DE69112739T2 - SPRAYING TARGET, FILM RESISTANCE PRODUCED AND THERMAL PRINT HEAD AND RELATED PRODUCTION PROCESSES. - Google Patents
SPRAYING TARGET, FILM RESISTANCE PRODUCED AND THERMAL PRINT HEAD AND RELATED PRODUCTION PROCESSES.Info
- Publication number
- DE69112739T2 DE69112739T2 DE69112739T DE69112739T DE69112739T2 DE 69112739 T2 DE69112739 T2 DE 69112739T2 DE 69112739 T DE69112739 T DE 69112739T DE 69112739 T DE69112739 T DE 69112739T DE 69112739 T2 DE69112739 T2 DE 69112739T2
- Authority
- DE
- Germany
- Prior art keywords
- print head
- production processes
- thermal print
- film resistance
- related production
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01C—RESISTORS
- H01C17/00—Apparatus or processes specially adapted for manufacturing resistors
- H01C17/06—Apparatus or processes specially adapted for manufacturing resistors adapted for coating resistive material on a base
- H01C17/075—Apparatus or processes specially adapted for manufacturing resistors adapted for coating resistive material on a base by thin film techniques
- H01C17/12—Apparatus or processes specially adapted for manufacturing resistors adapted for coating resistive material on a base by thin film techniques by sputtering
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
- C23C14/3407—Cathode assembly for sputtering apparatus, e.g. Target
- C23C14/3414—Metallurgical or chemical aspects of target preparation, e.g. casting, powder metallurgy
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Organic Chemistry (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Manufacturing & Machinery (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Physical Vapour Deposition (AREA)
- Electronic Switches (AREA)
- Compositions Of Oxide Ceramics (AREA)
- Powder Metallurgy (AREA)
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2044690 | 1990-02-01 | ||
JP27777790 | 1990-10-18 | ||
PCT/JP1991/000119 WO1991011328A1 (en) | 1990-02-01 | 1991-01-31 | Sputtering target, film resistor formed with the use thereof, and thermal printer head |
Publications (2)
Publication Number | Publication Date |
---|---|
DE69112739D1 DE69112739D1 (en) | 1995-10-12 |
DE69112739T2 true DE69112739T2 (en) | 1996-04-11 |
Family
ID=26357406
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE69112739T Expired - Fee Related DE69112739T2 (en) | 1990-02-01 | 1991-01-31 | SPRAYING TARGET, FILM RESISTANCE PRODUCED AND THERMAL PRINT HEAD AND RELATED PRODUCTION PROCESSES. |
Country Status (5)
Country | Link |
---|---|
EP (1) | EP0471080B1 (en) |
JP (2) | JPH0726200B1 (en) |
KR (2) | KR960006591B1 (en) |
DE (1) | DE69112739T2 (en) |
WO (1) | WO1991011328A1 (en) |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP6311928B2 (en) * | 2014-07-11 | 2018-04-18 | 三菱マテリアル株式会社 | Sputtering target for forming Ta-Si-O-based thin film |
Family Cites Families (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5441718B2 (en) * | 1973-07-31 | 1979-12-10 | ||
JPS53113554A (en) * | 1977-03-15 | 1978-10-04 | Matsushita Electric Ind Co Ltd | Thin film type thermal head |
US4663120A (en) * | 1985-04-15 | 1987-05-05 | Gte Products Corporation | Refractory metal silicide sputtering target |
JPS62238767A (en) * | 1986-04-10 | 1987-10-19 | Ngk Insulators Ltd | Recorder |
JP2594794B2 (en) * | 1987-08-06 | 1997-03-26 | 株式会社ジャパンエナジー | Silicide target and its manufacturing method |
-
1991
- 1991-01-31 KR KR1019950704653A patent/KR960006591B1/en not_active IP Right Cessation
- 1991-01-31 DE DE69112739T patent/DE69112739T2/en not_active Expired - Fee Related
- 1991-01-31 JP JP3503460A patent/JPH0726200B1/ja not_active Expired - Lifetime
- 1991-01-31 EP EP91903659A patent/EP0471080B1/en not_active Expired - Lifetime
- 1991-01-31 KR KR1019950704652A patent/KR960006590B1/en not_active IP Right Cessation
- 1991-01-31 WO PCT/JP1991/000119 patent/WO1991011328A1/en active Application Filing
-
1994
- 1994-08-04 JP JP6183360A patent/JPH07292464A/en active Pending
Also Published As
Publication number | Publication date |
---|---|
KR960006591B1 (en) | 1996-05-20 |
EP0471080A1 (en) | 1992-02-19 |
JPH0726200B1 (en) | 1995-03-22 |
EP0471080B1 (en) | 1995-09-06 |
KR960006590B1 (en) | 1996-05-20 |
DE69112739D1 (en) | 1995-10-12 |
WO1991011328A1 (en) | 1991-08-08 |
JPH07292464A (en) | 1995-11-07 |
EP0471080A4 (en) | 1993-01-13 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
8364 | No opposition during term of opposition | ||
8320 | Willingness to grant licences declared (paragraph 23) | ||
8339 | Ceased/non-payment of the annual fee |