DE60306644D1 - Hochleistungsmikrowellenfenster - Google Patents

Hochleistungsmikrowellenfenster

Info

Publication number
DE60306644D1
DE60306644D1 DE60306644T DE60306644T DE60306644D1 DE 60306644 D1 DE60306644 D1 DE 60306644D1 DE 60306644 T DE60306644 T DE 60306644T DE 60306644 T DE60306644 T DE 60306644T DE 60306644 D1 DE60306644 D1 DE 60306644D1
Authority
DE
Germany
Prior art keywords
microwave window
performance microwave
performance
window
microwave
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE60306644T
Other languages
English (en)
Other versions
DE60306644T2 (de
Inventor
Stoddard Williamson
B Hallock
B Willingham
M Alexy
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Raytheon Co
Original Assignee
Raytheon Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Raytheon Co filed Critical Raytheon Co
Application granted granted Critical
Publication of DE60306644D1 publication Critical patent/DE60306644D1/de
Publication of DE60306644T2 publication Critical patent/DE60306644T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
    • H05B6/00—Heating by electric, magnetic or electromagnetic fields
    • H05B6/64—Heating using microwaves
    • H05B6/80—Apparatus for specific applications
    • H05B6/806—Apparatus for specific applications for laboratory use
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/50—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges
    • C23C16/511—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges using microwave discharges
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32192—Microwave generated discharge
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32192—Microwave generated discharge
    • H01J37/32211—Means for coupling power to the plasma
    • H01J37/32238—Windows
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01P—WAVEGUIDES; RESONATORS, LINES, OR OTHER DEVICES OF THE WAVEGUIDE TYPE
    • H01P1/00—Auxiliary devices
    • H01P1/08—Dielectric windows
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
    • H05B6/00—Heating by electric, magnetic or electromagnetic fields
    • H05B6/64—Heating using microwaves
    • H05B6/70—Feed lines
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
    • H05B6/00—Heating by electric, magnetic or electromagnetic fields
    • H05B6/64—Heating using microwaves
    • H05B6/76—Prevention of microwave leakage, e.g. door sealings
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
    • H05B6/00—Heating by electric, magnetic or electromagnetic fields
    • H05B6/64—Heating using microwaves
    • H05B6/80—Apparatus for specific applications

Landscapes

  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Electromagnetism (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Analytical Chemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • Clinical Laboratory Science (AREA)
  • Health & Medical Sciences (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Plasma Technology (AREA)
  • Waveguide Connection Structure (AREA)
  • Chemical Vapour Deposition (AREA)
  • Particle Accelerators (AREA)
DE60306644T 2002-05-16 2003-05-13 Hochleistungsmikrowellenfenster Expired - Fee Related DE60306644T2 (de)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US10/150,132 US6707017B2 (en) 2002-05-16 2002-05-16 High-power microwave window
US150132 2002-05-16
PCT/US2003/015161 WO2003097891A2 (en) 2002-05-16 2003-05-13 High-power microwave window

Publications (2)

Publication Number Publication Date
DE60306644D1 true DE60306644D1 (de) 2006-08-17
DE60306644T2 DE60306644T2 (de) 2007-06-21

Family

ID=29419182

Family Applications (1)

Application Number Title Priority Date Filing Date
DE60306644T Expired - Fee Related DE60306644T2 (de) 2002-05-16 2003-05-13 Hochleistungsmikrowellenfenster

Country Status (8)

Country Link
US (1) US6707017B2 (de)
EP (1) EP1507892B1 (de)
JP (1) JP2005531170A (de)
KR (1) KR20050006224A (de)
AU (1) AU2003234559B2 (de)
DE (1) DE60306644T2 (de)
ES (1) ES2268365T3 (de)
WO (1) WO2003097891A2 (de)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6965287B2 (en) * 2004-03-31 2005-11-15 Tokyo Electron Limited Low reflection microwave window
JP2005353364A (ja) * 2004-06-09 2005-12-22 Shibaura Mechatronics Corp プラズマ発生装置、プラズマ処理装置及びプラズマ処理方法
TW200736018A (en) * 2006-03-31 2007-10-01 Hou-Fei Hu Tool rack
US20100214043A1 (en) * 2009-02-20 2010-08-26 Courtney Clifton C High Peak and Average Power-Capable Microwave Window for Rectangular Waveguide
CN109473753B (zh) * 2018-11-21 2021-07-30 北京无线电计量测试研究所 一种周期阵列结构辐射体新型微波窗及测试方法

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3028461A1 (de) * 1980-07-26 1982-04-08 Philips Patentverwaltung Gmbh, 2000 Hamburg Hochbelastbares hf-fenster, insbesondere fuer grossklystrons
DE3228367A1 (de) * 1982-07-29 1984-02-02 Siemens AG, 1000 Berlin und 8000 München Vakuumdichte fensteranordnung fuer einen rechteck-hohlleiter
US4620170A (en) * 1984-12-19 1986-10-28 Varian Associates, Inc. Means for liquid cooling a microwave window
US5038712A (en) * 1986-09-09 1991-08-13 Canon Kabushiki Kaisha Apparatus with layered microwave window used in microwave plasma chemical vapor deposition process
JPH0676664B2 (ja) * 1986-12-09 1994-09-28 キヤノン株式会社 マイクロ波プラズマｃｖｄ法による機能性堆積膜の形成装置
US4931756A (en) * 1988-04-08 1990-06-05 Energy Conversion Devices, Inc. High power microwave transmissive window assembly
US5226967A (en) * 1992-05-14 1993-07-13 Lam Research Corporation Plasma apparatus including dielectric window for inducing a uniform electric field in a plasma chamber
US5306985A (en) * 1992-07-17 1994-04-26 Sematech, Inc. ECR apparatus with magnetic coil for plasma refractive index control
US5501740A (en) * 1993-06-04 1996-03-26 Applied Science And Technology, Inc. Microwave plasma reactor
WO1998033362A1 (fr) * 1997-01-29 1998-07-30 Tadahiro Ohmi Dispositif a plasma

Also Published As

Publication number Publication date
JP2005531170A (ja) 2005-10-13
EP1507892B1 (de) 2006-07-05
US6707017B2 (en) 2004-03-16
US20030213800A1 (en) 2003-11-20
KR20050006224A (ko) 2005-01-15
WO2003097891A2 (en) 2003-11-27
AU2003234559B2 (en) 2005-12-01
EP1507892A2 (de) 2005-02-23
ES2268365T3 (es) 2007-03-16
WO2003097891A3 (en) 2004-07-29
DE60306644T2 (de) 2007-06-21
AU2003234559A1 (en) 2003-12-02

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee