DE602004014338D1 - Lithographischer Apparat mit einem radialen Polarisator - Google Patents

Lithographischer Apparat mit einem radialen Polarisator

Info

Publication number
DE602004014338D1
DE602004014338D1 DE200460014338 DE602004014338T DE602004014338D1 DE 602004014338 D1 DE602004014338 D1 DE 602004014338D1 DE 200460014338 DE200460014338 DE 200460014338 DE 602004014338 T DE602004014338 T DE 602004014338T DE 602004014338 D1 DE602004014338 D1 DE 602004014338D1
Authority
DE
Germany
Prior art keywords
lithographic apparatus
radial polarizer
polarizer
radial
lithographic
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE200460014338
Other languages
English (en)
Inventor
Alexander Straaijer
Kevin Cummings
Marcel M T M Dierichs
Donis George Flagello
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
ASML Netherlands BV
Original Assignee
ASML Netherlands BV
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by ASML Netherlands BV filed Critical ASML Netherlands BV
Publication of DE602004014338D1 publication Critical patent/DE602004014338D1/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/7055—Exposure light control in all parts of the microlithographic apparatus, e.g. pulse length control or light interruption
    • G03F7/70566—Polarisation control

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
DE200460014338 2004-03-08 2004-03-08 Lithographischer Apparat mit einem radialen Polarisator Expired - Fee Related DE602004014338D1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
EP20040251329 EP1574904B1 (de) 2004-03-08 2004-03-08 Lithographischer Apparat mit einem radialen Polarisator

Publications (1)

Publication Number Publication Date
DE602004014338D1 true DE602004014338D1 (de) 2008-07-24

Family

ID=34814404

Family Applications (1)

Application Number Title Priority Date Filing Date
DE200460014338 Expired - Fee Related DE602004014338D1 (de) 2004-03-08 2004-03-08 Lithographischer Apparat mit einem radialen Polarisator

Country Status (2)

Country Link
EP (1) EP1574904B1 (de)
DE (1) DE602004014338D1 (de)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
NL1036123A1 (nl) * 2007-11-13 2009-05-14 Asml Netherlands Bv Inspection method and apparatus, lithographic apparatus, lithographic processing cell and device manufacturing method.
DE102010001336B3 (de) 2010-01-28 2011-07-28 Carl Zeiss SMT GmbH, 73447 Anordnung und Verfahren zur Charakterisierung der Polarisationseigenschaften eines optischen Systems
CN107039885B (zh) * 2017-05-04 2023-04-18 奥比中光科技集团股份有限公司 应用于3d成像的激光阵列

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2698521B2 (ja) * 1992-12-14 1998-01-19 キヤノン株式会社 反射屈折型光学系及び該光学系を備える投影露光装置
US5559583A (en) * 1994-02-24 1996-09-24 Nec Corporation Exposure system and illuminating apparatus used therein and method for exposing a resist film on a wafer
DE19535392A1 (de) * 1995-09-23 1997-03-27 Zeiss Carl Fa Radial polarisationsdrehende optische Anordnung und Mikrolithographie-Projektionsbelichtungsanlage damit
DE19621512A1 (de) * 1996-05-29 1997-12-04 Univ Schiller Jena Verfahren und Anordnung zur Auswertung des wellenlängenabhängigen Polarisationszustandes einer Strahlung
US6381068B1 (en) * 1999-03-19 2002-04-30 3M Innovative Properties Company Reflective projection screen and projection system
US6288840B1 (en) * 1999-06-22 2001-09-11 Moxtek Imbedded wire grid polarizer for the visible spectrum
DE10124803A1 (de) * 2001-05-22 2002-11-28 Zeiss Carl Polarisator und Mikrolithographie-Projektionsanlage mit Polarisator

Also Published As

Publication number Publication date
EP1574904B1 (de) 2008-06-11
EP1574904A1 (de) 2005-09-14

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee