DE69414659D1 - Gerät und Verfahren zur Ionenimplantierung - Google Patents
Gerät und Verfahren zur IonenimplantierungInfo
- Publication number
- DE69414659D1 DE69414659D1 DE69414659T DE69414659T DE69414659D1 DE 69414659 D1 DE69414659 D1 DE 69414659D1 DE 69414659 T DE69414659 T DE 69414659T DE 69414659 T DE69414659 T DE 69414659T DE 69414659 D1 DE69414659 D1 DE 69414659D1
- Authority
- DE
- Germany
- Prior art keywords
- ion implantation
- implantation
- ion
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/02—Details
- H01J37/026—Means for avoiding or neutralising unwanted electrical charges on tube components
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
- H01J37/317—Electron-beam or ion-beam tubes for localised treatment of objects for changing properties of the objects or for applying thin layers thereon, e.g. for ion implantation
- H01J37/3171—Electron-beam or ion-beam tubes for localised treatment of objects for changing properties of the objects or for applying thin layers thereon, e.g. for ion implantation for ion implantation
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/004—Charge control of objects or beams
- H01J2237/0041—Neutralising arrangements
- H01J2237/0044—Neutralising arrangements of objects being observed or treated
- H01J2237/0045—Neutralising arrangements of objects being observed or treated using secondary electrons
Landscapes
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Physical Vapour Deposition (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP19493193 | 1993-08-05 | ||
JP16708594A JP3599373B2 (ja) | 1993-08-05 | 1994-07-19 | イオン注入装置及びイオン注入方法 |
Publications (2)
Publication Number | Publication Date |
---|---|
DE69414659D1 true DE69414659D1 (de) | 1998-12-24 |
DE69414659T2 DE69414659T2 (de) | 1999-06-17 |
Family
ID=26491233
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE69414659T Expired - Fee Related DE69414659T2 (de) | 1993-08-05 | 1994-08-04 | Gerät und Verfahren zur Ionenimplantierung |
Country Status (5)
Country | Link |
---|---|
US (1) | US5587587A (de) |
EP (1) | EP0637834B1 (de) |
JP (1) | JP3599373B2 (de) |
CA (1) | CA2129403C (de) |
DE (1) | DE69414659T2 (de) |
Families Citing this family (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
GB2331179B (en) * | 1997-11-07 | 2002-03-20 | Applied Materials Inc | Method of preventing negative charge build up on a substrate being implanted w ith positive ions and ion implantation apparatus for performing such a method |
DE19801295B4 (de) * | 1998-01-16 | 2007-06-06 | Siemens Ag | Einrichtung zur Regelung eines Lichtbogenofens |
US6741445B1 (en) * | 2002-01-16 | 2004-05-25 | Advanced Micro Devices, Inc. | Method and system to monitor and control electro-static discharge |
US7342240B2 (en) * | 2006-02-24 | 2008-03-11 | Varian Semiconductor Equipment Associates, Inc. | Ion beam current monitoring |
WO2008094297A2 (en) * | 2006-07-14 | 2008-08-07 | Fei Company | A multi-source plasma focused ion beam system |
US7667208B2 (en) * | 2006-10-17 | 2010-02-23 | Varian Semiconductor Equipment Associates, Inc. | Technique for confining secondary electrons in plasma-based ion implantation |
WO2010120805A2 (en) * | 2009-04-13 | 2010-10-21 | Applied Materials, Inc. | Modification of magnetic properties of films using ion and neutral beam implantation |
CN103413746A (zh) * | 2013-06-25 | 2013-11-27 | 上海华力微电子有限公司 | 提高离子注入机使用周期的锗注入方法 |
US9956932B2 (en) * | 2016-08-30 | 2018-05-01 | The United States Of America As Represented By The Secretary Of The Navy | Induction charge transfer system and method for neutralizing electrostatic charge generation |
EP3389078A1 (de) * | 2017-04-13 | 2018-10-17 | The Swatch Group Research and Development Ltd | Implantationsverfahren von mehrfach geladenen ionen in eine oberfläche eines zu behandelnden objekts, und anlage für die umsetzung dieses verfahrens |
Family Cites Families (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4135097A (en) * | 1977-05-05 | 1979-01-16 | International Business Machines Corporation | Ion implantation apparatus for controlling the surface potential of a target surface |
US4463255A (en) * | 1980-09-24 | 1984-07-31 | Varian Associates, Inc. | Apparatus for enhanced neutralization of positively charged ion beam |
US4675530A (en) * | 1985-07-11 | 1987-06-23 | Eaton Corporation | Charge density detector for beam implantation |
US5072125A (en) * | 1989-10-05 | 1991-12-10 | Mitsubishi Denki Kabushiki Kaisha | Ion implanter |
JPH0433246A (ja) * | 1990-05-26 | 1992-02-04 | Ricoh Co Ltd | イオン注入装置のエンドステーション |
JPH05135731A (ja) * | 1991-07-08 | 1993-06-01 | Sony Corp | イオン注入装置 |
JPH05136078A (ja) * | 1991-11-12 | 1993-06-01 | Mitsubishi Electric Corp | イオン注入装置 |
JPH0661166A (ja) * | 1992-08-10 | 1994-03-04 | Nissin Electric Co Ltd | イオン注入の中性化方法と中性化装置 |
-
1994
- 1994-07-19 JP JP16708594A patent/JP3599373B2/ja not_active Expired - Fee Related
- 1994-08-03 CA CA002129403A patent/CA2129403C/en not_active Expired - Fee Related
- 1994-08-04 DE DE69414659T patent/DE69414659T2/de not_active Expired - Fee Related
- 1994-08-04 US US08/284,992 patent/US5587587A/en not_active Expired - Fee Related
- 1994-08-04 EP EP94112218A patent/EP0637834B1/de not_active Expired - Lifetime
Also Published As
Publication number | Publication date |
---|---|
CA2129403C (en) | 1999-06-01 |
US5587587A (en) | 1996-12-24 |
JP3599373B2 (ja) | 2004-12-08 |
EP0637834B1 (de) | 1998-11-18 |
DE69414659T2 (de) | 1999-06-17 |
JPH0799035A (ja) | 1995-04-11 |
CA2129403A1 (en) | 1995-02-06 |
EP0637834A1 (de) | 1995-02-08 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
8364 | No opposition during term of opposition | ||
8339 | Ceased/non-payment of the annual fee |