DE69938354D1 - Programmierter elektronenfluss - Google Patents

Programmierter elektronenfluss

Info

Publication number
DE69938354D1
DE69938354D1 DE69938354T DE69938354T DE69938354D1 DE 69938354 D1 DE69938354 D1 DE 69938354D1 DE 69938354 T DE69938354 T DE 69938354T DE 69938354 T DE69938354 T DE 69938354T DE 69938354 D1 DE69938354 D1 DE 69938354D1
Authority
DE
Germany
Prior art keywords
electron flow
programmed electron
programmed
flow
electron
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE69938354T
Other languages
English (en)
Other versions
DE69938354T2 (de
Inventor
Duane P Littlejohn
Robert W Arnold
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Siemens Industry Inc
Original Assignee
Siemens Applied Automation Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Siemens Applied Automation Inc filed Critical Siemens Applied Automation Inc
Publication of DE69938354D1 publication Critical patent/DE69938354D1/de
Application granted granted Critical
Publication of DE69938354T2 publication Critical patent/DE69938354T2/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J49/00—Particle spectrometers or separator tubes
    • H01J49/02—Details
    • H01J49/10—Ion sources; Ion guns
    • H01J49/14—Ion sources; Ion guns using particle bombardment, e.g. ionisation chambers
    • H01J49/147—Ion sources; Ion guns using particle bombardment, e.g. ionisation chambers with electrons, e.g. electron impact ionisation, electron attachment
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J49/00—Particle spectrometers or separator tubes
    • H01J49/02—Details
    • H01J49/022—Circuit arrangements, e.g. for generating deviation currents or voltages ; Components associated with high voltage supply
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J49/00—Particle spectrometers or separator tubes
    • H01J49/26—Mass spectrometers or separator tubes
    • H01J49/34—Dynamic spectrometers
    • H01J49/36—Radio frequency spectrometers, e.g. Bennett-type spectrometers, Redhead-type spectrometers
    • H01J49/38—Omegatrons ; using ion cyclotron resonance

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Other Investigation Or Analysis Of Materials By Electrical Means (AREA)
DE69938354T 1998-10-16 1999-10-13 Programmierter elektronenfluss Expired - Lifetime DE69938354T2 (de)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US173855 1998-10-16
US09/173,855 US6255648B1 (en) 1998-10-16 1998-10-16 Programmed electron flux
PCT/US1999/021630 WO2000024036A1 (en) 1998-10-16 1999-10-13 Programmed electron flux

Publications (2)

Publication Number Publication Date
DE69938354D1 true DE69938354D1 (de) 2008-04-24
DE69938354T2 DE69938354T2 (de) 2009-01-22

Family

ID=22633809

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69938354T Expired - Lifetime DE69938354T2 (de) 1998-10-16 1999-10-13 Programmierter elektronenfluss

Country Status (5)

Country Link
US (1) US6255648B1 (de)
EP (1) EP1121709B1 (de)
CA (1) CA2345384A1 (de)
DE (1) DE69938354T2 (de)
WO (1) WO2000024036A1 (de)

