DE602005018769D1 - Vorrichtung zum austasten eines strahls geladener teilchen - Google Patents

Vorrichtung zum austasten eines strahls geladener teilchen

Info

Publication number
DE602005018769D1
DE602005018769D1 DE602005018769T DE602005018769T DE602005018769D1 DE 602005018769 D1 DE602005018769 D1 DE 602005018769D1 DE 602005018769 T DE602005018769 T DE 602005018769T DE 602005018769 T DE602005018769 T DE 602005018769T DE 602005018769 D1 DE602005018769 D1 DE 602005018769D1
Authority
DE
Germany
Prior art keywords
turning
loaded particles
blanking
plate
loaded
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
DE602005018769T
Other languages
English (en)
Inventor
Tao Zhang
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nanobeam Ltd
Original Assignee
Nanobeam Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nanobeam Ltd filed Critical Nanobeam Ltd
Publication of DE602005018769D1 publication Critical patent/DE602005018769D1/de
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • G—PHYSICS
    • G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21K—TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
    • G21K1/00—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating
    • G21K1/08—Deviation, concentration or focusing of the beam by electric or magnetic means
    • G21K1/087—Deviation, concentration or focusing of the beam by electric or magnetic means by electrical means
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement, ion-optical arrangement
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement, ion-optical arrangement
    • H01J37/045—Beam blanking or chopping, i.e. arrangements for momentarily interrupting exposure to the discharge
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement, ion-optical arrangement
    • H01J37/09—Diaphragms; Shields associated with electron or ion-optical arrangements; Compensation of disturbing fields
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement, ion-optical arrangement
    • H01J37/147—Arrangements for directing or deflecting the discharge along a desired path
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement, ion-optical arrangement
    • H01J37/147—Arrangements for directing or deflecting the discharge along a desired path
    • H01J37/1472—Deflecting along given lines
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement, ion-optical arrangement
    • H01J37/147—Arrangements for directing or deflecting the discharge along a desired path
    • H01J37/15—External mechanical adjustment of electron or ion optical components
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J9/00—Apparatus or processes specially adapted for the manufacture, installation, removal, maintenance of electric discharge tubes, discharge lamps, or parts thereof; Recovery of material from discharge tubes or lamps
    • H01J9/02—Manufacture of electrodes or electrode systems
    • H01J9/14—Manufacture of electrodes or electrode systems of non-emitting electrodes
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/02—Details
    • H01J2237/028—Particle traps
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/04—Means for controlling the discharge
    • H01J2237/045—Diaphragms
    • H01J2237/0451—Diaphragms with fixed aperture
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/30—Electron or ion beam tubes for processing objects
    • H01J2237/317—Processing objects on a microscale
    • H01J2237/3175—Lithography

Landscapes

  • Analytical Chemistry (AREA)
  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Engineering & Computer Science (AREA)
  • High Energy & Nuclear Physics (AREA)
  • Manufacturing & Machinery (AREA)
  • General Physics & Mathematics (AREA)
  • Electron Beam Exposure (AREA)
  • Electron Sources, Ion Sources (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)
  • Medicines Containing Antibodies Or Antigens For Use As Internal Diagnostic Agents (AREA)
DE602005018769T 2004-06-03 2005-05-13 Vorrichtung zum austasten eines strahls geladener teilchen Active DE602005018769D1 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
GB0412428A GB2414857B (en) 2004-06-03 2004-06-03 Apparatus for blanking a charged particle beam
PCT/GB2005/050064 WO2005119361A2 (en) 2004-06-03 2005-05-13 Apparatus for blanking a charged particle beam

Publications (1)

Publication Number Publication Date
DE602005018769D1 true DE602005018769D1 (de) 2010-02-25

Family

ID=32696629

Family Applications (1)

Application Number Title Priority Date Filing Date
DE602005018769T Active DE602005018769D1 (de) 2004-06-03 2005-05-13 Vorrichtung zum austasten eines strahls geladener teilchen

Country Status (11)

Country Link
US (1) US7728308B2 (de)
EP (1) EP1751784B1 (de)
JP (1) JP2008502101A (de)
KR (1) KR20070034570A (de)
CN (1) CN1985344B (de)
AT (1) ATE454706T1 (de)
DE (1) DE602005018769D1 (de)
GB (1) GB2414857B (de)
IL (1) IL179663A (de)
TW (1) TW200603685A (de)
WO (1) WO2005119361A2 (de)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102010007777A1 (de) 2010-02-12 2011-08-18 Carl Zeiss NTS GmbH, 73447 Teilchenstrahlsystem
JP6014342B2 (ja) 2012-03-22 2016-10-25 株式会社ニューフレアテクノロジー マルチ荷電粒子ビーム描画装置及びマルチ荷電粒子ビーム描画方法
JP2014057022A (ja) * 2012-09-14 2014-03-27 Canon Inc 静電レンズユニット
US9881764B2 (en) 2016-01-09 2018-01-30 Kla-Tencor Corporation Heat-spreading blanking system for high throughput electron beam apparatus

