DE69805924D1 - CVD-Verfahren zum Herstellen einer mehrlagigen Beschichtung auf Ti-Al-N Basis - Google Patents

CVD-Verfahren zum Herstellen einer mehrlagigen Beschichtung auf Ti-Al-N Basis

Info

Publication number
DE69805924D1
DE69805924D1 DE69805924T DE69805924T DE69805924D1 DE 69805924 D1 DE69805924 D1 DE 69805924D1 DE 69805924 T DE69805924 T DE 69805924T DE 69805924 T DE69805924 T DE 69805924T DE 69805924 D1 DE69805924 D1 DE 69805924D1
Authority
DE
Germany
Prior art keywords
titanium
nitride
multilayer coating
producing
layer coating
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE69805924T
Other languages
English (en)
Other versions
DE69805924T2 (de
Inventor
Stephanie Anderbouhr
Frederic Schuster
Elisabeth Blanquet
Gerald Theret
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Commissariat a lEnergie Atomique et aux Energies Alternatives CEA
Original Assignee
Commissariat a lEnergie Atomique CEA
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Commissariat a lEnergie Atomique CEA filed Critical Commissariat a lEnergie Atomique CEA
Publication of DE69805924D1 publication Critical patent/DE69805924D1/de
Application granted granted Critical
Publication of DE69805924T2 publication Critical patent/DE69805924T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/448Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials
    • C23C16/4488Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials by in situ generation of reactive gas by chemical or electrochemical reaction
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/30Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
    • C23C16/34Nitrides

Landscapes

  • Chemical & Material Sciences (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Electrochemistry (AREA)
  • Inorganic Chemistry (AREA)
  • Chemical Vapour Deposition (AREA)
DE69805924T 1997-08-29 1998-08-27 CVD-Verfahren zum Herstellen einer mehrlagigen Beschichtung auf Ti-Al-N Basis Expired - Fee Related DE69805924T2 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
FR9710801A FR2767841B1 (fr) 1997-08-29 1997-08-29 PROCEDE DE PREPARATION PAR DEPOT CHIMIQUE EN PHASE VAPEUR (CVD) D'UN REVETEMENT MULTICOUCHE A BASE DE Ti-Al-N

Publications (2)

Publication Number Publication Date
DE69805924D1 true DE69805924D1 (de) 2002-07-18
DE69805924T2 DE69805924T2 (de) 2003-01-09

Family

ID=9510599

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69805924T Expired - Fee Related DE69805924T2 (de) 1997-08-29 1998-08-27 CVD-Verfahren zum Herstellen einer mehrlagigen Beschichtung auf Ti-Al-N Basis

Country Status (5)

Country Link
US (1) US6040012A (de)
EP (1) EP0899359B1 (de)
AT (1) ATE219164T1 (de)
DE (1) DE69805924T2 (de)
FR (1) FR2767841B1 (de)