Families Citing this family (20)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6628740B2 (en) 1997-10-17 2003-09-30 The Regents Of The University Of California Controlled fusion in a field reversed configuration and direct energy conversion
US6894446B2 (en) * 1997-10-17 2005-05-17 The Regents Of The University Of California Controlled fusion in a field reversed configuration and direct energy conversion
US6630663B2 (en) * 1998-10-21 2003-10-07 Raytheon Company Miniature ion mobility spectrometer
US6664740B2 (en) 2001-02-01 2003-12-16 The Regents Of The University Of California Formation of a field reversed configuration for magnetic and electrostatic confinement of plasma
US6611106B2 (en) * 2001-03-19 2003-08-26 The Regents Of The University Of California Controlled fusion in a field reversed configuration and direct energy conversion
US20060075968A1 (en) * 2004-10-12 2006-04-13 Applied Materials, Inc. Leak detector and process gas monitor
TWI243492B (en) * 2004-11-03 2005-11-11 Epistar Corp Light-emitting diodes
US9607719B2 (en) * 2005-03-07 2017-03-28 The Regents Of The University Of California Vacuum chamber for plasma electric generation system
US8031824B2 (en) 2005-03-07 2011-10-04 Regents Of The University Of California Inductive plasma source for plasma electric generation system
US9123512B2 (en) 2005-03-07 2015-09-01 The Regents Of The Unviersity Of California RF current drive for plasma electric generation system
JP4944502B2 (ja) * 2006-06-09 2012-06-06 パナソニック株式会社 放電点灯装置および照明器具。
MX337413B (es) 2011-11-14 2016-03-02 Univ California Sistemas y metodos para formar y mantener una configuracion invertida de campo de alto rendimiento.
ES2658084T3 (es) 2013-09-24 2018-03-08 Tae Technologies, Inc. Método para formar y mantener una FRC de alto rendimiento
SI3187028T1 (sl) 2014-10-13 2020-03-31 Tae Technologies, Inc. Sistem za strnjevanje in zgošćanje kompaktnih torusov
SI3213608T1 (sl) 2014-10-30 2019-11-29 Tae Tech Inc Sistem in postopek za tvorjenje in ohranjanje plazme v visokozmogljivem FRC
MX2017014466A (es) 2015-05-12 2018-04-10 Tri Alpha Energy Inc Sistemas y metodos para reducir las corrientes parasitas no deseadas.
CN108352199B (zh) 2015-11-13 2022-09-09 阿尔法能源技术公司 用于frc等离子体位置稳定性的系统和方法
WO2018081724A1 (en) 2016-10-28 2018-05-03 Tae Technologies, Inc. Systems and methods for improved sustainment of a high performance frc elevated energies utilizing neutral beam injectors with tunable beam energies
UA127712C2 (uk) 2016-11-04 2023-12-13 Тае Текнолоджіз, Інк. Системи і способи поліпшеної підтримки високоефективної конфігурації з оберненим полем з вакуумуванням із захопленням багатомасштабного типу
PE20190836A1 (es) 2016-11-15 2019-06-17 Tae Tech Inc Sistemas y metodos para mejorar el sostenimiento de una frc de alto rendimiento y un calentado de los electrones de onda rapida de alta armonica en una frc de alto redimiento

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2544716A (en) * 1947-10-31 1951-03-13 Univ Minnesota Filament-plate voltage system
US3247373A (en) * 1962-12-18 1966-04-19 Gca Corp Mass spectrometer leak detector with means for controlling the ion source output
US3937955A (en) 1974-10-15 1976-02-10 Nicolet Technology Corporation Fourier transform ion cyclotron resonance spectroscopy method and apparatus
US5107109A (en) * 1986-03-07 1992-04-21 Finnigan Corporation Method of increasing the dynamic range and sensitivity of a quadrupole ion trap mass spectrometer
US4808820A (en) * 1987-09-23 1989-02-28 Hewlett-Packard Company Electron-emission filament cutoff for gas chromatography + mass spectrometry systems
US5313061A (en) 1989-06-06 1994-05-17 Viking Instrument Miniaturized mass spectrometer system

Also Published As

Publication number Publication date
DE69938354T2 (de) 2009-01-22
US6255648B1 (en) 2001-07-03
WO2000024036A1 (en) 2000-04-27
EP1121709B1 (de) 2008-03-12
CA2345384A1 (en) 2000-04-27
EP1121709A1 (de) 2001-08-08

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Legal Events

Date Code Title Description
8327 Change in the person/name/address of the patent owner

Owner name: SIEMENS ENERGY & AUTOMATION, INC., ALPHARETTA,, US

8364 No opposition during term of opposition
8327 Change in the person/name/address of the patent owner

Owner name: SIEMENS INDUSTRY, INC. (N.D.GES.D. STAATES DEL, US