DE69918661D1 - Verfahren und Vorrichtung zum Messen von Musterstrukturen - Google Patents

Verfahren und Vorrichtung zum Messen von Musterstrukturen

Info

Publication number
DE69918661D1
DE69918661D1 DE69918661T DE69918661T DE69918661D1 DE 69918661 D1 DE69918661 D1 DE 69918661D1 DE 69918661 T DE69918661 T DE 69918661T DE 69918661 T DE69918661 T DE 69918661T DE 69918661 D1 DE69918661 D1 DE 69918661D1
Authority
DE
Germany
Prior art keywords
pattern structures
measuring pattern
measuring
structures
pattern
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE69918661T
Other languages
English (en)
Other versions
DE69918661T2 (de
Inventor
David Scheiner
Moshe Finarov
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nova Ltd
Original Assignee
Nova Measuring Instruments Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nova Measuring Instruments Ltd filed Critical Nova Measuring Instruments Ltd
Application granted granted Critical
Publication of DE69918661D1 publication Critical patent/DE69918661D1/de
Publication of DE69918661T2 publication Critical patent/DE69918661T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B11/00—Measuring arrangements characterised by the use of optical techniques
    • G01B11/02—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B11/00—Measuring arrangements characterised by the use of optical techniques
    • G01B11/02—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness
    • G01B11/06—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material
    • G01B11/0616—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material of coating
    • G01B11/0625—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material of coating with measurement of absorption or reflection

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Investigating Or Analysing Materials By Optical Means (AREA)
DE69918661T 1999-03-16 1999-03-16 Verfahren und Vorrichtung zum Messen von Musterstrukturen Expired - Fee Related DE69918661T2 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
EP19990105405 EP1037012B1 (de) 1999-03-16 1999-03-16 Verfahren und Vorrichtung zum Messen von Musterstrukturen

Publications (2)

Publication Number Publication Date
DE69918661D1 true DE69918661D1 (de) 2004-08-19
DE69918661T2 DE69918661T2 (de) 2005-07-21

Family

ID=8237789

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69918661T Expired - Fee Related DE69918661T2 (de) 1999-03-16 1999-03-16 Verfahren und Vorrichtung zum Messen von Musterstrukturen

Country Status (2)

Country Link
EP (1) EP1037012B1 (de)
DE (1) DE69918661T2 (de)

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7115858B1 (en) 2000-09-25 2006-10-03 Nanometrics Incorporated Apparatus and method for the measurement of diffracting structures
US6898537B1 (en) 2001-04-27 2005-05-24 Nanometrics Incorporated Measurement of diffracting structures using one-half of the non-zero diffracted orders
US6713753B1 (en) 2001-07-03 2004-03-30 Nanometrics Incorporated Combination of normal and oblique incidence polarimetry for the characterization of gratings
US7061615B1 (en) 2001-09-20 2006-06-13 Nanometrics Incorporated Spectroscopically measured overlay target
US6982793B1 (en) 2002-04-04 2006-01-03 Nanometrics Incorporated Method and apparatus for using an alignment target with designed in offset
US6949462B1 (en) 2002-04-04 2005-09-27 Nanometrics Incorporated Measuring an alignment target with multiple polarization states
US6992764B1 (en) 2002-09-30 2006-01-31 Nanometrics Incorporated Measuring an alignment target with a single polarization state
US8814834B2 (en) 2008-03-10 2014-08-26 Antares Pharma, Inc. Injector safety device
US9310296B2 (en) 2011-06-20 2016-04-12 Kla-Tencor Corporation Optimizing an optical parametric model for structural analysis using optical critical dimension (OCD) metrology

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4555767A (en) * 1982-05-27 1985-11-26 International Business Machines Corporation Method and apparatus for measuring thickness of epitaxial layer by infrared reflectance
JPH0731050B2 (ja) * 1988-12-29 1995-04-10 オリンパス光学工業株式会社 光学式膜厚測定装置
US5450205A (en) * 1993-05-28 1995-09-12 Massachusetts Institute Of Technology Apparatus and method for real-time measurement of thin film layer thickness and changes thereof
US5604581A (en) * 1994-10-07 1997-02-18 On-Line Technologies, Inc. Film thickness and free carrier concentration analysis method and apparatus
US5900633A (en) * 1997-12-15 1999-05-04 On-Line Technologies, Inc Spectrometric method for analysis of film thickness and composition on a patterned sample

Also Published As

Publication number Publication date
EP1037012B1 (de) 2004-07-14
EP1037012A1 (de) 2000-09-20
DE69918661T2 (de) 2005-07-21

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee