DE602005006146D1 - Heil-algorithmus - Google Patents

Heil-algorithmus

Info

Publication number
DE602005006146D1
DE602005006146D1 DE602005006146T DE602005006146T DE602005006146D1 DE 602005006146 D1 DE602005006146 D1 DE 602005006146D1 DE 602005006146 T DE602005006146 T DE 602005006146T DE 602005006146 T DE602005006146 T DE 602005006146T DE 602005006146 D1 DE602005006146 D1 DE 602005006146D1
Authority
DE
Germany
Prior art keywords
slivers
list
adjacent
actions
dynamic
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE602005006146T
Other languages
English (en)
Other versions
DE602005006146T2 (de
Inventor
Lars Ivansen
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Micronic Laser Systems AB
Original Assignee
Micronic Laser Systems AB
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Micronic Laser Systems AB filed Critical Micronic Laser Systems AB
Publication of DE602005006146D1 publication Critical patent/DE602005006146D1/de
Application granted granted Critical
Publication of DE602005006146T2 publication Critical patent/DE602005006146T2/de
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/70491—Information management, e.g. software; Active and passive control, e.g. details of controlling exposure processes or exposure tool monitoring processes
    • G03F7/70508—Data handling in all parts of the microlithographic apparatus, e.g. handling pattern data for addressable masks or data transfer to or from different components within the exposure apparatus
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70283—Mask effects on the imaging process
    • G03F7/70291—Addressable masks, e.g. spatial light modulators [SLMs], digital micro-mirror devices [DMDs] or liquid crystal display [LCD] patterning devices
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70383—Direct write, i.e. pattern is written directly without the use of a mask by one or multiple beams
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70425—Imaging strategies, e.g. for increasing throughput or resolution, printing product fields larger than the image field or compensating lithography- or non-lithography errors, e.g. proximity correction, mix-and-match, stitching or double patterning
    • G03F7/70433—Layout for increasing efficiency or for compensating imaging errors, e.g. layout of exposure fields for reducing focus errors; Use of mask features for increasing efficiency or for compensating imaging errors

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Respiratory Apparatuses And Protective Means (AREA)
  • Decoration Of Textiles (AREA)
  • Saccharide Compounds (AREA)
  • Medicines Containing Plant Substances (AREA)
  • Steroid Compounds (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
DE602005006146T 2004-09-09 2005-09-08 Heil-algorithmus Expired - Fee Related DE602005006146T2 (de)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US10/937,737 US7278129B2 (en) 2004-09-09 2004-09-09 Healing algorithm
US937737 2004-09-09
PCT/EP2005/009663 WO2006027246A2 (en) 2004-09-09 2005-09-08 Healing algorithm

Publications (2)

Publication Number Publication Date
DE602005006146D1 true DE602005006146D1 (de) 2008-05-29
DE602005006146T2 DE602005006146T2 (de) 2009-07-02

Family

ID=35198025

Family Applications (1)

Application Number Title Priority Date Filing Date
DE602005006146T Expired - Fee Related DE602005006146T2 (de) 2004-09-09 2005-09-08 Heil-algorithmus

Country Status (6)

Country Link
US (1) US7278129B2 (de)
EP (1) EP1794656B1 (de)
JP (1) JP2008512710A (de)
AT (1) ATE392645T1 (de)
DE (1) DE602005006146T2 (de)
WO (1) WO2006027246A2 (de)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7650588B2 (en) * 2005-09-26 2010-01-19 Micronic Laser Systems Ab Methods and systems for pattern generation based on multiple forms of design data
US7303440B2 (en) * 2005-10-03 2007-12-04 Stull Michael F Universal battery charger/power source adapter
US9395631B2 (en) * 2014-04-01 2016-07-19 Applied Materials, Inc. Multi-beam pattern generators employing yaw correction when writing upon large substrates, and associated methods

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4933889A (en) * 1988-04-29 1990-06-12 International Business Machines Corporation Method for fine decomposition in finite element mesh generation
KR100310279B1 (ko) * 1992-11-02 2001-12-17 게스레이 마크 패턴발생장치용라스터라이저
JP3549282B2 (ja) * 1995-04-28 2004-08-04 株式会社ルネサステクノロジ 荷電ビーム描画データ作成方法およびその作成装置
SE516914C2 (sv) * 1999-09-09 2002-03-19 Micronic Laser Systems Ab Metoder och rastrerare för högpresterande mönstergenerering
US6813757B2 (en) * 2001-10-25 2004-11-02 Texas Instruments Incorporated Method for evaluating a mask pattern on a substrate
US7010776B2 (en) * 2003-10-27 2006-03-07 International Business Machines Corporation Extending the range of lithographic simulation integrals

Also Published As

Publication number Publication date
EP1794656A2 (de) 2007-06-13
WO2006027246A2 (en) 2006-03-16
US7278129B2 (en) 2007-10-02
WO2006027246A3 (en) 2006-08-31
EP1794656B1 (de) 2008-04-16
ATE392645T1 (de) 2008-05-15
JP2008512710A (ja) 2008-04-24
DE602005006146T2 (de) 2009-07-02
US20060053406A1 (en) 2006-03-09

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee