DE69121201D1 - Verfahren und Gerät zur Erzeugung hochauflösender optischer Bilder - Google Patents

Verfahren und Gerät zur Erzeugung hochauflösender optischer Bilder

Info

Publication number
DE69121201D1
DE69121201D1 DE69121201T DE69121201T DE69121201D1 DE 69121201 D1 DE69121201 D1 DE 69121201D1 DE 69121201 T DE69121201 T DE 69121201T DE 69121201 T DE69121201 T DE 69121201T DE 69121201 D1 DE69121201 D1 DE 69121201D1
Authority
DE
Germany
Prior art keywords
generating high
optical images
resolution optical
resolution
images
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE69121201T
Other languages
English (en)
Inventor
Hans-E Dipl Phys Korth
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
International Business Machines Corp
Original Assignee
International Business Machines Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by International Business Machines Corp filed Critical International Business Machines Corp
Application granted granted Critical
Publication of DE69121201D1 publication Critical patent/DE69121201D1/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01Q—SCANNING-PROBE TECHNIQUES OR APPARATUS; APPLICATIONS OF SCANNING-PROBE TECHNIQUES, e.g. SCANNING PROBE MICROSCOPY [SPM]
    • G01Q60/00—Particular types of SPM [Scanning Probe Microscopy] or microscopes; Essential components thereof
    • G01Q60/18—SNOM [Scanning Near-Field Optical Microscopy] or apparatus therefor, e.g. SNOM probes
    • G01Q60/22—Probes, their manufacture, or their related instrumentation, e.g. holders
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y20/00—Nanooptics, e.g. quantum optics or photonic crystals
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y35/00—Methods or apparatus for measurement or analysis of nanostructures
DE69121201T 1991-08-27 1991-08-27 Verfahren und Gerät zur Erzeugung hochauflösender optischer Bilder Expired - Lifetime DE69121201D1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
EP91114365A EP0529125B1 (de) 1991-08-27 1991-08-27 Verfahren und Gerät zur Erzeugung hochauflösender optischer Bilder

Publications (1)

Publication Number Publication Date
DE69121201D1 true DE69121201D1 (de) 1996-09-05

Family

ID=8207077

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69121201T Expired - Lifetime DE69121201D1 (de) 1991-08-27 1991-08-27 Verfahren und Gerät zur Erzeugung hochauflösender optischer Bilder

Country Status (3)

Country Link
US (1) US5327223A (de)
EP (1) EP0529125B1 (de)
DE (1) DE69121201D1 (de)

