DE602006021150D1 - Monolithisch integrierte leistungsverstärkereinrichtung - Google Patents

Monolithisch integrierte leistungsverstärkereinrichtung

Info

Publication number
DE602006021150D1
DE602006021150D1 DE602006021150T DE602006021150T DE602006021150D1 DE 602006021150 D1 DE602006021150 D1 DE 602006021150D1 DE 602006021150 T DE602006021150 T DE 602006021150T DE 602006021150 T DE602006021150 T DE 602006021150T DE 602006021150 D1 DE602006021150 D1 DE 602006021150D1
Authority
DE
Germany
Prior art keywords
power amplifier
integrated power
monolithically integrated
monolithically
amplifier
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
DE602006021150T
Other languages
English (en)
Inventor
Torkel Arnborg
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Infineon Technologies AG
Original Assignee
Infineon Technologies AG
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Infineon Technologies AG filed Critical Infineon Technologies AG
Publication of DE602006021150D1 publication Critical patent/DE602006021150D1/de
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • HELECTRICITY
    • H03ELECTRONIC CIRCUITRY
    • H03FAMPLIFIERS
    • H03F3/00Amplifiers with only discharge tubes or only semiconductor devices as amplifying elements
    • H03F3/20Power amplifiers, e.g. Class B amplifiers, Class C amplifiers
    • H03F3/21Power amplifiers, e.g. Class B amplifiers, Class C amplifiers with semiconductor devices only
    • H03F3/211Power amplifiers, e.g. Class B amplifiers, Class C amplifiers with semiconductor devices only using a combination of several amplifiers
    • HELECTRICITY
    • H03ELECTRONIC CIRCUITRY
    • H03FAMPLIFIERS
    • H03F3/00Amplifiers with only discharge tubes or only semiconductor devices as amplifying elements
    • H03F3/189High frequency amplifiers, e.g. radio frequency amplifiers
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/70Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
    • H01L21/77Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate
    • H01L21/78Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate with subsequent division of the substrate into plural individual devices
    • H01L21/82Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate with subsequent division of the substrate into plural individual devices to produce devices, e.g. integrated circuits, each consisting of a plurality of components
    • H01L21/822Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate with subsequent division of the substrate into plural individual devices to produce devices, e.g. integrated circuits, each consisting of a plurality of components the substrate being a semiconductor, using silicon technology
    • H01L21/8232Field-effect technology
    • H01L21/8234MIS technology, i.e. integration processes of field effect transistors of the conductor-insulator-semiconductor type
    • H01L21/823475MIS technology, i.e. integration processes of field effect transistors of the conductor-insulator-semiconductor type interconnection or wiring or contact manufacturing related aspects
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L27/00Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
    • H01L27/02Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having at least one potential-jump barrier or surface barrier; including integrated passive circuit elements with at least one potential-jump barrier or surface barrier
    • H01L27/0203Particular design considerations for integrated circuits
    • H01L27/0207Geometrical layout of the components, e.g. computer aided design; custom LSI, semi-custom LSI, standard cell technique
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L27/00Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
    • H01L27/02Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having at least one potential-jump barrier or surface barrier; including integrated passive circuit elements with at least one potential-jump barrier or surface barrier
    • H01L27/04Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having at least one potential-jump barrier or surface barrier; including integrated passive circuit elements with at least one potential-jump barrier or surface barrier the substrate being a semiconductor body
    • H01L27/08Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having at least one potential-jump barrier or surface barrier; including integrated passive circuit elements with at least one potential-jump barrier or surface barrier the substrate being a semiconductor body including only semiconductor components of a single kind
    • H01L27/085Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having at least one potential-jump barrier or surface barrier; including integrated passive circuit elements with at least one potential-jump barrier or surface barrier the substrate being a semiconductor body including only semiconductor components of a single kind including field-effect components only
    • H01L27/088Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having at least one potential-jump barrier or surface barrier; including integrated passive circuit elements with at least one potential-jump barrier or surface barrier the substrate being a semiconductor body including only semiconductor components of a single kind including field-effect components only the components being field-effect transistors with insulated gate
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L29/00Semiconductor devices adapted for rectifying, amplifying, oscillating or switching, or capacitors or resistors with at least one potential-jump barrier or surface barrier, e.g. PN junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof  ; Multistep manufacturing processes therefor
    • H01L29/40Electrodes ; Multistep manufacturing processes therefor
    • H01L29/41Electrodes ; Multistep manufacturing processes therefor characterised by their shape, relative sizes or dispositions
    • H01L29/417Electrodes ; Multistep manufacturing processes therefor characterised by their shape, relative sizes or dispositions carrying the current to be rectified, amplified or switched
    • H01L29/41725Source or drain electrodes for field effect devices
    • H01L29/41758Source or drain electrodes for field effect devices for lateral devices with structured layout for source or drain region, i.e. the source or drain region having cellular, interdigitated or ring structure or being curved or angular
    • HELECTRICITY
    • H03ELECTRONIC CIRCUITRY
    • H03FAMPLIFIERS
    • H03F1/00Details of amplifiers with only discharge tubes, only semiconductor devices or only unspecified devices as amplifying elements
    • H03F1/02Modifications of amplifiers to raise the efficiency, e.g. gliding Class A stages, use of an auxiliary oscillation
    • H03F1/0205Modifications of amplifiers to raise the efficiency, e.g. gliding Class A stages, use of an auxiliary oscillation in transistor amplifiers
    • H03F1/0277Selecting one or more amplifiers from a plurality of amplifiers
    • HELECTRICITY
    • H03ELECTRONIC CIRCUITRY
    • H03FAMPLIFIERS
    • H03F1/00Details of amplifiers with only discharge tubes, only semiconductor devices or only unspecified devices as amplifying elements
    • H03F1/02Modifications of amplifiers to raise the efficiency, e.g. gliding Class A stages, use of an auxiliary oscillation
    • H03F1/0205Modifications of amplifiers to raise the efficiency, e.g. gliding Class A stages, use of an auxiliary oscillation in transistor amplifiers
    • H03F1/0288Modifications of amplifiers to raise the efficiency, e.g. gliding Class A stages, use of an auxiliary oscillation in transistor amplifiers using a main and one or several auxiliary peaking amplifiers whereby the load is connected to the main amplifier using an impedance inverter, e.g. Doherty amplifiers
    • HELECTRICITY
    • H03ELECTRONIC CIRCUITRY
    • H03FAMPLIFIERS
    • H03F1/00Details of amplifiers with only discharge tubes, only semiconductor devices or only unspecified devices as amplifying elements
    • H03F1/30Modifications of amplifiers to reduce influence of variations of temperature or supply voltage or other physical parameters
    • HELECTRICITY
    • H03ELECTRONIC CIRCUITRY
    • H03FAMPLIFIERS
    • H03F3/00Amplifiers with only discharge tubes or only semiconductor devices as amplifying elements
    • H03F3/189High frequency amplifiers, e.g. radio frequency amplifiers
    • H03F3/19High frequency amplifiers, e.g. radio frequency amplifiers with semiconductor devices only
    • HELECTRICITY
    • H03ELECTRONIC CIRCUITRY
    • H03FAMPLIFIERS
    • H03F2200/00Indexing scheme relating to amplifiers
    • H03F2200/451Indexing scheme relating to amplifiers the amplifier being a radio frequency amplifier

