DE69306132D1 - Herstellungsverfahren für Linsen, optische Systeme und Fokussierspiegel durch Mikrobearbeitung - Google Patents
Herstellungsverfahren für Linsen, optische Systeme und Fokussierspiegel durch MikrobearbeitungInfo
- Publication number
- DE69306132D1 DE69306132D1 DE69306132T DE69306132T DE69306132D1 DE 69306132 D1 DE69306132 D1 DE 69306132D1 DE 69306132 T DE69306132 T DE 69306132T DE 69306132 T DE69306132 T DE 69306132T DE 69306132 D1 DE69306132 D1 DE 69306132D1
- Authority
- DE
- Germany
- Prior art keywords
- micromachining
- lenses
- manufacturing process
- optical systems
- focusing mirrors
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 238000004519 manufacturing process Methods 0.000 title 1
- 238000005459 micromachining Methods 0.000 title 1
- 230000003287 optical effect Effects 0.000 title 1
Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
- G02B6/10—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type
- G02B6/12—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type of the integrated circuit kind
- G02B6/122—Basic optical elements, e.g. light-guiding paths
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S438/00—Semiconductor device manufacturing: process
- Y10S438/911—Differential oxidation and etching
Landscapes
- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Microelectronics & Electronic Packaging (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Optical Elements Other Than Lenses (AREA)
- Mounting And Adjusting Of Optical Elements (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US07/817,163 US5248379A (en) | 1992-01-06 | 1992-01-06 | Method to manufacture lenses, optical systems and focusing mirrors by micromachining |
Publications (2)
Publication Number | Publication Date |
---|---|
DE69306132D1 true DE69306132D1 (de) | 1997-01-09 |
DE69306132T2 DE69306132T2 (de) | 1997-06-12 |
Family
ID=25222473
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE69306132T Expired - Lifetime DE69306132T2 (de) | 1992-01-06 | 1993-01-05 | Herstellungsverfahren für Linsen, optische Systeme und Fokussierspiegel durch Mikrobearbeitung |
Country Status (4)
Country | Link |
---|---|
US (1) | US5248379A (de) |
EP (1) | EP0552862B1 (de) |
JP (1) | JP3280441B2 (de) |
DE (1) | DE69306132T2 (de) |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6071426A (en) * | 1997-12-08 | 2000-06-06 | The Regents Of The University Of California | Micro benchtop optics by bulk silicon micromachining |
US6115520A (en) * | 1998-03-05 | 2000-09-05 | Lucent Technologies Inc. | Compact mach-zehnder interferometer and wavelength reference employing same |
Family Cites Families (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4400866A (en) * | 1980-02-14 | 1983-08-30 | Xerox Corporation | Application of grown oxide bumper insulators to a high-speed VLSI SASMESFET |
US4338616A (en) * | 1980-02-19 | 1982-07-06 | Xerox Corporation | Self-aligned Schottky metal semi-conductor field effect transistor with buried source and drain |
US5149397A (en) * | 1991-07-03 | 1992-09-22 | Xerox Corporation | Fabrication methods for micromechanical elements |
-
1992
- 1992-01-06 US US07/817,163 patent/US5248379A/en not_active Expired - Lifetime
-
1993
- 1993-01-04 JP JP00006693A patent/JP3280441B2/ja not_active Expired - Lifetime
- 1993-01-05 DE DE69306132T patent/DE69306132T2/de not_active Expired - Lifetime
- 1993-01-05 EP EP93300039A patent/EP0552862B1/de not_active Expired - Lifetime
Also Published As
Publication number | Publication date |
---|---|
JP3280441B2 (ja) | 2002-05-13 |
EP0552862A1 (de) | 1993-07-28 |
DE69306132T2 (de) | 1997-06-12 |
EP0552862B1 (de) | 1996-11-27 |
JPH0643308A (ja) | 1994-02-18 |
US5248379A (en) | 1993-09-28 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
8364 | No opposition during term of opposition | ||
8320 | Willingness to grant licences declared (paragraph 23) | ||
R071 | Expiry of right |
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