DE69400404D1 - COATING DEVICE FOR EVAPORATING METAL MATERIAL ONTO A SUBSTRATE - Google Patents

COATING DEVICE FOR EVAPORATING METAL MATERIAL ONTO A SUBSTRATE

Info

Publication number
DE69400404D1
DE69400404D1 DE69400404T DE69400404T DE69400404D1 DE 69400404 D1 DE69400404 D1 DE 69400404D1 DE 69400404 T DE69400404 T DE 69400404T DE 69400404 T DE69400404 T DE 69400404T DE 69400404 D1 DE69400404 D1 DE 69400404D1
Authority
DE
Germany
Prior art keywords
substrate
metal material
coating device
material onto
evaporating metal
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE69400404T
Other languages
German (de)
Other versions
DE69400404T2 (en
Inventor
Richard Pepi
Michel Garcia
Robert Meyer
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Pixtech SA
Original Assignee
Pixel International SA
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Pixel International SA filed Critical Pixel International SA
Publication of DE69400404D1 publication Critical patent/DE69400404D1/en
Application granted granted Critical
Publication of DE69400404T2 publication Critical patent/DE69400404T2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
    • C23C14/568—Transferring the substrates through a series of coating stations
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J9/00—Apparatus or processes specially adapted for the manufacture, installation, removal, maintenance of electric discharge tubes, discharge lamps, or parts thereof; Recovery of material from discharge tubes or lamps
    • H01J9/46—Machines having sequentially arranged operating stations
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2329/00—Electron emission display panels, e.g. field emission display panels

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
DE69400404T 1993-10-18 1994-10-17 COATING DEVICE FOR EVAPORATING METAL MATERIAL ONTO A SUBSTRATE Expired - Fee Related DE69400404T2 (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
FR9312709A FR2711450B1 (en) 1993-10-18 1993-10-18 Installation and method for manufacturing flat display screens.
PCT/FR1994/001195 WO1995011517A1 (en) 1993-10-18 1994-10-17 Metal vapour deposition unit
US08/491,446 US5605608A (en) 1993-10-18 1995-06-16 Device for sputtering a metallic material on a plate

Publications (2)

Publication Number Publication Date
DE69400404D1 true DE69400404D1 (en) 1996-09-26
DE69400404T2 DE69400404T2 (en) 1996-12-19

Family

ID=26230697

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69400404T Expired - Fee Related DE69400404T2 (en) 1993-10-18 1994-10-17 COATING DEVICE FOR EVAPORATING METAL MATERIAL ONTO A SUBSTRATE

Country Status (6)

Country Link
US (1) US5605608A (en)
EP (1) EP0674804B1 (en)
JP (1) JPH08511305A (en)
DE (1) DE69400404T2 (en)
FR (1) FR2711450B1 (en)
WO (1) WO1995011517A1 (en)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CH692000A5 (en) * 1995-11-13 2001-12-31 Unaxis Balzers Ag Coating chamber, substrate carrier therefor, method of vacuum deposition and coating methods.
CA2185640A1 (en) * 1995-11-30 1997-05-31 Russell J. Hill Electron beam evaporation apparatus and method
EP0837491A3 (en) * 1996-10-21 2000-11-15 Nihon Shinku Gijutsu Kabushiki Kaisha Composite sputtering cathode assembly and sputtering apparatus with such composite sputtering cathode assembly
AUPO712097A0 (en) * 1997-05-30 1997-06-26 Lintek Pty Ltd Vacuum deposition system
US20040250767A1 (en) * 2003-04-21 2004-12-16 Rohm And Haas Electronic Materials, L.L.C. Method and apparatus for coating a substrate using combustion chemical vapor deposition
US7837836B2 (en) * 2004-02-12 2010-11-23 Seagate Technology Llc Method and apparatus for multi-stage sputter deposition of uniform thickness layers
DE202016101274U1 (en) 2016-03-08 2016-03-14 Lo Laseroptik Gmbh An apparatus equipped with an ion beam source for coating a substrate in a vacuum chamber

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4104418A (en) * 1975-09-23 1978-08-01 International Business Machines Corporation Glass layer fabrication
US4278528A (en) * 1979-10-09 1981-07-14 Coulter Systems Corporation Rectilinear sputtering apparatus and method
US4607593A (en) * 1983-12-23 1986-08-26 U.S. Philips Corporation Apparatus for processing articles in a controlled environment
JPS6171533A (en) * 1984-09-12 1986-04-12 Futaba Corp Method of manufacturing display tube
US5084151A (en) * 1985-11-26 1992-01-28 Sorin Biomedica S.P.A. Method and apparatus for forming prosthetic device having a biocompatible carbon film thereon
FR2593953B1 (en) * 1986-01-24 1988-04-29 Commissariat Energie Atomique METHOD FOR MANUFACTURING A DEVICE FOR VIEWING BY CATHODOLUMINESCENCE EXCITED BY FIELD EMISSION
DE3925536A1 (en) * 1989-08-02 1991-02-07 Leybold Ag ARRANGEMENT FOR THICKNESSING OF THICK FILMS
EP0428358B1 (en) * 1989-11-13 1996-05-15 Optical Coating Laboratory, Inc. Geometries and configurations for magnetron sputtering apparatus
JP2936276B2 (en) * 1990-02-27 1999-08-23 日本真空技術株式会社 Method and apparatus for manufacturing transparent conductive film
EP0518333B1 (en) * 1991-06-14 2002-08-28 Hughes Aircraft Company Method for inducing tilted perpendicular alignment in liquid crystals

Also Published As

Publication number Publication date
JPH08511305A (en) 1996-11-26
FR2711450A1 (en) 1995-04-28
EP0674804A1 (en) 1995-10-04
US5605608A (en) 1997-02-25
DE69400404T2 (en) 1996-12-19
FR2711450B1 (en) 1996-01-05
EP0674804B1 (en) 1996-08-21
WO1995011517A1 (en) 1995-04-27

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8327 Change in the person/name/address of the patent owner

Owner name: PIXTECH S.A., ROUSSET, FR

8339 Ceased/non-payment of the annual fee