Landscapes

  • Engineering & Computer Science (AREA)
  • Power Engineering (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Computer Hardware Design (AREA)
  • General Engineering & Computer Science (AREA)
  • Ceramic Engineering (AREA)
  • Manufacturing & Machinery (AREA)
  • Amplifiers (AREA)
  • Microwave Amplifiers (AREA)
DE602006021150T 2005-02-28 2006-01-27 Monolithisch integrierte leistungsverstärkereinrichtung Active DE602006021150D1 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
SE0500452A SE528473C2 (sv) 2005-02-28 2005-02-28 Monolitiskt integrerad effektförstärkaranordning
PCT/EP2006/000738 WO2006089614A1 (en) 2005-02-28 2006-01-27 Monolithically integrated power amplifier device

Publications (1)

Publication Number Publication Date
DE602006021150D1 true DE602006021150D1 (de) 2011-05-19

Family

ID=36226433

Family Applications (1)

Application Number Title Priority Date Filing Date
DE602006021150T Active DE602006021150D1 (de) 2005-02-28 2006-01-27 Monolithisch integrierte leistungsverstärkereinrichtung

Country Status (7)

Country Link
US (1) US7330077B2 (de)
EP (1) EP1854207B1 (de)
KR (1) KR100816904B1 (de)
CN (1) CN100492884C (de)
DE (1) DE602006021150D1 (de)
SE (1) SE528473C2 (de)
WO (1) WO2006089614A1 (de)

Families Citing this family (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7609115B2 (en) * 2007-09-07 2009-10-27 Raytheon Company Input circuitry for transistor power amplifier and method for designing such circuitry
US7973684B2 (en) * 2008-10-27 2011-07-05 Microchip Technology Incorporated Self auto-calibration of analog circuits in a mixed signal integrated circuit device
EP2425527B1 (de) * 2009-04-30 2013-12-25 Freescale Semiconductor, Inc. Drahtlose kommunikationseinrichtung und halbleiterkapselungseinrichtung mit einem leistungsverstärker dafür
CN102281220B (zh) 2010-06-12 2015-04-29 华为技术有限公司 数据流处理方法、设备及系统
CN102339336A (zh) * 2010-07-22 2012-02-01 沈阳中科微电子有限公司 改善微波/射频功率放大器芯片热失效的设计方法
CN102130657A (zh) * 2010-09-14 2011-07-20 华为技术有限公司 一种功率放大器、不对称达赫笛功率放大设备和基站
JP5599364B2 (ja) * 2011-05-06 2014-10-01 三菱電機株式会社 ドハティ増幅器
CN103259494A (zh) * 2012-02-16 2013-08-21 京信通信系统(中国)有限公司 一种功率放大器
US8928411B2 (en) 2012-12-31 2015-01-06 Silicon Image, Inc. Integration of signal sampling within transistor amplifier stage
CN104065351B (zh) * 2013-03-18 2017-02-22 宋胜君 一种基于单片集成电路的功率放大器
KR101729653B1 (ko) 2013-12-30 2017-04-25 한국전자통신연구원 질화물 반도체 소자
CN108370235B (zh) * 2015-12-17 2021-09-07 瑞士优北罗股份有限公司 功率放大器装置、包络跟踪放大器装置和放大信号的方法
EP3951871A4 (de) * 2019-04-01 2022-05-11 Nuvoton Technology Corporation Japan Monolithisches halbleiterbauelement und hybrides halbleiterbauelement
US11108361B2 (en) 2019-08-15 2021-08-31 Nxp Usa, Inc. Integrated multiple-path power amplifier with interdigitated transistors
US11417644B2 (en) * 2020-06-17 2022-08-16 Macom Technology Solutions Holdings, Inc. Integration of multiple discrete GaN devices

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4939485A (en) * 1988-12-09 1990-07-03 Varian Associates, Inc. Microwave field effect switch
US5420541A (en) * 1993-06-04 1995-05-30 Raytheon Company Microwave doherty amplifier
US5757229A (en) * 1996-06-28 1998-05-26 Motorola, Inc. Bias circuit for a power amplifier
JPH11261351A (ja) * 1998-03-09 1999-09-24 Matsushita Electric Ind Co Ltd 電力増幅器mmic
JP2001068556A (ja) * 1999-08-30 2001-03-16 Mobile Communications Tokyo Inc 高周波電力増幅用半導体装置
SE522892C2 (sv) * 1999-09-28 2004-03-16 Ericsson Telefon Ab L M En förstärkarkrets för att förstärka signaler
WO2002025810A2 (en) 2000-09-22 2002-03-28 U.S. Monolithics, L.L.C. Mmic folded power amplifier
US6362689B1 (en) 2000-09-22 2002-03-26 U.S. Monolithics, L.L.C. MMIC folded power amplifier

Also Published As

Publication number Publication date
WO2006089614A1 (en) 2006-08-31
KR20070088307A (ko) 2007-08-29
CN100492884C (zh) 2009-05-27
EP1854207A1 (de) 2007-11-14
US20070146079A1 (en) 2007-06-28
SE528473C2 (sv) 2006-11-21
CN1954488A (zh) 2007-04-25
EP1854207B1 (de) 2011-04-06
KR100816904B1 (ko) 2008-03-25
US7330077B2 (en) 2008-02-12
SE0500452L (sv) 2006-08-29

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