DE60237911D1 - Hochreine aluminium-sputtertargets - Google Patents

Hochreine aluminium-sputtertargets

Info

Publication number
DE60237911D1
DE60237911D1 DE60237911T DE60237911T DE60237911D1 DE 60237911 D1 DE60237911 D1 DE 60237911D1 DE 60237911 T DE60237911 T DE 60237911T DE 60237911 T DE60237911 T DE 60237911T DE 60237911 D1 DE60237911 D1 DE 60237911D1
Authority
DE
Germany
Prior art keywords
sputter targets
aluminum sputter
aluminum
targets
sputter
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE60237911T
Other languages
English (en)
Inventor
Andrew C Perry
Paul S Gilman
Thomas J Hunt
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Praxair ST Technology Inc
Praxair Technology Inc
Original Assignee
Praxair ST Technology Inc
Praxair Technology Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Praxair ST Technology Inc, Praxair Technology Inc filed Critical Praxair ST Technology Inc
Priority claimed from PCT/US2002/033680 external-priority patent/WO2003042421A1/en
Application granted granted Critical
Publication of DE60237911D1 publication Critical patent/DE60237911D1/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C23C14/3407—Cathode assembly for sputtering apparatus, e.g. Target
    • C23C14/3414—Metallurgical or chemical aspects of target preparation, e.g. casting, powder metallurgy
    • C—CHEMISTRY; METALLURGY
    • C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22F—CHANGING THE PHYSICAL STRUCTURE OF NON-FERROUS METALS AND NON-FERROUS ALLOYS
    • C22F1/00—Changing the physical structure of non-ferrous metals or alloys by heat treatment or by hot or cold working
    • C22F1/04—Changing the physical structure of non-ferrous metals or alloys by heat treatment or by hot or cold working of aluminium or alloys based thereon

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Physics & Mathematics (AREA)
  • Thermal Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
DE60237911T 2001-11-13 2002-10-23 Hochreine aluminium-sputtertargets Expired - Lifetime DE60237911D1 (de)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US10/054,345 US20030098102A1 (en) 2001-11-13 2001-11-13 High-purity aluminum sputter targets and method of manufacture
US10/219,756 US6835251B2 (en) 2001-11-13 2002-08-16 High-purity aluminum sputter targets and method of manufacture
PCT/US2002/033680 WO2003042421A1 (en) 2001-11-13 2002-10-23 High-purity aluminum sputter targets

Publications (1)

Publication Number Publication Date
DE60237911D1 true DE60237911D1 (de) 2010-11-18

Family

ID=21990415

Family Applications (1)

Application Number Title Priority Date Filing Date
DE60237911T Expired - Lifetime DE60237911D1 (de) 2001-11-13 2002-10-23 Hochreine aluminium-sputtertargets

Country Status (3)

Country Link
US (2) US20030098102A1 (de)
DE (1) DE60237911D1 (de)
IL (1) IL161701A (de)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6605199B2 (en) * 2001-11-14 2003-08-12 Praxair S.T. Technology, Inc. Textured-metastable aluminum alloy sputter targets and method of manufacture
CA2564083C (en) * 2004-04-23 2014-02-04 Philip Morris Usa Inc. Aerosol generators and methods for producing aerosols
WO2010085316A1 (en) 2009-01-22 2010-07-29 Tosoh Smd, Inc. Monolithic aluminum alloy target and method of manufacturing
CN102171380B (zh) * 2009-08-12 2014-12-31 株式会社爱发科 溅射靶的制造方法
CN102002653B (zh) * 2010-11-27 2012-07-04 东北大学 一种超高纯铝细晶、高取向靶材的制备方法
WO2013065337A1 (ja) * 2011-11-04 2013-05-10 株式会社フェローテックセラミックス スパッタリングターゲットおよびその製造方法
WO2018235889A1 (ja) 2017-06-22 2018-12-27 株式会社Uacj スパッタリングターゲット材、スパッタリングターゲット、スパッタリングターゲット用アルミニウム板及びその製造方法

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5766380A (en) * 1996-11-05 1998-06-16 Sony Corporation Method for fabricating randomly oriented aluminum alloy sputtering targets with fine grains and fine precipitates
US6001227A (en) * 1997-11-26 1999-12-14 Applied Materials, Inc. Target for use in magnetron sputtering of aluminum for forming metallization films having low defect densities and methods for manufacturing and using such target
US20010047838A1 (en) * 2000-03-28 2001-12-06 Segal Vladimir M. Methods of forming aluminum-comprising physical vapor deposition targets; sputtered films; and target constructions
US6197129B1 (en) 2000-05-04 2001-03-06 The United States Of America As Represented By The United States Department Of Energy Method for producing ultrafine-grained materials using repetitive corrugation and straightening

Also Published As

Publication number Publication date
IL161701A (en) 2007-03-08
US6835251B2 (en) 2004-12-28
US20030098103A1 (en) 2003-05-29
US20030098102A1 (en) 2003-05-29

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