DE69805924D1 - CVD-Verfahren zum Herstellen einer mehrlagigen Beschichtung auf Ti-Al-N Basis - Google Patents
CVD-Verfahren zum Herstellen einer mehrlagigen Beschichtung auf Ti-Al-N BasisInfo
- Publication number
- DE69805924D1 DE69805924D1 DE69805924T DE69805924T DE69805924D1 DE 69805924 D1 DE69805924 D1 DE 69805924D1 DE 69805924 T DE69805924 T DE 69805924T DE 69805924 T DE69805924 T DE 69805924T DE 69805924 D1 DE69805924 D1 DE 69805924D1
- Authority
- DE
- Germany
- Prior art keywords
- titanium
- nitride
- multilayer coating
- producing
- layer coating
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/448—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials
- C23C16/4488—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials by in situ generation of reactive gas by chemical or electrochemical reaction
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
- C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
- C23C16/34—Nitrides
Landscapes
- Chemical & Material Sciences (AREA)
- General Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Electrochemistry (AREA)
- Inorganic Chemistry (AREA)
- Chemical Vapour Deposition (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
FR9710801A FR2767841B1 (fr) | 1997-08-29 | 1997-08-29 | PROCEDE DE PREPARATION PAR DEPOT CHIMIQUE EN PHASE VAPEUR (CVD) D'UN REVETEMENT MULTICOUCHE A BASE DE Ti-Al-N |
Publications (2)
Publication Number | Publication Date |
---|---|
DE69805924D1 true DE69805924D1 (de) | 2002-07-18 |
DE69805924T2 DE69805924T2 (de) | 2003-01-09 |
Family
ID=9510599
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE69805924T Expired - Fee Related DE69805924T2 (de) | 1997-08-29 | 1998-08-27 | CVD-Verfahren zum Herstellen einer mehrlagigen Beschichtung auf Ti-Al-N Basis |
Country Status (5)
Country | Link |
---|---|
US (1) | US6040012A (de) |
EP (1) | EP0899359B1 (de) |
AT (1) | ATE219164T1 (de) |
DE (1) | DE69805924T2 (de) |
FR (1) | FR2767841B1 (de) |
Families Citing this family (24)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6436820B1 (en) | 2000-02-03 | 2002-08-20 | Applied Materials, Inc | Method for the CVD deposition of a low residual halogen content multi-layered titanium nitride film having a combined thickness greater than 1000 Å |
KR100458779B1 (ko) * | 2000-03-27 | 2004-12-03 | 미츠비시 쥬고교 가부시키가이샤 | 금속막의 제작방법 및 그 제작장치 |
US6440494B1 (en) | 2000-04-05 | 2002-08-27 | Tokyo Electron Limited | In-situ source synthesis for metal CVD |
US20030091739A1 (en) * | 2001-11-14 | 2003-05-15 | Hitoshi Sakamoto | Barrier metal film production apparatus, barrier metal film production method, metal film production method, and metal film production apparatus |
US7659209B2 (en) * | 2001-11-14 | 2010-02-09 | Canon Anelva Corporation | Barrier metal film production method |
US20030186087A1 (en) * | 2002-03-26 | 2003-10-02 | Fu-Tai Liou | Gradient barrier layer for copper back-end-of-line technology |
DE10343761A1 (de) * | 2003-09-22 | 2005-04-14 | Mtu Aero Engines Gmbh | Verschleißschutzschicht, Bauteil mit einer derartigen Verschleißschutzschicht sowie Herstellverfahren |
SE0402865L (sv) * | 2004-11-04 | 2006-05-05 | Sandvik Intellectual Property | Belagd produkt och framställningsmetod för denna |
DE102005032860B4 (de) | 2005-07-04 | 2007-08-09 | Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. | Hartstoffbeschichtete Körper und Verfahren zu deren Herstellung |
