AU2001279048A1 - Multiple-source arrays with optical transmission enhanced by resonant cavities - Google Patents
Multiple-source arrays with optical transmission enhanced by resonant cavitiesInfo
- Publication number
- AU2001279048A1 AU2001279048A1 AU2001279048A AU7904801A AU2001279048A1 AU 2001279048 A1 AU2001279048 A1 AU 2001279048A1 AU 2001279048 A AU2001279048 A AU 2001279048A AU 7904801 A AU7904801 A AU 7904801A AU 2001279048 A1 AU2001279048 A1 AU 2001279048A1
- Authority
- AU
- Australia
- Prior art keywords
- optical transmission
- resonant cavities
- source arrays
- transmission enhanced
- enhanced
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Abandoned
Links
Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01Q—SCANNING-PROBE TECHNIQUES OR APPARATUS; APPLICATIONS OF SCANNING-PROBE TECHNIQUES, e.g. SCANNING PROBE MICROSCOPY [SPM]
- G01Q70/00—General aspects of SPM probes, their manufacture or their related instrumentation, insofar as they are not specially adapted to a single SPM technique covered by group G01Q60/00
- G01Q70/06—Probe tip arrays
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y20/00—Nanooptics, e.g. quantum optics or photonic crystals
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y35/00—Methods or apparatus for measurement or analysis of nanostructures
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01Q—SCANNING-PROBE TECHNIQUES OR APPARATUS; APPLICATIONS OF SCANNING-PROBE TECHNIQUES, e.g. SCANNING PROBE MICROSCOPY [SPM]
- G01Q10/00—Scanning or positioning arrangements, i.e. arrangements for actively controlling the movement or position of the probe
- G01Q10/04—Fine scanning or positioning
- G01Q10/06—Circuits or algorithms therefor
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01Q—SCANNING-PROBE TECHNIQUES OR APPARATUS; APPLICATIONS OF SCANNING-PROBE TECHNIQUES, e.g. SCANNING PROBE MICROSCOPY [SPM]
- G01Q60/00—Particular types of SPM [Scanning Probe Microscopy] or microscopes; Essential components thereof
- G01Q60/18—SNOM [Scanning Near-Field Optical Microscopy] or apparatus therefor, e.g. SNOM probes
- G01Q60/22—Probes, their manufacture, or their related instrumentation, e.g. holders
Landscapes
- Physics & Mathematics (AREA)
- Health & Medical Sciences (AREA)
- General Health & Medical Sciences (AREA)
- General Physics & Mathematics (AREA)
- Nuclear Medicine, Radiotherapy & Molecular Imaging (AREA)
- Radiology & Medical Imaging (AREA)
- Chemical & Material Sciences (AREA)
- Nanotechnology (AREA)
- Engineering & Computer Science (AREA)
- Crystallography & Structural Chemistry (AREA)
- Optics & Photonics (AREA)
- Biophysics (AREA)
- Life Sciences & Earth Sciences (AREA)
- Analytical Chemistry (AREA)
- Investigating Or Analysing Materials By Optical Means (AREA)
- Microscoopes, Condenser (AREA)
- Lasers (AREA)
- Length Measuring Devices By Optical Means (AREA)
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US22109100P | 2000-07-27 | 2000-07-27 | |
US60/221,091 | 2000-07-27 | ||
PCT/US2001/023660 WO2002010829A2 (en) | 2000-07-27 | 2001-07-27 | Multiple-source arrays with optical transmission enhanced by resonant cavities |
Publications (1)
Publication Number | Publication Date |
---|---|
AU2001279048A1 true AU2001279048A1 (en) | 2002-02-13 |
Family
ID=22826307
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
AU2001279048A Abandoned AU2001279048A1 (en) | 2000-07-27 | 2001-07-27 | Multiple-source arrays with optical transmission enhanced by resonant cavities |
Country Status (5)
Country | Link |
---|---|
US (1) | US6847029B2 (en) |
EP (1) | EP1373959A2 (en) |
JP (1) | JP2004505256A (en) |
AU (1) | AU2001279048A1 (en) |
WO (1) | WO2002010829A2 (en) |
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US7139081B2 (en) | 2002-09-09 | 2006-11-21 | Zygo Corporation | Interferometry method for ellipsometry, reflectometry, and scatterometry measurements, including characterization of thin film structures |
US7869057B2 (en) | 2002-09-09 | 2011-01-11 | Zygo Corporation | Multiple-angle multiple-wavelength interferometer using high-NA imaging and spectral analysis |
US7084983B2 (en) * | 2003-01-27 | 2006-08-01 | Zetetic Institute | Interferometric confocal microscopy incorporating a pinhole array beam-splitter |
WO2004068186A2 (en) | 2003-01-27 | 2004-08-12 | Zetetic Institute | Interferometric confocal microscopy incorporating a pihnole array beam-splitter |
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US7164480B2 (en) * | 2003-02-04 | 2007-01-16 | Zetetic Institute | Compensation for effects of mismatch in indices of refraction at a substrate-medium interface in non-confocal, confocal, and interferometric confocal microscopy |
US7263259B2 (en) * | 2003-02-07 | 2007-08-28 | Zetetic Institute | Multiple-source arrays fed by guided-wave structures and resonant guided-wave structure cavities |
EP1595106A4 (en) * | 2003-02-13 | 2007-01-17 | Zetetic Inst | Transverse differential interferometric confocal microscopy |
KR20050098940A (en) * | 2003-02-19 | 2005-10-12 | 제테틱 인스티튜트 | Method and apparatus for dark field interferometric confocal microscopy |
US7133139B2 (en) * | 2003-02-19 | 2006-11-07 | Zetetic Institute | Longitudinal differential interferometric confocal microscopy |
US7324214B2 (en) | 2003-03-06 | 2008-01-29 | Zygo Corporation | Interferometer and method for measuring characteristics of optically unresolved surface features |
US7054077B2 (en) | 2003-04-01 | 2006-05-30 | Zetetic Institute | Method for constructing a catadioptric lens system |
EP1608934A4 (en) * | 2003-04-01 | 2007-03-21 | Zetetic Inst | Apparatus and method for joint measurement of fields of scattered/reflected or transmitted orthogonally polarized beams by an object in interferometry |
KR20050119680A (en) * | 2003-04-03 | 2005-12-21 | 제테틱 인스티튜트 | Apparatus and method for measurement of fields of backscattered and forward scattered/reflected beams by an object in interferometry |
US20050031278A1 (en) * | 2003-05-16 | 2005-02-10 | Xiaolei Shi | Near-field sub-wavelength apertures |
WO2005008214A2 (en) * | 2003-07-07 | 2005-01-27 | Zetetic Institute | Apparatus and method for ellipsometric measurements with high spatial resolution |
US7084984B2 (en) | 2003-07-07 | 2006-08-01 | Zetetic Institute | Apparatus and method for high speed scan for detection and measurement of properties of sub-wavelength defects and artifacts in semiconductor and mask metrology |
TW200523578A (en) * | 2003-09-10 | 2005-07-16 | Zetetic Inst | Catoptric and catadioptric imaging systems with adaptive catoptric surfaces |
US20050111007A1 (en) * | 2003-09-26 | 2005-05-26 | Zetetic Institute | Catoptric and catadioptric imaging system with pellicle and aperture-array beam-splitters and non-adaptive and adaptive catoptric surfaces |
WO2005033747A2 (en) * | 2003-10-01 | 2005-04-14 | Zetetic Institute | Method and apparatus for enhanced resolution of high spatial frequency components of images using standing wave beams in non-interferometric and interferometric microscopy |
JP2005309286A (en) * | 2004-04-26 | 2005-11-04 | Brother Ind Ltd | Image display device and radiation source device |
US7345771B2 (en) * | 2004-05-06 | 2008-03-18 | Zetetic Institute | Apparatus and method for measurement of critical dimensions of features and detection of defects in UV, VUV, and EUV lithography masks |
TW200604695A (en) * | 2004-05-18 | 2006-02-01 | Zygo Corp | Methods and systems for determining optical properties using low-coherence interference signals |
US7298496B2 (en) * | 2004-05-21 | 2007-11-20 | Zetetic Institute | Apparatus and methods for overlay, alignment mark, and critical dimension metrologies based on optical interferometry |
US7161680B2 (en) * | 2004-08-16 | 2007-01-09 | Zetetic Institute | Apparatus and method for joint and time delayed measurements of components of conjugated quadratures of fields of reflected/scattered and transmitted/scattered beams by an object in interferometry |
WO2006023612A2 (en) * | 2004-08-19 | 2006-03-02 | Zetetic Institute | Sub-nanometer overlay, critical dimension, and lithography tool projection optic metrology systems based on measurement of exposure induced changes in photoresist on wafers |
US7145663B2 (en) * | 2004-09-20 | 2006-12-05 | Zetetic Institute | Catoptric imaging systems comprising pellicle and/or aperture-array beam-splitters and non-adaptive and/or adaptive catoptric surfaces |
US7884947B2 (en) | 2005-01-20 | 2011-02-08 | Zygo Corporation | Interferometry for determining characteristics of an object surface, with spatially coherent illumination |
US7446882B2 (en) * | 2005-01-20 | 2008-11-04 | Zygo Corporation | Interferometer for determining characteristics of an object surface |
US7808023B2 (en) * | 2005-08-24 | 2010-10-05 | Aptina Imaging Corporation | Method and apparatus providing integrated color pixel with buried sub-wavelength gratings in solid state imagers |
US7469454B2 (en) * | 2005-08-25 | 2008-12-30 | Regents Of The University Of Colorado | Mounting system for optical frequency reference cavities |
US7799491B2 (en) * | 2006-04-07 | 2010-09-21 | Aptina Imaging Corp. | Color filter array and imaging device containing such color filter array and method of fabrication |
EP2097713A4 (en) | 2006-12-22 | 2010-09-15 | Zygo Corp | Apparatus and method for measuring characteristics of surface features |
US7889355B2 (en) | 2007-01-31 | 2011-02-15 | Zygo Corporation | Interferometry for lateral metrology |
WO2008151266A2 (en) * | 2007-06-05 | 2008-12-11 | Zygo Corporation | Interferometry for determining characteristics of an object surface, with spatially coherent illumination |
GB2451442B (en) * | 2007-07-30 | 2013-03-06 | Lein Applied Diagnostics Ltd | Optical measurement apparatus and method therefor |
WO2009064670A2 (en) | 2007-11-13 | 2009-05-22 | Zygo Corporation | Interferometer utilizing polarization scanning |
EP2269101A4 (en) * | 2007-12-10 | 2013-01-09 | Univ City New York Res Found | Sub-wavelength structures, devices and methods for light control in material composites |
US8126677B2 (en) | 2007-12-14 | 2012-02-28 | Zygo Corporation | Analyzing surface structure using scanning interferometry |
US8004688B2 (en) | 2008-11-26 | 2011-08-23 | Zygo Corporation | Scan error correction in low coherence scanning interferometry |
US8773760B2 (en) * | 2009-04-27 | 2014-07-08 | The Arizona Board Of Regents On Behalf Of The University Of Arizona | Multi-point scan architecture |
WO2011071819A1 (en) * | 2009-12-07 | 2011-06-16 | Regents Of The University Of California | Optical-cavity phase plate for transmission electron microscopy |
US9215425B1 (en) * | 2013-02-04 | 2015-12-15 | Bruker Nano Inc. | Camera-aided focusing in optical metrology |
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US4390994A (en) * | 1980-07-14 | 1983-06-28 | Roberts James R | Laser utilizing coated, multicapillary array as output window |
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EP1084378A1 (en) * | 1998-06-02 | 2001-03-21 | Zetetic Institute | Methods and apparatus for confocal interference microscopy using wavenumber domain reflectometry and background amplitude reduction and compensation |
JP4162292B2 (en) * | 1998-07-07 | 2008-10-08 | セイコーインスツル株式会社 | Information recording medium and information reproducing apparatus |
-
2001
- 2001-07-27 US US09/917,400 patent/US6847029B2/en not_active Expired - Fee Related
- 2001-07-27 EP EP01957288A patent/EP1373959A2/en not_active Withdrawn
- 2001-07-27 WO PCT/US2001/023660 patent/WO2002010829A2/en not_active Application Discontinuation
- 2001-07-27 AU AU2001279048A patent/AU2001279048A1/en not_active Abandoned
- 2001-07-27 JP JP2002515499A patent/JP2004505256A/en active Pending
Also Published As
Publication number | Publication date |
---|---|
US20020148955A1 (en) | 2002-10-17 |
WO2002010829A3 (en) | 2003-01-23 |
WO2002010829A8 (en) | 2003-07-10 |
US6847029B2 (en) | 2005-01-25 |
WO2002010829A2 (en) | 2002-02-07 |
EP1373959A2 (en) | 2004-01-02 |
JP2004505256A (en) | 2004-02-19 |
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