DE602004025376D1 - Laserausgangs-lichtimpuls-strecker - Google Patents

Laserausgangs-lichtimpuls-strecker

Info

Publication number
DE602004025376D1
DE602004025376D1 DE602004025376T DE602004025376T DE602004025376D1 DE 602004025376 D1 DE602004025376 D1 DE 602004025376D1 DE 602004025376 T DE602004025376 T DE 602004025376T DE 602004025376 T DE602004025376 T DE 602004025376T DE 602004025376 D1 DE602004025376 D1 DE 602004025376D1
Authority
DE
Germany
Prior art keywords
output light
light pulse
laser output
straightener
pulse straightener
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
DE602004025376T
Other languages
English (en)
Inventor
Scot T Smith
Alexander I Ershov
Alexei Lukashev
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Cymer Inc
Original Assignee
Cymer Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from US10/712,545 external-priority patent/US6928093B2/en
Application filed by Cymer Inc filed Critical Cymer Inc
Publication of DE602004025376D1 publication Critical patent/DE602004025376D1/de
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/7055—Exposure light control in all parts of the microlithographic apparatus, e.g. pulse length control or light interruption
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
    • G02B6/24—Coupling light guides
    • G02B6/26—Optical coupling means
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K26/00—Working by laser beam, e.g. welding, cutting or boring
    • B23K26/02—Positioning or observing the workpiece, e.g. with respect to the point of impact; Aligning, aiming or focusing the laser beam
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/005—Optical devices external to the laser cavity, specially adapted for lasers, e.g. for homogenisation of the beam or for manipulating laser pulses, e.g. pulse shaping
    • H01S3/0057—Temporal shaping, e.g. pulse compression, frequency chirping
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/14—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range characterised by the material used as the active medium
    • H01S3/22—Gases
    • H01S3/223—Gases the active gas being polyatomic, i.e. containing two or more atoms
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/14—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range characterised by the material used as the active medium
    • H01S3/22—Gases
    • H01S3/223—Gases the active gas being polyatomic, i.e. containing two or more atoms
    • H01S3/225—Gases the active gas being polyatomic, i.e. containing two or more atoms comprising an excimer or exciplex
DE602004025376T 2003-11-13 2004-11-01 Laserausgangs-lichtimpuls-strecker Active DE602004025376D1 (de)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US10/712,545 US6928093B2 (en) 2002-05-07 2003-11-13 Long delay and high TIS pulse stretcher
US10/847,799 US7369597B2 (en) 2003-11-13 2004-05-18 Laser output light pulse stretcher
PCT/US2004/036371 WO2005050795A2 (en) 2003-11-13 2004-11-01 Laser output light pulse stretcher

Publications (1)

Publication Number Publication Date
DE602004025376D1 true DE602004025376D1 (de) 2010-03-18

Family

ID=34623329

Family Applications (1)

Application Number Title Priority Date Filing Date
DE602004025376T Active DE602004025376D1 (de) 2003-11-13 2004-11-01 Laserausgangs-lichtimpuls-strecker

Country Status (5)

Country Link
EP (1) EP1692750B1 (de)
JP (1) JP4791368B2 (de)
KR (1) KR101114867B1 (de)
DE (1) DE602004025376D1 (de)
WO (1) WO2005050795A2 (de)

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7321605B2 (en) * 2004-05-24 2008-01-22 Asml Holding, N.V. Helical optical pulse stretcher
JP5096035B2 (ja) * 2007-05-01 2012-12-12 ギガフォトン株式会社 光学的パルスストレッチ装置及び露光用放電励起レーザ装置
JP2010003755A (ja) * 2008-06-18 2010-01-07 Mitsubishi Electric Corp 波長変換レーザ装置
US9793673B2 (en) 2011-06-13 2017-10-17 Kla-Tencor Corporation Semiconductor inspection and metrology system using laser pulse multiplier
US9151940B2 (en) * 2012-12-05 2015-10-06 Kla-Tencor Corporation Semiconductor inspection and metrology system using laser pulse multiplier
US9525265B2 (en) 2014-06-20 2016-12-20 Kla-Tencor Corporation Laser repetition rate multiplier and flat-top beam profile generators using mirrors and/or prisms
US9548582B2 (en) 2014-11-26 2017-01-17 Electronics And Telecommunications Research Institute Pulse width stretcher and chirped pulse amplifier including the same
US9945730B2 (en) * 2016-09-02 2018-04-17 Cymer, Llc Adjusting an amount of coherence of a light beam
US11150130B2 (en) * 2019-03-04 2021-10-19 Si-Ware Systems Compact multi-pass gas cell for multi-gas spectral sensors
TW202129425A (zh) * 2019-10-16 2021-08-01 美商希瑪有限責任公司 用於減少光斑之堆疊共焦脈衝拉伸器系列
GB2593456B (en) * 2020-03-18 2024-02-28 Thermo Fisher Scient Ecublens Sarl Double-pulse laser system

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5157684A (en) * 1991-10-23 1992-10-20 United Technologies Corporation Optically pulsed laser
JP2892938B2 (ja) * 1994-06-20 1999-05-17 インターナショナル・ビジネス・マシーンズ・コーポレイション 波長変換装置
IL112546A (en) * 1995-02-06 1999-04-11 Oramir Semiconductor Ltd Laser pulse extender
KR100483981B1 (ko) * 1996-02-22 2005-11-11 가부시키가이샤 니콘 펄스폭신장광학계및이러한광학계를갖춘노광장치
JPH09288251A (ja) * 1996-02-22 1997-11-04 Nikon Corp パルス幅伸長光学系および該光学系を備えた露光装置
WO2000017970A1 (en) * 1998-09-21 2000-03-30 Peter Vitruk Stable multi-fold telescopic laser resonator
US6389045B1 (en) * 1999-04-19 2002-05-14 Lambda Physik Ag Optical pulse stretching and smoothing for ArF and F2 lithography excimer lasers
US6704339B2 (en) * 2001-01-29 2004-03-09 Cymer, Inc. Lithography laser with beam delivery and beam pointing control

Also Published As

Publication number Publication date
WO2005050795A2 (en) 2005-06-02
JP4791368B2 (ja) 2011-10-12
EP1692750A4 (de) 2007-07-11
KR101114867B1 (ko) 2012-03-06
EP1692750A2 (de) 2006-08-23
KR20060114330A (ko) 2006-11-06
JP2007511908A (ja) 2007-05-10
EP1692750B1 (de) 2010-01-27
WO2005050795A3 (en) 2006-04-13

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition