DE60306644D1 - Hochleistungsmikrowellenfenster - Google Patents
HochleistungsmikrowellenfensterInfo
- Publication number
- DE60306644D1 DE60306644D1 DE60306644T DE60306644T DE60306644D1 DE 60306644 D1 DE60306644 D1 DE 60306644D1 DE 60306644 T DE60306644 T DE 60306644T DE 60306644 T DE60306644 T DE 60306644T DE 60306644 D1 DE60306644 D1 DE 60306644D1
- Authority
- DE
- Germany
- Prior art keywords
- microwave window
- performance microwave
- performance
- window
- microwave
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Classifications
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
- H05B6/00—Heating by electric, magnetic or electromagnetic fields
- H05B6/64—Heating using microwaves
- H05B6/80—Apparatus for specific applications
- H05B6/806—Apparatus for specific applications for laboratory use
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/50—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges
- C23C16/511—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges using microwave discharges
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
- H01J37/32192—Microwave generated discharge
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
- H01J37/32192—Microwave generated discharge
- H01J37/32211—Means for coupling power to the plasma
- H01J37/32238—Windows
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01P—WAVEGUIDES; RESONATORS, LINES, OR OTHER DEVICES OF THE WAVEGUIDE TYPE
- H01P1/00—Auxiliary devices
- H01P1/08—Dielectric windows
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
- H05B6/00—Heating by electric, magnetic or electromagnetic fields
- H05B6/64—Heating using microwaves
- H05B6/70—Feed lines
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
- H05B6/00—Heating by electric, magnetic or electromagnetic fields
- H05B6/64—Heating using microwaves
- H05B6/76—Prevention of microwave leakage, e.g. door sealings
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
- H05B6/00—Heating by electric, magnetic or electromagnetic fields
- H05B6/64—Heating using microwaves
- H05B6/80—Apparatus for specific applications
Landscapes
- Physics & Mathematics (AREA)
- Chemical & Material Sciences (AREA)
- Electromagnetism (AREA)
- Engineering & Computer Science (AREA)
- Plasma & Fusion (AREA)
- Analytical Chemistry (AREA)
- General Health & Medical Sciences (AREA)
- Clinical Laboratory Science (AREA)
- Health & Medical Sciences (AREA)
- General Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Plasma Technology (AREA)
- Waveguide Connection Structure (AREA)
- Chemical Vapour Deposition (AREA)
- Particle Accelerators (AREA)
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US10/150,132 US6707017B2 (en) | 2002-05-16 | 2002-05-16 | High-power microwave window |
US150132 | 2002-05-16 | ||
PCT/US2003/015161 WO2003097891A2 (en) | 2002-05-16 | 2003-05-13 | High-power microwave window |
Publications (2)
Publication Number | Publication Date |
---|---|
DE60306644D1 true DE60306644D1 (de) | 2006-08-17 |
DE60306644T2 DE60306644T2 (de) | 2007-06-21 |
Family
ID=29419182
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE60306644T Expired - Fee Related DE60306644T2 (de) | 2002-05-16 | 2003-05-13 | Hochleistungsmikrowellenfenster |
Country Status (8)
Country | Link |
---|---|
US (1) | US6707017B2 (de) |
EP (1) | EP1507892B1 (de) |
JP (1) | JP2005531170A (de) |
KR (1) | KR20050006224A (de) |
AU (1) | AU2003234559B2 (de) |
DE (1) | DE60306644T2 (de) |
ES (1) | ES2268365T3 (de) |
WO (1) | WO2003097891A2 (de) |
Families Citing this family (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6965287B2 (en) * | 2004-03-31 | 2005-11-15 | Tokyo Electron Limited | Low reflection microwave window |
JP2005353364A (ja) * | 2004-06-09 | 2005-12-22 | Shibaura Mechatronics Corp | プラズマ発生装置、プラズマ処理装置及びプラズマ処理方法 |
TW200736018A (en) * | 2006-03-31 | 2007-10-01 | Hou-Fei Hu | Tool rack |
US20100214043A1 (en) * | 2009-02-20 | 2010-08-26 | Courtney Clifton C | High Peak and Average Power-Capable Microwave Window for Rectangular Waveguide |
CN109473753B (zh) * | 2018-11-21 | 2021-07-30 | 北京无线电计量测试研究所 | 一种周期阵列结构辐射体新型微波窗及测试方法 |
Family Cites Families (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE3028461A1 (de) * | 1980-07-26 | 1982-04-08 | Philips Patentverwaltung Gmbh, 2000 Hamburg | Hochbelastbares hf-fenster, insbesondere fuer grossklystrons |
DE3228367A1 (de) * | 1982-07-29 | 1984-02-02 | Siemens AG, 1000 Berlin und 8000 München | Vakuumdichte fensteranordnung fuer einen rechteck-hohlleiter |
US4620170A (en) * | 1984-12-19 | 1986-10-28 | Varian Associates, Inc. | Means for liquid cooling a microwave window |
US5038712A (en) * | 1986-09-09 | 1991-08-13 | Canon Kabushiki Kaisha | Apparatus with layered microwave window used in microwave plasma chemical vapor deposition process |
JPH0676664B2 (ja) * | 1986-12-09 | 1994-09-28 | キヤノン株式会社 | マイクロ波プラズマcvd法による機能性堆積膜の形成装置 |
US4931756A (en) * | 1988-04-08 | 1990-06-05 | Energy Conversion Devices, Inc. | High power microwave transmissive window assembly |
US5226967A (en) * | 1992-05-14 | 1993-07-13 | Lam Research Corporation | Plasma apparatus including dielectric window for inducing a uniform electric field in a plasma chamber |
US5306985A (en) * | 1992-07-17 | 1994-04-26 | Sematech, Inc. | ECR apparatus with magnetic coil for plasma refractive index control |
US5501740A (en) * | 1993-06-04 | 1996-03-26 | Applied Science And Technology, Inc. | Microwave plasma reactor |
WO1998033362A1 (fr) * | 1997-01-29 | 1998-07-30 | Tadahiro Ohmi | Dispositif a plasma |
-
2002
- 2002-05-16 US US10/150,132 patent/US6707017B2/en not_active Expired - Fee Related
-
2003
- 2003-05-13 JP JP2004505404A patent/JP2005531170A/ja not_active Withdrawn
- 2003-05-13 KR KR10-2004-7017768A patent/KR20050006224A/ko not_active Application Discontinuation
- 2003-05-13 DE DE60306644T patent/DE60306644T2/de not_active Expired - Fee Related
- 2003-05-13 WO PCT/US2003/015161 patent/WO2003097891A2/en active IP Right Grant
- 2003-05-13 ES ES03728900T patent/ES2268365T3/es not_active Expired - Lifetime
- 2003-05-13 AU AU2003234559A patent/AU2003234559B2/en not_active Ceased
- 2003-05-13 EP EP03728900A patent/EP1507892B1/de not_active Expired - Fee Related
Also Published As
Publication number | Publication date |
---|---|
JP2005531170A (ja) | 2005-10-13 |
EP1507892B1 (de) | 2006-07-05 |
US6707017B2 (en) | 2004-03-16 |
US20030213800A1 (en) | 2003-11-20 |
KR20050006224A (ko) | 2005-01-15 |
WO2003097891A2 (en) | 2003-11-27 |
AU2003234559B2 (en) | 2005-12-01 |
EP1507892A2 (de) | 2005-02-23 |
ES2268365T3 (es) | 2007-03-16 |
WO2003097891A3 (en) | 2004-07-29 |
DE60306644T2 (de) | 2007-06-21 |
AU2003234559A1 (en) | 2003-12-02 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
8364 | No opposition during term of opposition | ||
8339 | Ceased/non-payment of the annual fee |