DE69810994T2 - Bilderzeugungsverfahren - Google Patents

Bilderzeugungsverfahren

Info

Publication number
DE69810994T2
DE69810994T2 DE69810994T DE69810994T DE69810994T2 DE 69810994 T2 DE69810994 T2 DE 69810994T2 DE 69810994 T DE69810994 T DE 69810994T DE 69810994 T DE69810994 T DE 69810994T DE 69810994 T2 DE69810994 T2 DE 69810994T2
Authority
DE
Germany
Prior art keywords
imaging process
imaging
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE69810994T
Other languages
English (en)
Other versions
DE69810994D1 (de
Inventor
Michael John Simons
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Eastman Kodak Co
Original Assignee
Eastman Kodak Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Eastman Kodak Co filed Critical Eastman Kodak Co
Publication of DE69810994D1 publication Critical patent/DE69810994D1/de
Application granted granted Critical
Publication of DE69810994T2 publication Critical patent/DE69810994T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0002—Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y40/00—Manufacture or treatment of nanostructures
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T156/00—Adhesive bonding and miscellaneous chemical manufacture
    • Y10T156/10—Methods of surface bonding and/or assembly therefor

Landscapes

  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Nanotechnology (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Manufacturing & Machinery (AREA)
  • Mathematical Physics (AREA)
  • Theoretical Computer Science (AREA)
  • Ink Jet Recording Methods And Recording Media Thereof (AREA)
  • Ink Jet (AREA)
DE69810994T 1997-06-04 1998-05-28 Bilderzeugungsverfahren Expired - Fee Related DE69810994T2 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
GBGB9711427.6A GB9711427D0 (en) 1997-06-04 1997-06-04 Method of forming an image

Publications (2)

Publication Number Publication Date
DE69810994D1 DE69810994D1 (de) 2003-03-06
DE69810994T2 true DE69810994T2 (de) 2003-10-30

Family

ID=10813484

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69810994T Expired - Fee Related DE69810994T2 (de) 1997-06-04 1998-05-28 Bilderzeugungsverfahren

Country Status (5)

Country Link
US (1) US6066215A (de)
EP (1) EP0883025B1 (de)
JP (1) JPH115302A (de)
DE (1) DE69810994T2 (de)
GB (1) GB9711427D0 (de)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6352341B2 (en) * 1998-12-18 2002-03-05 Eastman Kodak Company Ink jet printing process
WO2008051432A2 (en) * 2006-10-19 2008-05-02 President And Fellows Of Harvard College Patterning of ionic polymers
BRPI0722207A2 (pt) * 2007-12-14 2014-06-24 Hewlett Packard Development Co Conjunto de tinta para uso na impressão por jato de tinta, conjunto de tinta para impressão por jato de tinta e método de impressão em mídias não-porosas ou de baixa porosidade

Family Cites Families (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB355303A (en) * 1930-02-24 1931-08-24 Hugh Cecil Saunders Improved means for mounting and viewing positive photographs
US3811882A (en) * 1972-05-25 1974-05-21 Vjg Inc Wipe on color proofing process and product
DE2253944C2 (de) * 1972-11-03 1983-02-24 Agfa-Gevaert Ag, 5090 Leverkusen Verfahren zur Herstellung eines Reliefbildes
AT374015B (de) * 1981-07-31 1984-03-12 Bleier Johann Dipl Ing Verfahren zur herstellung fotografischer reproduktionen
US4503110A (en) * 1982-07-26 1985-03-05 Skene Paula H Foil embossing method
DE3669932D1 (de) * 1985-02-04 1990-05-03 Agfa Gevaert Nv Verfahren zur herstellung von vielfarbigen strich-kolloidmustern oder gerasterten kolloidmustern.
US4798741A (en) * 1985-12-13 1989-01-17 E. I. Du Pont De Nemours And Company Preparation of microencapsulated pigment
FR2606778B1 (fr) * 1986-11-14 1989-02-10 Charbonnages Ste Chimique Procede de reticulation
DE3736645A1 (de) * 1987-10-29 1989-05-11 Du Pont Deutschland System zur herstellung punktgeaetzter lithographischer filme
JPH05173010A (ja) * 1991-12-20 1993-07-13 Toray Ind Inc カラ−フィルタ
US5270078A (en) * 1992-08-14 1993-12-14 E. I. Du Pont De Nemours And Company Method for preparing high resolution wash-off images
US5380769A (en) * 1993-01-19 1995-01-10 Tektronix Inc. Reactive ink compositions and systems
US5466653A (en) * 1994-06-29 1995-11-14 E. I. Du Pont De Nemours And Company Method for preparing negative-working wash-off relief images and non-photosensitive elements for use therein

Also Published As

Publication number Publication date
DE69810994D1 (de) 2003-03-06
EP0883025A1 (de) 1998-12-09
JPH115302A (ja) 1999-01-12
US6066215A (en) 2000-05-23
GB9711427D0 (en) 1997-07-30
EP0883025B1 (de) 2003-01-29

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee