DE69701233T2 - Heizgerät und Wärmeentwicklungssystem - Google Patents

Heizgerät und Wärmeentwicklungssystem

Info

Publication number
DE69701233T2
DE69701233T2 DE69701233T DE69701233T DE69701233T2 DE 69701233 T2 DE69701233 T2 DE 69701233T2 DE 69701233 T DE69701233 T DE 69701233T DE 69701233 T DE69701233 T DE 69701233T DE 69701233 T2 DE69701233 T2 DE 69701233T2
Authority
DE
Germany
Prior art keywords
heater
development system
heat development
heat
development
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE69701233T
Other languages
English (en)
Other versions
DE69701233D1 (de
Inventor
Koji Furukawa
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujifilm Corp
Original Assignee
Fuji Photo Film Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fuji Photo Film Co Ltd filed Critical Fuji Photo Film Co Ltd
Application granted granted Critical
Publication of DE69701233D1 publication Critical patent/DE69701233D1/de
Publication of DE69701233T2 publication Critical patent/DE69701233T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/38—Treatment before imagewise removal, e.g. prebaking
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03D—APPARATUS FOR PROCESSING EXPOSED PHOTOGRAPHIC MATERIALS; ACCESSORIES THEREFOR
    • G03D13/00—Processing apparatus or accessories therefor, not covered by groups G11B3/00 - G11B11/00
    • G03D13/002—Heat development apparatus, e.g. Kalvar

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Photographic Developing Apparatuses (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
DE69701233T 1996-02-27 1997-02-21 Heizgerät und Wärmeentwicklungssystem Expired - Fee Related DE69701233T2 (de)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP3990696 1996-02-27
JP9419796 1996-04-16
JP8350840A JPH103171A (ja) 1996-02-27 1996-12-27 加熱装置及び熱現像装置

Publications (2)

Publication Number Publication Date
DE69701233D1 DE69701233D1 (de) 2000-03-09
DE69701233T2 true DE69701233T2 (de) 2000-07-13

Family

ID=27290302

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69701233T Expired - Fee Related DE69701233T2 (de) 1996-02-27 1997-02-21 Heizgerät und Wärmeentwicklungssystem

Country Status (4)

Country Link
US (1) US5822641A (de)
EP (1) EP0794464B1 (de)
JP (1) JPH103171A (de)
DE (1) DE69701233T2 (de)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE10008939C2 (de) * 1999-09-04 2002-08-29 Gmp Co Heizanordnung zum Beheizen von Walzen in Laminatoren

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE10035430B4 (de) * 2000-07-20 2005-06-16 Advanced Photonics Technologies Ag Verfahren und Vorrichtung zur thermischen Behandlung einer Fotolackschicht auf einem Schaltungssubstrat, insbesondere Halbleiterwafer
US6495801B2 (en) * 2001-04-04 2002-12-17 Howard A. Fromson Method and apparatus for heating printing plates
JP7317993B2 (ja) * 2019-11-26 2023-07-31 富士フイルム株式会社 処理装置および処理方法

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5525050A (en) * 1978-08-10 1980-02-22 Toyo Shigyo Kk Gravure engraving method and film used for this nethod
DE3231145A1 (de) * 1982-08-21 1984-02-23 Basf Ag, 6700 Ludwigshafen Negativ arbeitendes verfahren zur herstellung von reliefbildern oder resistmustern
DE3231144A1 (de) * 1982-08-21 1984-02-23 Basf Ag, 6700 Ludwigshafen Verfahren zur herstellung von tiefdruckformen mit kunststoff-druckschichten
JPH04240643A (ja) * 1991-01-23 1992-08-27 Konica Corp 熱現像方法

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE10008939C2 (de) * 1999-09-04 2002-08-29 Gmp Co Heizanordnung zum Beheizen von Walzen in Laminatoren

Also Published As

Publication number Publication date
EP0794464B1 (de) 2000-02-02
EP0794464A1 (de) 1997-09-10
DE69701233D1 (de) 2000-03-09
JPH103171A (ja) 1998-01-06
US5822641A (en) 1998-10-13

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8327 Change in the person/name/address of the patent owner

Owner name: FUJIFILM CORP., TOKIO/TOKYO, JP

8339 Ceased/non-payment of the annual fee