DE69820177D1 - Stabilisator für Organoboratsalze und diese enthaltende photoempfindliche Zusammensetzung - Google Patents

Stabilisator für Organoboratsalze und diese enthaltende photoempfindliche Zusammensetzung

Info

Publication number
DE69820177D1
DE69820177D1 DE69820177T DE69820177T DE69820177D1 DE 69820177 D1 DE69820177 D1 DE 69820177D1 DE 69820177 T DE69820177 T DE 69820177T DE 69820177 T DE69820177 T DE 69820177T DE 69820177 D1 DE69820177 D1 DE 69820177D1
Authority
DE
Germany
Prior art keywords
stabilizer
compound
photosensitive composition
composition containing
disclosed
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE69820177T
Other languages
English (en)
Other versions
DE69820177T2 (de
Inventor
Tomonari Ogata
Tsuyoshi Katoh
Tomoe Uematsu
Norihide Arai
Tomoki Okano
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Resonac Holdings Corp
Original Assignee
Showa Denko KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Showa Denko KK filed Critical Showa Denko KK
Publication of DE69820177D1 publication Critical patent/DE69820177D1/de
Application granted granted Critical
Publication of DE69820177T2 publication Critical patent/DE69820177T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
    • C07F5/00—Compounds containing elements of Groups 3 or 13 of the Periodic Table
    • C07F5/02—Boron compounds
    • C07F5/027—Organoboranes and organoborohydrides
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41M—PRINTING, DUPLICATING, MARKING, OR COPYING PROCESSES; COLOUR PRINTING
    • B41M5/00—Duplicating or marking methods; Sheet materials for use therein
    • B41M5/26—Thermography ; Marking by high energetic means, e.g. laser otherwise than by burning, and characterised by the material used
    • B41M5/36—Thermography ; Marking by high energetic means, e.g. laser otherwise than by burning, and characterised by the material used using a polymeric layer, which may be particulate and which is deformed or structurally changed with modification of its' properties, e.g. of its' optical hydrophobic-hydrophilic, solubility or permeability properties
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds

Landscapes

  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Optics & Photonics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Polymerisation Methods In General (AREA)
  • Materials For Photolithography (AREA)
  • Anti-Oxidant Or Stabilizer Compositions (AREA)
DE69820177T 1997-08-26 1998-08-25 Stabilisator für Organoboratsalze und diese enthaltende photoempfindliche Zusammensetzung Expired - Fee Related DE69820177T2 (de)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
JP22937697 1997-08-26
JP22937697 1997-08-26
JP19908098 1998-07-14
JP19908098 1998-07-14

Publications (2)

Publication Number Publication Date
DE69820177D1 true DE69820177D1 (de) 2004-01-15
DE69820177T2 DE69820177T2 (de) 2004-11-04

Family

ID=26511329

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69820177T Expired - Fee Related DE69820177T2 (de) 1997-08-26 1998-08-25 Stabilisator für Organoboratsalze und diese enthaltende photoempfindliche Zusammensetzung

Country Status (4)

Country Link
EP (1) EP0900800B1 (de)
AT (1) ATE255585T1 (de)
DE (1) DE69820177T2 (de)
TW (1) TW533216B (de)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100644847B1 (ko) 1999-02-26 2006-11-13 쇼와 덴코 가부시키가이샤 칼라필터용 광중합 개시제, 감광성 착색 조성물 및 칼라필터
AU2003224454A1 (en) * 2002-02-28 2003-09-09 Showa Denko K.K. Thiol compound, photopolymerization initiator composition and photosensitive composition
JP2004198542A (ja) * 2002-12-16 2004-07-15 Showa Denko Kk カラーフィルターブラックマトリックスレジスト組成物及びその組成物に用いる感光性組成物
WO2005103823A1 (en) * 2004-04-23 2005-11-03 Showa Denko K.K. Photosensitive composition for black matrix

Also Published As

Publication number Publication date
EP0900800A2 (de) 1999-03-10
EP0900800B1 (de) 2003-12-03
TW533216B (en) 2003-05-21
DE69820177T2 (de) 2004-11-04
EP0900800A3 (de) 2000-08-02
ATE255585T1 (de) 2003-12-15

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee