DE602008000820D1 - Magnetic sensor and manufacturing method therefor - Google Patents
Magnetic sensor and manufacturing method thereforInfo
- Publication number
- DE602008000820D1 DE602008000820D1 DE200860000820 DE602008000820T DE602008000820D1 DE 602008000820 D1 DE602008000820 D1 DE 602008000820D1 DE 200860000820 DE200860000820 DE 200860000820 DE 602008000820 T DE602008000820 T DE 602008000820T DE 602008000820 D1 DE602008000820 D1 DE 602008000820D1
- Authority
- DE
- Germany
- Prior art keywords
- manufacturing
- magnetic sensor
- method therefor
- therefor
- magnetic
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N30/00—Piezoelectric or electrostrictive devices
- H10N30/80—Constructional details
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01R—MEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
- G01R33/00—Arrangements or instruments for measuring magnetic variables
- G01R33/0047—Housings or packaging of magnetic sensors ; Holders
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01R—MEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
- G01R33/00—Arrangements or instruments for measuring magnetic variables
- G01R33/02—Measuring direction or magnitude of magnetic fields or magnetic flux
- G01R33/06—Measuring direction or magnitude of magnetic fields or magnetic flux using galvano-magnetic devices
- G01R33/09—Magnetoresistive devices
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N50/00—Galvanomagnetic devices
- H10N50/01—Manufacture or treatment
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N50/00—Galvanomagnetic devices
- H10N50/10—Magnetoresistive devices
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2007156423 | 2007-06-13 | ||
JP2008108061A JP5157611B2 (en) | 2007-06-13 | 2008-04-17 | Magnetic sensor and manufacturing method thereof |
Publications (1)
Publication Number | Publication Date |
---|---|
DE602008000820D1 true DE602008000820D1 (en) | 2010-04-29 |
Family
ID=40188644
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE200860000820 Active DE602008000820D1 (en) | 2007-06-13 | 2008-06-12 | Magnetic sensor and manufacturing method therefor |
Country Status (4)
Country | Link |
---|---|
JP (1) | JP5157611B2 (en) |
KR (1) | KR100996712B1 (en) |
CN (1) | CN101325210B (en) |
DE (1) | DE602008000820D1 (en) |
Families Citing this family (25)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US8451003B2 (en) | 2009-07-29 | 2013-05-28 | Tdk Corporation | Magnetic sensor having magneto-resistive elements on a substrate |
FR2955942B1 (en) * | 2010-01-29 | 2013-01-04 | Centre Nat Rech Scient | INTEGRATED MAGNETOMETER AND METHOD FOR MANUFACTURING THE SAME |
IT1403421B1 (en) | 2010-12-23 | 2013-10-17 | St Microelectronics Srl | INTEGRATED MAGNETORESISTIVE SENSOR, IN PARTICULAR TRIASSIAL MAGNETORESISTIVE SENSOR AND ITS MANUFACTURING PROCEDURE |
CN202433514U (en) * | 2011-01-17 | 2012-09-12 | 江苏多维科技有限公司 | Independently-packaged bridge-type magnetic field sensor |
CN102226835A (en) | 2011-04-06 | 2011-10-26 | 江苏多维科技有限公司 | Single-chip double-axis magnetic field sensor and preparation method thereof |
CN202305777U (en) * | 2011-04-06 | 2012-07-04 | 江苏多维科技有限公司 | Monolithic biaxial bridge-type magnetic field sensor |
CN102385043B (en) * | 2011-08-30 | 2013-08-21 | 江苏多维科技有限公司 | Magnetic tunnel junction (MTJ) triaxial magnetic field sensor and packaging method thereof |
CN102651343B (en) * | 2012-03-16 | 2014-12-24 | 京东方科技集团股份有限公司 | Manufacturing method of array substrate, array substrate and display device |
DE102012204835A1 (en) * | 2012-03-27 | 2013-10-02 | Robert Bosch Gmbh | Sensor, method for manufacturing a sensor and method for mounting a sensor |
CN102830372A (en) * | 2012-09-05 | 2012-12-19 | 复旦大学 | Three-dimensional anisotropic magnetic field sensor employing 45-degree oblique angle and manufacturing method thereof |
CN102830374A (en) * | 2012-09-05 | 2012-12-19 | 复旦大学 | Three-dimensional tunnelling magnetic field sensor using angle of 45 degrees and manufacturing method thereof |
WO2014059110A1 (en) * | 2012-10-12 | 2014-04-17 | Memsic, Inc. | Monolithic three-axis magnetic field sensor |
CN103839320A (en) * | 2012-11-23 | 2014-06-04 | 北京嘉岳同乐极电子有限公司 | Magnetic sensor used for financial counterfeit detection machine and manufacturing method thereof |
JP6688409B2 (en) * | 2013-03-25 | 2020-04-28 | ローム株式会社 | Semiconductor device |
CN103630854B (en) * | 2013-10-24 | 2016-01-13 | 黑龙江大学 | Space three-dimensional magnetic field detection sensor |
JP5766321B1 (en) | 2014-03-07 | 2015-08-19 | 三菱電機株式会社 | TMR magnetic sensor and manufacturing method thereof |
WO2016075763A1 (en) * | 2014-11-12 | 2016-05-19 | 株式会社日立製作所 | Magnetic sensor |
CN108291948B (en) * | 2015-12-03 | 2021-04-13 | 阿尔卑斯阿尔派株式会社 | Magnetic detection device and method for manufacturing the same |
US10067201B2 (en) * | 2016-04-14 | 2018-09-04 | Texas Instruments Incorporated | Wiring layout to reduce magnetic field |
US11360124B2 (en) * | 2018-03-01 | 2022-06-14 | Yokogawa Electric Corporation | Current measuring device, current measuring method, and non-transitory computer-readable storage medium |
JP7107330B2 (en) * | 2020-03-27 | 2022-07-27 | Tdk株式会社 | Magnetic sensor and manufacturing method thereof |
CN111965571B (en) * | 2020-07-29 | 2022-11-11 | 珠海多创科技有限公司 | Preparation method of GMR magnetic field sensor |
JP7347397B2 (en) * | 2020-10-28 | 2023-09-20 | Tdk株式会社 | Magnetic sensor and its manufacturing method |
CN113030803A (en) * | 2021-03-01 | 2021-06-25 | 歌尔微电子股份有限公司 | Magnetic sensor, method for manufacturing magnetic sensor, and electronic device |
JP2023125569A (en) * | 2022-02-28 | 2023-09-07 | ソニーセミコンダクタソリューションズ株式会社 | Storage device, electronic apparatus, and manufacturing method of storage device |
Family Cites Families (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP3596600B2 (en) * | 2000-06-02 | 2004-12-02 | ヤマハ株式会社 | Magnetic sensor and method of manufacturing the same |
JP3971934B2 (en) * | 2001-03-07 | 2007-09-05 | ヤマハ株式会社 | Magnetic sensor and its manufacturing method |
DE10145300C1 (en) * | 2001-09-14 | 2002-10-17 | Bosch Gmbh Robert | Sensor element for angle or rotation sensor, uses 2 pairs of magneto-resistive in 2 angled planes connected in Wheatstone bridge circuit |
JP4085859B2 (en) | 2002-03-27 | 2008-05-14 | ヤマハ株式会社 | Magnetic sensor and manufacturing method thereof |
JP4177032B2 (en) * | 2002-06-04 | 2008-11-05 | 株式会社ワコー | Three-dimensional magnetic sensor and manufacturing method thereof |
-
2008
- 2008-04-17 JP JP2008108061A patent/JP5157611B2/en not_active Expired - Fee Related
- 2008-06-12 DE DE200860000820 patent/DE602008000820D1/en active Active
- 2008-06-13 CN CN2008101254584A patent/CN101325210B/en not_active Expired - Fee Related
- 2008-06-13 KR KR20080056029A patent/KR100996712B1/en active IP Right Grant
Also Published As
Publication number | Publication date |
---|---|
CN101325210A (en) | 2008-12-17 |
KR100996712B1 (en) | 2010-11-25 |
JP5157611B2 (en) | 2013-03-06 |
CN101325210B (en) | 2010-11-24 |
KR20080109683A (en) | 2008-12-17 |
JP2009020092A (en) | 2009-01-29 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
8364 | No opposition during term of opposition |