DE68901934D1 - Plasmaspritzen unter subathmosphaerischem druck von superleitenden keramischen werkstoffen. - Google Patents

Plasmaspritzen unter subathmosphaerischem druck von superleitenden keramischen werkstoffen.

Info

Publication number
DE68901934D1
DE68901934D1 DE8989103176T DE68901934T DE68901934D1 DE 68901934 D1 DE68901934 D1 DE 68901934D1 DE 8989103176 T DE8989103176 T DE 8989103176T DE 68901934 T DE68901934 T DE 68901934T DE 68901934 D1 DE68901934 D1 DE 68901934D1
Authority
DE
Germany
Prior art keywords
subathmospheric
super
pressure
ceramic materials
conducting ceramic
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE8989103176T
Other languages
English (en)
Other versions
DE68901934T2 (de
Inventor
Joseph D Reardon
Subramaniam Rangaswamy
Paul D Simokos
John H Harrington
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Applied Biosystems Inc
Original Assignee
Perkin Elmer Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Perkin Elmer Corp filed Critical Perkin Elmer Corp
Application granted granted Critical
Publication of DE68901934D1 publication Critical patent/DE68901934D1/de
Publication of DE68901934T2 publication Critical patent/DE68901934T2/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
    • C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
    • C04B35/00—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products
    • C04B35/01—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on oxide ceramics
    • C04B35/45—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on oxide ceramics based on copper oxide or solid solutions thereof with other oxides
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C4/00—Coating by spraying the coating material in the molten state, e.g. by flame, plasma or electric discharge
    • C23C4/04—Coating by spraying the coating material in the molten state, e.g. by flame, plasma or electric discharge characterised by the coating material
    • C23C4/10—Oxides, borides, carbides, nitrides or silicides; Mixtures thereof
    • C23C4/11—Oxides
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N60/00—Superconducting devices
    • H10N60/01—Manufacture or treatment
    • H10N60/0268—Manufacture or treatment of devices comprising copper oxide
    • H10N60/0296—Processes for depositing or forming copper oxide superconductor layers
    • H10N60/0492—Processes for depositing or forming copper oxide superconductor layers by thermal spraying, e.g. plasma deposition

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Materials Engineering (AREA)
  • Organic Chemistry (AREA)
  • Ceramic Engineering (AREA)
  • Plasma & Fusion (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Physics & Mathematics (AREA)
  • Structural Engineering (AREA)
  • Coating By Spraying Or Casting (AREA)
  • Inorganic Compounds Of Heavy Metals (AREA)
  • Superconductor Devices And Manufacturing Methods Thereof (AREA)
DE8989103176T 1988-02-24 1989-02-23 Plasmaspritzen unter subathmosphaerischem druck von superleitenden keramischen werkstoffen. Expired - Lifetime DE68901934T2 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US15999888A 1988-02-24 1988-02-24

Publications (2)

Publication Number Publication Date
DE68901934D1 true DE68901934D1 (de) 1992-08-06
DE68901934T2 DE68901934T2 (de) 1992-12-10

Family

ID=22575041

Family Applications (1)

Application Number Title Priority Date Filing Date
DE8989103176T Expired - Lifetime DE68901934T2 (de) 1988-02-24 1989-02-23 Plasmaspritzen unter subathmosphaerischem druck von superleitenden keramischen werkstoffen.

Country Status (5)

Country Link
EP (1) EP0330196B1 (de)
JP (1) JPH01309952A (de)
CN (1) CN1036286A (de)
BR (1) BR8900802A (de)
DE (1) DE68901934T2 (de)

Families Citing this family (19)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3853094T2 (de) * 1987-04-28 1995-08-10 Ibm Schnelle grossflächige Beschichtung aus Supraleitern mit hoher Sprungtemperatur.
US5356674A (en) * 1989-05-04 1994-10-18 Deutsche Forschungsanstalt Fuer Luft-Raumfahrt E.V. Process for applying ceramic coatings using a plasma jet carrying a free form non-metallic element
DE3921127A1 (de) * 1989-06-28 1991-01-03 Leybold Ag Verfahren fuer die herstellung supraleitender keramiken
DE3927168A1 (de) * 1989-08-17 1991-02-21 Hoechst Ag Verfahren zum thermischen spritzen von oxidkeramischen supraleitenden materialien
DE4322533A1 (de) * 1993-07-07 1995-01-12 Leybold Durferrit Gmbh Verfahren zur Herstellung supraleitender Keramiken und die Kermiken selbst
EP0960955A1 (de) 1998-05-26 1999-12-01 Universiteit Gent Verfahren und Vorrichtung zum thermischen Spritzen eines zähen Überzugs
DE102005029360B4 (de) * 2005-06-24 2011-11-10 Softal Corona & Plasma Gmbh Zwei Verfahren zur kontinuierlichen Atmosphärendruck Plasmabehandlung von Werkstücken, insbesondere Materialplatten oder -bahnen
WO2010128147A1 (de) * 2009-05-08 2010-11-11 Sulzer Metco Ag Verfahren zum beschichten eines substrats sowie substrat mit einer beschichtung
EP2503018B8 (de) * 2011-03-23 2018-11-21 Oerlikon Metco AG, Wohlen Plasmaspritzverfahren zum Herstellen einer ionenleitenden Membran
EP2784171B1 (de) 2011-11-22 2018-05-09 Nissan Motor Company, Limited Herstellungsverfahren für zylinderblock
US9034199B2 (en) 2012-02-21 2015-05-19 Applied Materials, Inc. Ceramic article with reduced surface defect density and process for producing a ceramic article
US9212099B2 (en) 2012-02-22 2015-12-15 Applied Materials, Inc. Heat treated ceramic substrate having ceramic coating and heat treatment for coated ceramics
US9090046B2 (en) 2012-04-16 2015-07-28 Applied Materials, Inc. Ceramic coated article and process for applying ceramic coating
US20130288037A1 (en) * 2012-04-27 2013-10-31 Applied Materials, Inc. Plasma spray coating process enhancement for critical chamber components
US9604249B2 (en) 2012-07-26 2017-03-28 Applied Materials, Inc. Innovative top-coat approach for advanced device on-wafer particle performance
US9343289B2 (en) 2012-07-27 2016-05-17 Applied Materials, Inc. Chemistry compatible coating material for advanced device on-wafer particle performance
US9865434B2 (en) 2013-06-05 2018-01-09 Applied Materials, Inc. Rare-earth oxide based erosion resistant coatings for semiconductor application
US9850568B2 (en) 2013-06-20 2017-12-26 Applied Materials, Inc. Plasma erosion resistant rare-earth oxide based thin film coatings
US11047035B2 (en) 2018-02-23 2021-06-29 Applied Materials, Inc. Protective yttria coating for semiconductor equipment parts

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3640757A (en) * 1968-08-09 1972-02-08 Avco Corp Flame deposited oxide coating and method of making same
DE2155217A1 (de) * 1971-11-06 1973-05-10 Philips Patentverwaltung Verfahren zur herstellung dielektrischer und/oder photoleitfaehiger schichten fuer den elektrostatischen druck bzw. elektrophotographie
EP0286135A3 (de) * 1987-04-10 1990-12-19 Sumitomo Electric Industries Limited Verfahren zur Herstellung einer Keramik aus supraleitendem Oxyd
JPH01172220A (ja) * 1987-12-26 1989-07-07 Tokai Univ 超電導材の製造方法

Also Published As

Publication number Publication date
EP0330196B1 (de) 1992-07-01
DE68901934T2 (de) 1992-12-10
JPH01309952A (ja) 1989-12-14
BR8900802A (pt) 1989-10-17
EP0330196A1 (de) 1989-08-30
CN1036286A (zh) 1989-10-11

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee