DE602005017742D1 - Regeneratives verstärkersystem mit niedriger verstärkung - Google Patents
Regeneratives verstärkersystem mit niedriger verstärkungInfo
- Publication number
- DE602005017742D1 DE602005017742D1 DE602005017742T DE602005017742T DE602005017742D1 DE 602005017742 D1 DE602005017742 D1 DE 602005017742D1 DE 602005017742 T DE602005017742 T DE 602005017742T DE 602005017742 T DE602005017742 T DE 602005017742T DE 602005017742 D1 DE602005017742 D1 DE 602005017742D1
- Authority
- DE
- Germany
- Prior art keywords
- cavity
- pockels cell
- gain
- regenerative amplifier
- low
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
- 230000001172 regenerating effect Effects 0.000 title abstract 4
- 230000002787 reinforcement Effects 0.000 title 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/23—Arrangements of two or more lasers not provided for in groups H01S3/02 - H01S3/22, e.g. tandem arrangements of separate active media
- H01S3/2308—Amplifier arrangements, e.g. MOPA
- H01S3/2325—Multi-pass amplifiers, e.g. regenerative amplifiers
- H01S3/235—Regenerative amplifiers
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/005—Optical devices external to the laser cavity, specially adapted for lasers, e.g. for homogenisation of the beam or for manipulating laser pulses, e.g. pulse shaping
- H01S3/0064—Anti-reflection devices, e.g. optical isolaters
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/005—Optical devices external to the laser cavity, specially adapted for lasers, e.g. for homogenisation of the beam or for manipulating laser pulses, e.g. pulse shaping
- H01S3/0085—Modulating the output, i.e. the laser beam is modulated outside the laser cavity
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/10—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating
- H01S3/106—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating by controlling devices placed within the cavity
- H01S3/107—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating by controlling devices placed within the cavity using electro-optic devices, e.g. exhibiting Pockels or Kerr effect
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/14—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range characterised by the material used as the active medium
- H01S3/16—Solid materials
- H01S3/1601—Solid materials characterised by an active (lasing) ion
- H01S3/1603—Solid materials characterised by an active (lasing) ion rare earth
- H01S3/1611—Solid materials characterised by an active (lasing) ion rare earth neodymium
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/14—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range characterised by the material used as the active medium
- H01S3/16—Solid materials
- H01S3/1601—Solid materials characterised by an active (lasing) ion
- H01S3/1603—Solid materials characterised by an active (lasing) ion rare earth
- H01S3/1618—Solid materials characterised by an active (lasing) ion rare earth ytterbium
Landscapes
- Physics & Mathematics (AREA)
- Electromagnetism (AREA)
- Engineering & Computer Science (AREA)
- Plasma & Fusion (AREA)
- Optics & Photonics (AREA)
- Lasers (AREA)
- Amplifiers (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US10/762,216 US7016107B2 (en) | 2004-01-20 | 2004-01-20 | Low-gain regenerative amplifier system |
PCT/US2005/002016 WO2005069963A2 (en) | 2004-01-20 | 2005-01-20 | Low-gain regenerative amplifier system |
Publications (1)
Publication Number | Publication Date |
---|---|
DE602005017742D1 true DE602005017742D1 (de) | 2009-12-31 |
Family
ID=34750349
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE602005017742T Active DE602005017742D1 (de) | 2004-01-20 | 2005-01-20 | Regeneratives verstärkersystem mit niedriger verstärkung |
Country Status (5)
Country | Link |
---|---|
US (1) | US7016107B2 (de) |
EP (1) | EP1709714B1 (de) |
AT (1) | ATE449442T1 (de) |
DE (1) | DE602005017742D1 (de) |
WO (1) | WO2005069963A2 (de) |
Families Citing this family (15)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US7590156B1 (en) * | 2004-05-17 | 2009-09-15 | University Of Central Florida Research Foundation, Inc. | High intensity MHz mode-locked laser |
US7522642B2 (en) | 2006-03-29 | 2009-04-21 | Amo Development Llc | Method and system for laser amplification using a dual crystal Pockels cell |
US7433376B1 (en) * | 2006-08-07 | 2008-10-07 | Textron Systems Corporation | Zig-zag laser with improved liquid cooling |
CN101231384B (zh) * | 2008-02-26 | 2010-09-01 | 上海激光等离子体研究所 | 用于啁啾脉冲放大的自准直平面调制光谱调制整形装置 |
CN101231383B (zh) * | 2008-02-26 | 2011-03-16 | 上海激光等离子体研究所 | 用于啁啾脉冲放大的自准直凹面调制光谱调制整形装置 |
JP4523978B2 (ja) * | 2008-03-28 | 2010-08-11 | 株式会社日立製作所 | エンジンシステム |
CN102074887A (zh) * | 2010-01-13 | 2011-05-25 | 山东大学 | 一种基于掺钕硼酸钙氧钆晶体的自变频固体激光器 |
JP2013065804A (ja) * | 2010-12-20 | 2013-04-11 | Gigaphoton Inc | レーザ装置およびそれを備える極端紫外光生成システム |
WO2013008772A1 (ja) * | 2011-07-11 | 2013-01-17 | 株式会社ブイ・テクノロジー | パルスレーザ発振器及びパルスレーザ発振制御方法 |
LT6028B (lt) | 2012-09-17 | 2014-05-26 | Uždaroji Akcinė Bendrovė Mokslinė-Gamybinė Firma "Šviesos Konversija" | Regeneratyvinis optinis stiprintuvas, skirtas trumpų impulsų lazeriams, lazerinis šaltinis ir lazerinė sistema |
CN103022886B (zh) * | 2013-01-05 | 2014-10-08 | 北京工业大学 | 全固态皮秒激光放大器 |
WO2016135638A1 (en) * | 2015-02-25 | 2016-09-01 | Quanta System S.P.A. | Laser system for generating laser pulse of sub-nanosecond duration |
CN104767108B (zh) * | 2015-04-27 | 2017-10-27 | 北京工业大学 | 一种谐振腔翻倍的再生放大器 |
GB2562236A (en) | 2017-05-08 | 2018-11-14 | Uab Mgf Sviesos Konversija | Device and method for generation of high repetition rate laser pulse bursts |
CN115347449B (zh) * | 2022-10-18 | 2022-12-30 | 中国科学院长春光学精密机械与物理研究所 | 薄片再生放大器及放大方法 |
Family Cites Families (14)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4191928A (en) * | 1978-01-11 | 1980-03-04 | The United States Of America As Represented By The United States Department Of Energy | Laser system using regenerative amplifier |
US4896119A (en) * | 1984-06-07 | 1990-01-23 | The University Of Rochester | CW pumper CW pumped variable repetition rate regenerative laser amplifier system |
US5239408A (en) * | 1992-01-21 | 1993-08-24 | Regents Of The University Of California | High power, high beam quality regenerative amplifier |
US5720894A (en) * | 1996-01-11 | 1998-02-24 | The Regents Of The University Of California | Ultrashort pulse high repetition rate laser system for biological tissue processing |
US6150630A (en) * | 1996-01-11 | 2000-11-21 | The Regents Of The University Of California | Laser machining of explosives |
US5790303A (en) * | 1997-01-23 | 1998-08-04 | Positive Light, Inc. | System for amplifying an optical pulse using a diode-pumped, Q-switched, intracavity-doubled laser to pump an optical amplifier |
US6002697A (en) * | 1998-04-03 | 1999-12-14 | Lambda Physik Gmbh | Diode pumped laser with frequency conversion into UV and DUV range |
US6197133B1 (en) * | 1999-02-16 | 2001-03-06 | General Electric Company | Short-pulse high-peak laser shock peening |
US7046711B2 (en) * | 1999-06-11 | 2006-05-16 | High Q Laser Production Gmbh | High power and high gain saturation diode pumped laser means and diode array pumping device |
US6510169B2 (en) * | 2001-02-14 | 2003-01-21 | Forschungsinstitut Fur Mineralische Und Metallische Werkstoffe Edelsteine/Edemetalle Gmbh | Method for generating laser light and laser crystal |
AU2002306542A1 (en) * | 2001-02-15 | 2002-08-28 | Aculight Corporation | Methods and devices for efficient generation of ultraviolet light |
US6804287B2 (en) * | 2002-02-02 | 2004-10-12 | The Regents Of The University Of Colorado, A Body Corporate | Ultrashort pulse amplification in cryogenically cooled amplifiers |
US6760356B2 (en) * | 2002-04-08 | 2004-07-06 | The Regents Of The University Of California | Application of Yb:YAG short pulse laser system |
US20030193975A1 (en) * | 2002-04-12 | 2003-10-16 | Yang Pang | Regenerative amplifier with frequency synthesizer |
-
2004
- 2004-01-20 US US10/762,216 patent/US7016107B2/en not_active Expired - Lifetime
-
2005
- 2005-01-20 EP EP05711812A patent/EP1709714B1/de active Active
- 2005-01-20 WO PCT/US2005/002016 patent/WO2005069963A2/en active Application Filing
- 2005-01-20 DE DE602005017742T patent/DE602005017742D1/de active Active
- 2005-01-20 AT AT05711812T patent/ATE449442T1/de not_active IP Right Cessation
Also Published As
Publication number | Publication date |
---|---|
US20050157381A1 (en) | 2005-07-21 |
EP1709714A2 (de) | 2006-10-11 |
ATE449442T1 (de) | 2009-12-15 |
US7016107B2 (en) | 2006-03-21 |
WO2005069963A2 (en) | 2005-08-04 |
WO2005069963A3 (en) | 2006-04-06 |
EP1709714A4 (de) | 2008-01-16 |
EP1709714B1 (de) | 2009-11-18 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
8364 | No opposition during term of opposition |