Family Cites Families (24)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5116754B1 (de) * 1970-03-04 1976-05-27
JPS52119178A (en) * 1976-03-31 1977-10-06 Toshiba Corp Electron beam exposure device
DD158726A3 (de) * 1980-07-01 1983-02-02 Georg Kuschel Elektrostatisches ablenksystem
US4445041A (en) 1981-06-02 1984-04-24 Hewlett-Packard Company Electron beam blanker
US4434371A (en) * 1982-03-04 1984-02-28 Hughes Aircraft Company Electron beam blanking apparatus and method
US4721909A (en) * 1985-08-16 1988-01-26 Schlumberger Technology Corporation Apparatus for pulsing electron beams
US4829243A (en) * 1988-02-19 1989-05-09 Microelectronics And Computer Technology Corporation Electron beam testing of electronic components
DE3938221A1 (de) * 1989-11-17 1991-05-23 Messer Griesheim Gmbh Verfahren zum schutz einer blende beim erzeugen von elektronenstrahlimpulsen
DE4210185A1 (de) 1991-03-28 1993-01-14 Fraunhofer Ges Forschung Vorrichtung zur erzeugung kurzer teilchenstrahlpulse
US5155368A (en) * 1991-04-16 1992-10-13 Micrion Corporation Ion beam blanking apparatus and method
US5276330A (en) * 1991-05-29 1994-01-04 Etec Systems, Inc. High accuracy beam blanker
US5382895A (en) * 1992-12-28 1995-01-17 Regents Of The University Of California System for tomographic determination of the power distribution in electron beams
US6005245A (en) * 1993-09-20 1999-12-21 Hitachi, Ltd. Method and apparatus for ionizing a sample under atmospheric pressure and selectively introducing ions into a mass analysis region
JP3429593B2 (ja) * 1995-02-13 2003-07-22 株式会社日立製作所 カラー陰極線管
US5841145A (en) * 1995-03-03 1998-11-24 Fujitsu Limited Method of and system for exposing pattern on object by charged particle beam
JPH09204891A (ja) 1996-01-26 1997-08-05 Hitachi Ltd 電子線描画装置
US5637879A (en) * 1996-03-20 1997-06-10 Schueler; Bruno W. Focused ion beam column with electrically variable blanking aperture
GB2325335B (en) * 1997-05-16 2001-07-11 Leica Lithography Systems Ltd Electron beam aperture element
US6521896B1 (en) * 2000-06-01 2003-02-18 Applied Materials, Inc. Blanker assembly employing dielectric material
US6630668B1 (en) * 2001-10-04 2003-10-07 The United States Of America As Represented By The United States Department Of Energy Remote control of a scanning electron microscope aperture and gun alignment
US6838829B2 (en) * 2002-01-03 2005-01-04 Calabatas Creek Research, Inc. Depressed collector for electron beams
US6768125B2 (en) * 2002-01-17 2004-07-27 Ims Nanofabrication, Gmbh Maskless particle-beam system for exposing a pattern on a substrate
JP2004282038A (ja) * 2003-02-28 2004-10-07 Canon Inc 偏向器、偏向器を製造する方法、偏向器を適用した荷電粒子線露光装置
US6977384B2 (en) * 2003-08-27 2005-12-20 Fei Company Shaped sputter shields for improved ion column operation

Also Published As

Publication number Publication date
IL179663A0 (en) 2007-05-15
CN1985344B (zh) 2010-09-29
GB2414857A (en) 2005-12-07
IL179663A (en) 2010-06-30
CN1985344A (zh) 2007-06-20
WO2005119361A2 (en) 2005-12-15
EP1751784A2 (de) 2007-02-14
GB2414857B (en) 2009-02-25
GB0412428D0 (en) 2004-07-07
EP1751784B1 (de) 2010-01-06
US20080061246A1 (en) 2008-03-13
US7728308B2 (en) 2010-06-01
TW200603685A (en) 2006-01-16
ATE454706T1 (de) 2010-01-15
WO2005119361A3 (en) 2006-03-23
JP2008502101A (ja) 2008-01-24
KR20070034570A (ko) 2007-03-28

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Legal Events

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