DE69625615T2 - METHOD AND DEVICE FOR DEPOSITING PARYLENE AF4 ON SEMICONDUCTOR WAFERS - Google Patents
METHOD AND DEVICE FOR DEPOSITING PARYLENE AF4 ON SEMICONDUCTOR WAFERSInfo
- Publication number
- DE69625615T2 DE69625615T2 DE69625615T DE69625615T DE69625615T2 DE 69625615 T2 DE69625615 T2 DE 69625615T2 DE 69625615 T DE69625615 T DE 69625615T DE 69625615 T DE69625615 T DE 69625615T DE 69625615 T2 DE69625615 T2 DE 69625615T2
- Authority
- DE
- Germany
- Prior art keywords
- semiconductor wafers
- depositing parylene
- parylene
- depositing
- wafers
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Applications Claiming Priority (11)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US08/549,087 US5538758A (en) | 1995-10-27 | 1995-10-27 | Method and apparatus for the deposition of parylene AF4 onto semiconductor wafers |
US08/549,093 US5536319A (en) | 1995-10-27 | 1995-10-27 | Parylene deposition apparatus including an atmospheric shroud and inert gas source |
US08/549,133 US5536317A (en) | 1995-10-27 | 1995-10-27 | Parylene deposition apparatus including a quartz crystal thickness/rate controller |
US08/549,131 US5536321A (en) | 1995-10-27 | 1995-10-27 | Parylene deposition apparatus including a post-pyrolysis filtering chamber and a deposition chamber inlet filter |
US08/549,395 US5709753A (en) | 1995-10-27 | 1995-10-27 | Parylene deposition apparatus including a heated and cooled dimer crucible |
US08/549,169 US5534068A (en) | 1995-10-27 | 1995-10-27 | Parylene deposition apparatus including a tapered deposition chamber and dual vacuum outlet pumping arrangement |
US08/549,635 US5536322A (en) | 1995-10-27 | 1995-10-27 | Parylene deposition apparatus including a heated and cooled support platen and an electrostatic clamping device |
US08/549,130 US5556473A (en) | 1995-10-27 | 1995-10-27 | Parylene deposition apparatus including dry vacuum pump system and downstream cold trap |
US68016196A | 1996-07-15 | 1996-07-15 | |
US67995896A | 1996-07-15 | 1996-07-15 | |
PCT/US1996/017003 WO1997015699A2 (en) | 1995-10-27 | 1996-10-25 | Method and apparatus for the deposition of parylene af4 onto semiconductor wafers |
Publications (2)
Publication Number | Publication Date |
---|---|
DE69625615D1 DE69625615D1 (en) | 2003-02-06 |
DE69625615T2 true DE69625615T2 (en) | 2003-09-11 |
Family
ID=27581286
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE69625615T Expired - Fee Related DE69625615T2 (en) | 1995-10-27 | 1996-10-25 | METHOD AND DEVICE FOR DEPOSITING PARYLENE AF4 ON SEMICONDUCTOR WAFERS |
Country Status (1)
Country | Link |
---|---|
DE (1) | DE69625615T2 (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE102007008291A1 (en) * | 2007-02-16 | 2008-08-21 | Siemens Ag | Air flow sensor |
DE102008026974A1 (en) * | 2008-06-03 | 2009-12-10 | Aixtron Ag | Method and apparatus for depositing thin layers of polymeric para-xylylenes or substituted para-xylylenes |
-
1996
- 1996-10-25 DE DE69625615T patent/DE69625615T2/en not_active Expired - Fee Related
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE102007008291A1 (en) * | 2007-02-16 | 2008-08-21 | Siemens Ag | Air flow sensor |
DE102008026974A1 (en) * | 2008-06-03 | 2009-12-10 | Aixtron Ag | Method and apparatus for depositing thin layers of polymeric para-xylylenes or substituted para-xylylenes |
Also Published As
Publication number | Publication date |
---|---|
DE69625615D1 (en) | 2003-02-06 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
8339 | Ceased/non-payment of the annual fee |