Families Citing this family (32)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5867604A (en) * 1995-08-03 1999-02-02 Ben-Levy; Meir Imaging measurement system
US6403124B1 (en) * 1997-04-16 2002-06-11 Sigma-Tau Industrie Farmaceutiche Riunite S.P.A. Storage and maintenance of blood products including red blood cells and platelets
US6030827A (en) * 1998-01-23 2000-02-29 I-Stat Corporation Microfabricated aperture-based sensor
US6867406B1 (en) * 1999-03-23 2005-03-15 Kla-Tencor Corporation Confocal wafer inspection method and apparatus using fly lens arrangement
EP1303777A2 (de) * 2000-07-27 2003-04-23 Zetetic Institute Die steuerung von position und ausrichtung eines subwellenlängen-blendenarrays in der nahfeldmikroskopie
AU2001279048A1 (en) * 2000-07-27 2002-02-13 Zetetic Institute Multiple-source arrays with optical transmission enhanced by resonant cavities
US6897941B2 (en) * 2001-11-07 2005-05-24 Applied Materials, Inc. Optical spot grid array printer
KR20050044369A (ko) 2001-11-07 2005-05-12 어플라이드 머티어리얼스, 인코포레이티드 마스크없는 광자-전자 스팟-그리드 어레이 프린터
US7009712B2 (en) * 2003-01-27 2006-03-07 Zetetic Institute Leaky guided wave modes used in interferometric confocal microscopy to measure properties of trenches
JP2006516763A (ja) 2003-01-27 2006-07-06 ゼテテック インスティテュート 干渉計測対象物による反射／散乱および透過ビームの、四半分角視野共時測定のための装置および方法。
US7084983B2 (en) * 2003-01-27 2006-08-01 Zetetic Institute Interferometric confocal microscopy incorporating a pinhole array beam-splitter
EP1590626A4 (de) * 2003-02-04 2007-01-10 Zetetic Inst Kompensation von fehlanpassungseffekten bezüglich brechnungsindices an einer substrat-medium-grenzfläche in der nichtkonfokalen, konfokalen und der interferometrischen konfokalen mikroskopie
WO2004074880A2 (en) * 2003-02-19 2004-09-02 Zetetic Institute Longitudinal differential interferometric confocal microscopy
KR20050098940A (ko) * 2003-02-19 2005-10-12 제테틱 인스티튜트 암시야 간섭계 공초점 현미경을 위한 방법 및 장치
EP1608934A4 (de) * 2003-04-01 2007-03-21 Zetetic Inst Vorrichtung und verfahren zur verbundmessung von feldern gestreuter bzw. reflektierter oder durchgelassener orthogonal polarisierter strahlen durch ein objekt bei der interferometrie
JP2006522371A (ja) 2003-04-01 2006-09-28 ゼテテック インスティテュート 反射屈折光学レンズ・システムを構築する方法
EP1608933A4 (de) * 2003-04-03 2007-03-21 Zetetic Inst Vorrichtung und verfahren zur messung von feldern rückgestreuter und vorwärtsgestreuter bzw. reflektierter strahlen durch ein objekt bei der interferometrie
WO2005008334A2 (en) 2003-07-07 2005-01-27 Zetetic Institute Apparatus and method for high speed scan for detection and measurement of properties of sub-wavelength defects and artifacts in semiconductor and mask metrology
US7324209B2 (en) * 2003-07-07 2008-01-29 Zetetic Institute Apparatus and method for ellipsometric measurements with high spatial resolution
US7355722B2 (en) * 2003-09-10 2008-04-08 Zetetic Institute Catoptric and catadioptric imaging systems with adaptive catoptric surfaces
WO2005031397A2 (en) * 2003-09-26 2005-04-07 Zetetic Institute Catoptric and catadioptric imaging systems with pellicle and aperture-array beam-splitters and non-adaptive and adaptive catoptric surfaces
US7312877B2 (en) * 2003-10-01 2007-12-25 Zetetic Institute Method and apparatus for enhanced resolution of high spatial frequency components of images using standing wave beams in non-interferometric and interferometric microscopy
WO2005078382A1 (en) * 2004-01-22 2005-08-25 Mosong Cheng Apparatus and method for super-resolution optical microscopy
WO2005108914A2 (en) * 2004-05-06 2005-11-17 Zetetic Institute Apparatus and methods for measurement of critical dimensions of features and detection of defects in uv, vuv, and euv lithography masks
TW200538704A (en) * 2004-05-21 2005-12-01 Zetetic Inst Apparatus and methods for overlay, alignment mark, and critical dimension metrologies based on optical interferometry
TW200607991A (en) * 2004-08-16 2006-03-01 Zetetic Inst Apparatus and method for joint and time delayed measurements of components of conjugated quadratures of fields of reflected/scattered and transmitted/scattered beams by an object in interferometry
WO2006023612A2 (en) * 2004-08-19 2006-03-02 Zetetic Institute Sub-nanometer overlay, critical dimension, and lithography tool projection optic metrology systems based on measurement of exposure induced changes in photoresist on wafers
WO2006034065A2 (en) * 2004-09-20 2006-03-30 Zetetic Institute Catoptric imaging systems comprising pellicle and/or aperture-array beam-splitters and non-adaptive and /or adaptive catoptric surfaces
US20110026141A1 (en) * 2009-07-29 2011-02-03 Geoffrey Louis Barrows Low Profile Camera and Vision Sensor
CN107017191B (zh) * 2010-02-17 2020-08-14 株式会社尼康 搬送装置、曝光装置、以及元件制造方法
WO2011121523A2 (en) * 2010-03-28 2011-10-06 Ecole Polytechnique Federale De Lausanne (Epfl) Complex index refraction tomography with sub √6-resolution
CN104237982B (zh) * 2014-09-11 2015-12-30 南京理工大学 一种纳米尺度固体混合浸没透镜

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0112401B1 (de) * 1982-12-27 1987-04-22 International Business Machines Corporation Optisches Nahfeldabtastmikroskop
US4659429A (en) * 1983-08-03 1987-04-21 Cornell Research Foundation, Inc. Method and apparatus for production and use of nanometer scale light beams
US4806004A (en) * 1987-07-10 1989-02-21 California Institute Of Technology Scanning microscopy
DE3725234C1 (en) * 1987-07-30 1989-02-02 Edith Dipl-Phys Straubel Method for the visualisation of molecular structures of the surface of liquids
US4967077A (en) * 1989-05-09 1990-10-30 The United States Of America As Represented By The Secretary Of The Air Force Multiple aperture arrays for optical and radio frequency signals
FR2651332B1 (fr) * 1989-08-28 1994-05-06 Ardt Microscope en champ proche en reflexion utilisant un guide d'ondes comme sonde de ce champ.

Also Published As

Publication number Publication date
US5327223A (en) 1994-07-05
EP0529125A1 (de) 1993-03-03
EP0529125B1 (de) 1996-07-31

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Legal Events

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