DE69422770D1 - Verfahren und vorrichtung zum beschichten eines glassubstrates - Google Patents
Verfahren und vorrichtung zum beschichten eines glassubstratesInfo
- Publication number
- DE69422770D1 DE69422770D1 DE69422770T DE69422770T DE69422770D1 DE 69422770 D1 DE69422770 D1 DE 69422770D1 DE 69422770 T DE69422770 T DE 69422770T DE 69422770 T DE69422770 T DE 69422770T DE 69422770 D1 DE69422770 D1 DE 69422770D1
- Authority
- DE
- Germany
- Prior art keywords
- coating
- glass substrate
- glass
- substrate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
- C23C16/45595—Atmospheric CVD gas inlets with no enclosed reaction chamber
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/001—General methods for coating; Devices therefor
- C03C17/002—General methods for coating; Devices therefor for flat glass, e.g. float glass
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/22—Surface treatment of glass, not in the form of fibres or filaments, by coating with other inorganic material
- C03C17/23—Oxides
- C03C17/245—Oxides by deposition from the vapour phase
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/453—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating passing the reaction gases through burners or torches, e.g. atmospheric pressure CVD
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US4879793A | 1993-04-16 | 1993-04-16 | |
PCT/US1994/004134 WO1994024331A1 (en) | 1993-04-16 | 1994-04-14 | Method and apparatus for coating a glass substrate |
Publications (2)
Publication Number | Publication Date |
---|---|
DE69422770D1 true DE69422770D1 (de) | 2000-03-02 |
DE69422770T2 DE69422770T2 (de) | 2000-09-21 |
Family
ID=21956495
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE69422770T Expired - Fee Related DE69422770T2 (de) | 1993-04-16 | 1994-04-14 | Verfahren und vorrichtung zum beschichten eines glassubstrates |
Country Status (12)
Country | Link |
---|---|
US (1) | US5607725A (de) |
EP (1) | EP0649479B1 (de) |
JP (1) | JPH07508257A (de) |
CN (1) | CN1037702C (de) |
AU (1) | AU6705094A (de) |
CA (1) | CA2136639A1 (de) |
CZ (1) | CZ317694A3 (de) |
DE (1) | DE69422770T2 (de) |
PL (1) | PL178112B1 (de) |
PT (1) | PT649479E (de) |
RU (1) | RU2125620C1 (de) |
WO (1) | WO1994024331A1 (de) |
Families Citing this family (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
FR2724923B1 (fr) * | 1994-09-27 | 1996-12-20 | Saint Gobain Vitrage | Technique de depot de revetements par pyrolyse de composition de gaz precurseur(s) |
US6126744A (en) * | 1996-11-18 | 2000-10-03 | Asm America, Inc. | Method and system for adjusting semiconductor processing equipment |
US6198537B1 (en) * | 1997-07-11 | 2001-03-06 | Philip Morris Incorporated | Optical inspection system for the manufacture of banded cigarette paper |
US6194038B1 (en) * | 1998-03-20 | 2001-02-27 | Applied Materials, Inc. | Method for deposition of a conformal layer on a substrate |
TWI494458B (zh) | 2008-03-26 | 2015-08-01 | Gtat Corp | 在化學氣相沉積反應器中用於配氣之系統和方法 |
DE102008050936A1 (de) | 2008-10-10 | 2010-04-15 | Flabeg Gmbh & Co. Kg | Solarspiegel, insbesondere zur Verwendung in einem thermischen Solarkraftwerk, thermisches Solarkraftwerk mit einem derartigen Solarspiegel sowie Verfahren zur Herstellung des Solarspiegels |
CN103121798B (zh) * | 2011-11-19 | 2015-12-16 | 蚌埠玻璃工业设计研究院 | 一种离线大面积镀膜方法 |
US9018108B2 (en) | 2013-01-25 | 2015-04-28 | Applied Materials, Inc. | Low shrinkage dielectric films |
US11015244B2 (en) | 2013-12-30 | 2021-05-25 | Advanced Material Solutions, Llc | Radiation shielding for a CVD reactor |
US10450649B2 (en) | 2014-01-29 | 2019-10-22 | Gtat Corporation | Reactor filament assembly with enhanced misalignment tolerance |
Family Cites Families (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
FR2570392B1 (fr) * | 1984-09-19 | 1987-01-02 | Dme | Procede de depot sur substrats optiques de couches antireflechissantes susceptibles d'etre gravees |
US4732776A (en) * | 1987-02-24 | 1988-03-22 | Measurex Corporation | Apparatus and method for controlling the thickness of coatings on paper or other materials |
US5217753A (en) * | 1989-02-21 | 1993-06-08 | Libbey-Owens-Ford Co. | Coated glass articles |
US5087525A (en) * | 1989-02-21 | 1992-02-11 | Libbey-Owens-Ford Co. | Coated glass articles |
US5009485A (en) * | 1989-08-17 | 1991-04-23 | Hughes Aircraft Company | Multiple-notch rugate filters and a controlled method of manufacture thereof |
-
1994
- 1994-04-14 PT PT94914795T patent/PT649479E/pt unknown
- 1994-04-14 CZ CZ943176A patent/CZ317694A3/cs unknown
- 1994-04-14 EP EP94914795A patent/EP0649479B1/de not_active Expired - Lifetime
- 1994-04-14 CA CA002136639A patent/CA2136639A1/en not_active Abandoned
- 1994-04-14 CN CN94190191A patent/CN1037702C/zh not_active Expired - Fee Related
- 1994-04-14 DE DE69422770T patent/DE69422770T2/de not_active Expired - Fee Related
- 1994-04-14 WO PCT/US1994/004134 patent/WO1994024331A1/en active IP Right Grant
- 1994-04-14 AU AU67050/94A patent/AU6705094A/en not_active Abandoned
- 1994-04-14 JP JP6523461A patent/JPH07508257A/ja not_active Ceased
- 1994-04-14 RU RU95107699A patent/RU2125620C1/ru active
- 1994-04-14 PL PL94306776A patent/PL178112B1/pl unknown
-
1995
- 1995-03-01 US US08/396,868 patent/US5607725A/en not_active Expired - Fee Related
Also Published As
Publication number | Publication date |
---|---|
CN1105180A (zh) | 1995-07-12 |
US5607725A (en) | 1997-03-04 |
EP0649479A4 (de) | 1997-10-01 |
WO1994024331A1 (en) | 1994-10-27 |
AU6705094A (en) | 1994-11-08 |
RU2125620C1 (ru) | 1999-01-27 |
DE69422770T2 (de) | 2000-09-21 |
EP0649479B1 (de) | 2000-01-26 |
CZ317694A3 (en) | 1995-08-16 |
CN1037702C (zh) | 1998-03-11 |
JPH07508257A (ja) | 1995-09-14 |
EP0649479A1 (de) | 1995-04-26 |
RU95107699A (ru) | 1996-12-27 |
PT649479E (pt) | 2000-05-31 |
CA2136639A1 (en) | 1994-10-27 |
PL178112B1 (pl) | 2000-02-29 |
PL306776A1 (en) | 1995-04-18 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
8364 | No opposition during term of opposition | ||
8339 | Ceased/non-payment of the annual fee |