE (1) DE846805C (en)

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