DE69802055T2 - Water soluble photoresist composition - Google Patents
Water soluble photoresist compositionInfo
- Publication number
- DE69802055T2 DE69802055T2 DE69802055T DE69802055T DE69802055T2 DE 69802055 T2 DE69802055 T2 DE 69802055T2 DE 69802055 T DE69802055 T DE 69802055T DE 69802055 T DE69802055 T DE 69802055T DE 69802055 T2 DE69802055 T2 DE 69802055T2
- Authority
- DE
- Germany
- Prior art keywords
- water soluble
- photoresist composition
- soluble photoresist
- composition
- water
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/04—Chromates
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/0001—Technical content checked by a classifier
- H01L2924/0002—Not covered by any one of groups H01L24/00, H01L24/00 and H01L2224/00
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- ing And Chemical Polishing (AREA)
- Materials For Photolithography (AREA)
- Optical Filters (AREA)
- Compositions Of Macromolecular Compounds (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP28738397A JP3870385B2 (en) | 1997-10-20 | 1997-10-20 | Water-soluble photoresist composition |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| DE69802055D1 DE69802055D1 (en) | 2001-11-22 |
| DE69802055T2 true DE69802055T2 (en) | 2002-06-06 |
Family
ID=17716648
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| DE69802055T Expired - Fee Related DE69802055T2 (en) | 1997-10-20 | 1998-06-24 | Water soluble photoresist composition |
Country Status (4)
| Country | Link |
|---|---|
| US (1) | US5948592A (en) |
| EP (1) | EP0909992B1 (en) |
| JP (1) | JP3870385B2 (en) |
| DE (1) | DE69802055T2 (en) |
Families Citing this family (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE10209024A1 (en) * | 2001-03-07 | 2002-09-19 | Inctec Inc | Photosensitive composition used in the production of printing press plates or photoetched products comprises a sensitizer, a water-soluble high molecular weight substance, a sensitivity-improving compound, and water |
| TWI228718B (en) * | 2001-11-05 | 2005-03-01 | Tdk Corp | Manufacturing method and device of mold plate for information medium |
| WO2003077239A1 (en) * | 2002-03-11 | 2003-09-18 | Tdk Corporation | Processing method for photoresist master, production method for recording medium-use mater, production method for recording medium, photoresist master, recording medium-use master and recording medium |
| US20040170724A1 (en) * | 2003-02-28 | 2004-09-02 | Kraft Foods Holdings, Inc. | Mineral complexes of lactobionic acid and method of using for mineral fortification of food products |
| US7033735B2 (en) * | 2003-11-17 | 2006-04-25 | Taiwan Semiconductor Manufacturing Co., Ltd. | Water soluble negative tone photoresist |
| CN103176365A (en) * | 2011-12-22 | 2013-06-26 | 深圳富泰宏精密工业有限公司 | Film and manufacture method and method for shielding by utilizing film |
| CN103235442B (en) * | 2013-04-22 | 2016-07-06 | 京东方科技集团股份有限公司 | A kind of color membrane substrates, display floater and display device |
| JP6980993B2 (en) * | 2016-10-06 | 2021-12-15 | 信越化学工業株式会社 | Resist material and pattern forming method |
Family Cites Families (11)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| GB678599A (en) * | 1949-10-10 | 1952-09-03 | Kalle & Co Ag | Improvements relating to the production of colloid photo-images for use in photomechanical printing |
| US4192949A (en) * | 1977-06-28 | 1980-03-11 | Basf Aktiengesellschaft | Preparation of aralkyl phenyl ethers and alkyl phenyl ethers |
| US4211563A (en) * | 1978-02-13 | 1980-07-08 | Rca Corporation | Aqueous photoresist of casein and N-methylol acrylamide |
| JPS5523163A (en) * | 1978-08-09 | 1980-02-19 | Agency Of Ind Science & Technol | Polyvinyl alcohol type photosensitive resin and its preparation |
| JPS5620541A (en) * | 1979-07-30 | 1981-02-26 | Mitsubishi Chem Ind Ltd | Preparation of cyclohexanone |
| JPS576098A (en) * | 1980-06-16 | 1982-01-12 | Takuichi Hasegawa | Underground city in oil field cave |
| JPS6329753A (en) * | 1986-07-23 | 1988-02-08 | Japan Synthetic Rubber Co Ltd | Method for storing radiation sensitive resin composition |
| JPS6374856A (en) * | 1986-09-19 | 1988-04-05 | Mitsubishi Electric Corp | Conveying device for continuous document |
| JP2893854B2 (en) * | 1990-05-11 | 1999-05-24 | 住友電気工業株式会社 | Traffic information collection and provision system |
| JPH07207464A (en) * | 1994-01-17 | 1995-08-08 | Dainippon Screen Mfg Co Ltd | Hardening method of water-soluble photoresist film |
| JP3402735B2 (en) * | 1994-03-04 | 2003-05-06 | 東京応化工業株式会社 | Water-soluble photosensitive resin composition for forming etching mask pattern and pattern forming method using the same |
-
1997
- 1997-10-20 JP JP28738397A patent/JP3870385B2/en not_active Expired - Lifetime
-
1998
- 1998-06-24 EP EP98111609A patent/EP0909992B1/en not_active Expired - Lifetime
- 1998-06-24 DE DE69802055T patent/DE69802055T2/en not_active Expired - Fee Related
- 1998-07-07 US US09/111,194 patent/US5948592A/en not_active Expired - Lifetime
Also Published As
| Publication number | Publication date |
|---|---|
| JP3870385B2 (en) | 2007-01-17 |
| JPH11119420A (en) | 1999-04-30 |
| EP0909992A1 (en) | 1999-04-21 |
| DE69802055D1 (en) | 2001-11-22 |
| EP0909992B1 (en) | 2001-10-17 |
| US5948592A (en) | 1999-09-07 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| 8364 | No opposition during term of opposition | ||
| 8339 | Ceased/non-payment of the annual fee |