Families Citing this family (24)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6436820B1 (en) 2000-02-03 2002-08-20 Applied Materials, Inc Method for the CVD deposition of a low residual halogen content multi-layered titanium nitride film having a combined thickness greater than 1000 Å
KR100458779B1 (ko) * 2000-03-27 2004-12-03 미츠비시 쥬고교 가부시키가이샤 금속막의 제작방법 및 그 제작장치
US6440494B1 (en) 2000-04-05 2002-08-27 Tokyo Electron Limited In-situ source synthesis for metal CVD
US20030091739A1 (en) * 2001-11-14 2003-05-15 Hitoshi Sakamoto Barrier metal film production apparatus, barrier metal film production method, metal film production method, and metal film production apparatus
US7659209B2 (en) * 2001-11-14 2010-02-09 Canon Anelva Corporation Barrier metal film production method
US20030186087A1 (en) * 2002-03-26 2003-10-02 Fu-Tai Liou Gradient barrier layer for copper back-end-of-line technology
DE10343761A1 (de) * 2003-09-22 2005-04-14 Mtu Aero Engines Gmbh Verschleißschutzschicht, Bauteil mit einer derartigen Verschleißschutzschicht sowie Herstellverfahren
SE0402865L (sv) * 2004-11-04 2006-05-05 Sandvik Intellectual Property Belagd produkt och framställningsmetod för denna
DE102005032860B4 (de) 2005-07-04 2007-08-09 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Hartstoffbeschichtete Körper und Verfahren zu deren Herstellung
DE102007000512B3 (de) * 2007-10-16 2009-01-29 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Hartstoffbeschichtete Körper und Verfahren zu deren Herstellung
DE102008013966A1 (de) 2008-03-12 2009-09-17 Kennametal Inc. Hartstoffbeschichteter Körper
DE102008013965A1 (de) * 2008-03-12 2009-09-17 Kennametal Inc. Hartstoffbeschichteter Körper
DE102008013964A1 (de) * 2008-03-12 2009-09-17 Kennametal Inc. Hartstoffbeschichteter Körper
JP5658452B2 (ja) * 2008-12-16 2015-01-28 富士フイルム株式会社 積層体の製造方法
AT511950B1 (de) * 2012-03-14 2013-04-15 Boehlerit Gmbh & Co Kg Beschichteter Körper und Verfahren zum Beschichten eines Körpers
JP6143158B2 (ja) * 2012-12-28 2017-06-07 住友電工ハードメタル株式会社 表面被覆部材およびその製造方法
CN103935076B (zh) * 2013-01-23 2018-04-20 深圳富泰宏精密工业有限公司 壳体及其制作方法
US9103036B2 (en) 2013-03-15 2015-08-11 Kennametal Inc. Hard coatings comprising cubic phase forming compositions
US9168664B2 (en) 2013-08-16 2015-10-27 Kennametal Inc. Low stress hard coatings and applications thereof
US9896767B2 (en) 2013-08-16 2018-02-20 Kennametal Inc Low stress hard coatings and applications thereof
DE102014103220A1 (de) 2014-03-11 2015-09-17 Walter Ag TiAIN-Schichten mit Lamellenstruktur
AT516062B1 (de) * 2015-01-15 2016-02-15 Boehlerit Gmbh & Co Kg Verfahren zum Beschichten eines Gegenstandes und damit hergestellte Beschichtung
CN109112500B (zh) 2017-06-22 2022-01-28 肯纳金属公司 Cvd复合材料耐火涂层及其应用
US12109628B2 (en) 2022-08-10 2024-10-08 Iscar, Ltd. Cutting tool with a TiAlN coating having rake and relief surfaces with different residual stresses

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4699082A (en) * 1983-02-25 1987-10-13 Liburdi Engineering Limited Apparatus for chemical vapor deposition
EP0117542B1 (de) * 1983-02-25 1992-06-17 Liburdi Engineering Limited Chemische Dampfabscheidung von Überzügen aus metallischen Verbindungen unter Verwendung von metallischen Subhalogeniden
EP0417253A1 (de) * 1989-04-04 1991-03-20 Sri International Niedrigtemperaturverfahren zur herstellung von material aus einem oder mehreren metallreagenzien und halogen enthaltendes reagens zur herstellung reaktiver zwischenprodukte
JP2999346B2 (ja) * 1993-07-12 2000-01-17 オリエンタルエンヂニアリング株式会社 基体表面被覆方法及び被覆部材
DE69526301T2 (de) * 1994-10-28 2002-12-05 Sumitomo Electric Industries, Ltd. Mehrschichtiges Material
FR2745299B1 (fr) * 1996-02-27 1998-06-19 Centre Nat Rech Scient Procede de formation de revetements de ti1-xalxn

Also Published As

Publication number Publication date
FR2767841A1 (fr) 1999-03-05
EP0899359B1 (de) 2002-06-12
EP0899359A1 (de) 1999-03-03
ATE219164T1 (de) 2002-06-15
FR2767841B1 (fr) 1999-10-01
DE69805924T2 (de) 2003-01-09
US6040012A (en) 2000-03-21

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Legal Events

Date Code Title Description
8339 Ceased/non-payment of the annual fee