DE102007000512B3 (de) * | 2007-10-16 | 2009-01-29 | Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. | Hartstoffbeschichtete Körper und Verfahren zu deren Herstellung |
DE102008013966A1 (de) | 2008-03-12 | 2009-09-17 | Kennametal Inc. | Hartstoffbeschichteter Körper |
DE102008013965A1 (de) * | 2008-03-12 | 2009-09-17 | Kennametal Inc. | Hartstoffbeschichteter Körper |
DE102008013964A1 (de) * | 2008-03-12 | 2009-09-17 | Kennametal Inc. | Hartstoffbeschichteter Körper |
JP5658452B2 (ja) * | 2008-12-16 | 2015-01-28 | 富士フイルム株式会社 | 積層体の製造方法 |
AT511950B1 (de) * | 2012-03-14 | 2013-04-15 | Boehlerit Gmbh & Co Kg | Beschichteter Körper und Verfahren zum Beschichten eines Körpers |
JP6143158B2 (ja) * | 2012-12-28 | 2017-06-07 | 住友電工ハードメタル株式会社 | 表面被覆部材およびその製造方法 |
CN103935076B (zh) * | 2013-01-23 | 2018-04-20 | 深圳富泰宏精密工业有限公司 | 壳体及其制作方法 |
US9103036B2 (en) | 2013-03-15 | 2015-08-11 | Kennametal Inc. | Hard coatings comprising cubic phase forming compositions |
US9168664B2 (en) | 2013-08-16 | 2015-10-27 | Kennametal Inc. | Low stress hard coatings and applications thereof |
US9896767B2 (en) | 2013-08-16 | 2018-02-20 | Kennametal Inc | Low stress hard coatings and applications thereof |
DE102014103220A1 (de) | 2014-03-11 | 2015-09-17 | Walter Ag | TiAIN-Schichten mit Lamellenstruktur |
AT516062B1 (de) * | 2015-01-15 | 2016-02-15 | Boehlerit Gmbh & Co Kg | Verfahren zum Beschichten eines Gegenstandes und damit hergestellte Beschichtung |
CN109112500B (zh) | 2017-06-22 | 2022-01-28 | 肯纳金属公司 | Cvd复合材料耐火涂层及其应用 |
US12109628B2 (en) | 2022-08-10 | 2024-10-08 | Iscar, Ltd. | Cutting tool with a TiAlN coating having rake and relief surfaces with different residual stresses |
Family Cites Families (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4699082A (en) * | 1983-02-25 | 1987-10-13 | Liburdi Engineering Limited | Apparatus for chemical vapor deposition |
EP0117542B1 (de) * | 1983-02-25 | 1992-06-17 | Liburdi Engineering Limited | Chemische Dampfabscheidung von Überzügen aus metallischen Verbindungen unter Verwendung von metallischen Subhalogeniden |
EP0417253A1 (de) * | 1989-04-04 | 1991-03-20 | Sri International | Niedrigtemperaturverfahren zur herstellung von material aus einem oder mehreren metallreagenzien und halogen enthaltendes reagens zur herstellung reaktiver zwischenprodukte |
JP2999346B2 (ja) * | 1993-07-12 | 2000-01-17 | オリエンタルエンヂニアリング株式会社 | 基体表面被覆方法及び被覆部材 |
DE69526301T2 (de) * | 1994-10-28 | 2002-12-05 | Sumitomo Electric Industries, Ltd. | Mehrschichtiges Material |
FR2745299B1 (fr) * | 1996-02-27 | 1998-06-19 | Centre Nat Rech Scient | Procede de formation de revetements de ti1-xalxn |
-
1997
- 1997-08-29 FR FR9710801A patent/FR2767841B1/fr not_active Expired - Fee Related
-
1998
- 1998-08-12 US US09/132,992 patent/US6040012A/en not_active Expired - Fee Related
- 1998-08-27 DE DE69805924T patent/DE69805924T2/de not_active Expired - Fee Related
- 1998-08-27 EP EP98402128A patent/EP0899359B1/de not_active Expired - Lifetime
- 1998-08-27 AT AT98402128T patent/ATE219164T1/de not_active IP Right Cessation
Also Published As
Publication number | Publication date |
---|---|
FR2767841A1 (fr) | 1999-03-05 |
EP0899359B1 (de) | 2002-06-12 |
EP0899359A1 (de) | 1999-03-03 |
ATE219164T1 (de) | 2002-06-15 |
FR2767841B1 (fr) | 1999-10-01 |
DE69805924T2 (de) | 2003-01-09 |
US6040012A (en) | 2000-03-21 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
8339 | Ceased/non-payment of the annual fee |