DE60138280D1 - Anpassung des datenalters - Google Patents

Anpassung des datenalters

Info

Publication number
DE60138280D1
DE60138280D1 DE60138280T DE60138280T DE60138280D1 DE 60138280 D1 DE60138280 D1 DE 60138280D1 DE 60138280 T DE60138280 T DE 60138280T DE 60138280 T DE60138280 T DE 60138280T DE 60138280 D1 DE60138280 D1 DE 60138280D1
Authority
DE
Germany
Prior art keywords
adaptation
data age
age
data
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE60138280T
Other languages
English (en)
Inventor
Frank C Demarest
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Zygo Corp
Original Assignee
Zygo Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Zygo Corp filed Critical Zygo Corp
Application granted granted Critical
Publication of DE60138280D1 publication Critical patent/DE60138280D1/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B9/00—Measuring instruments characterised by the use of optical techniques
    • G01B9/02—Interferometers
    • G01B9/02055—Reduction or prevention of errors; Testing; Calibration
    • G01B9/02062—Active error reduction, i.e. varying with time
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B9/00—Measuring instruments characterised by the use of optical techniques
    • G01B9/02—Interferometers
    • G01B9/02001—Interferometers characterised by controlling or generating intrinsic radiation properties
    • G01B9/02002—Interferometers characterised by controlling or generating intrinsic radiation properties using two or more frequencies
    • G01B9/02003—Interferometers characterised by controlling or generating intrinsic radiation properties using two or more frequencies using beat frequencies
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B9/00—Measuring instruments characterised by the use of optical techniques
    • G01B9/02—Interferometers
    • G01B9/02083—Interferometers characterised by particular signal processing and presentation
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
    • G01J3/00—Spectrometry; Spectrophotometry; Monochromators; Measuring colours
    • G01J3/28—Investigating the spectrum
    • G01J3/45—Interferometric spectrometry
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70775—Position control, e.g. interferometers or encoders for determining the stage position
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7049—Technique, e.g. interferometric
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7092—Signal processing
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B2290/00—Aspects of interferometers not specifically covered by any group under G01B9/02
    • G01B2290/70—Using polarization in the interferometer

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Engineering & Computer Science (AREA)
  • Signal Processing (AREA)
  • Instruments For Measurement Of Length By Optical Means (AREA)
  • Length Measuring Devices By Optical Means (AREA)
DE60138280T 2000-05-16 2001-05-16 Anpassung des datenalters Expired - Lifetime DE60138280D1 (de)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US20487800P 2000-05-16 2000-05-16
US09/855,473 US6597459B2 (en) 2000-05-16 2001-05-15 Data age adjustments
PCT/US2001/015942 WO2001088467A2 (en) 2000-05-16 2001-05-16 Data age adjustments

Publications (1)

Publication Number Publication Date
DE60138280D1 true DE60138280D1 (de) 2009-05-20

Family

ID=26899866

Family Applications (1)

Application Number Title Priority Date Filing Date
DE60138280T Expired - Lifetime DE60138280D1 (de) 2000-05-16 2001-05-16 Anpassung des datenalters

Country Status (5)

Country Link
US (1) US6597459B2 (de)
EP (1) EP1285223B1 (de)
JP (1) JP4873817B2 (de)
DE (1) DE60138280D1 (de)
WO (1) WO2001088467A2 (de)

Families Citing this family (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6975406B2 (en) * 2001-08-02 2005-12-13 Zygo Corporation Glitch filter for distance measuring interferometry
US6792368B2 (en) * 2002-01-17 2004-09-14 Agilent Technologies, Inc. System and method for heterodyne interferometer high velocity type non-linearity compensation
US7616322B2 (en) * 2002-07-08 2009-11-10 Zygo Corporation Cyclic error compensation in interferometry systems
US7428685B2 (en) * 2002-07-08 2008-09-23 Zygo Corporation Cyclic error compensation in interferometry systems
US20040199842A1 (en) * 2003-04-04 2004-10-07 Sartschev Ronald A. Test system with high accuracy time measurement system
US7822105B2 (en) * 2003-09-02 2010-10-26 Sirf Technology, Inc. Cross-correlation removal of carrier wave jamming signals
JP2008512907A (ja) * 2004-09-07 2008-04-24 フリースケール セミコンダクター インコーポレイテッド 装置およびその制御インターフェース
JP4927091B2 (ja) * 2005-12-01 2012-05-09 ザイゴ コーポレーション アバランシェ・フォトダイオードによるデータ・エイジの補償方法とシステム
US7576868B2 (en) * 2007-06-08 2009-08-18 Zygo Corporation Cyclic error compensation in interferometry systems
US8392138B2 (en) * 2008-08-08 2013-03-05 The Regents Of The University Of Colorado System and method for correcting sampling errors associated with radiation source tuning rate fluctuations in swept-wavelength interferometry
DE102010044245B3 (de) * 2010-09-02 2011-12-29 Krohne Messtechnik Gmbh Demodulationsverfahren
US8913226B2 (en) 2010-12-16 2014-12-16 Zygo Corpporation Cyclic error compensation in interferometric encoder systems
JP2013002921A (ja) * 2011-06-15 2013-01-07 Canon Inc 測定装置
TWI516746B (zh) 2012-04-20 2016-01-11 賽格股份有限公司 在干涉編碼系統中執行非諧循環錯誤補償的方法、裝置及計算機程式產品，以及微影系統
WO2015138737A1 (en) * 2014-03-12 2015-09-17 Brass Roots Technologies, LLC Bit plane memory system
US9697214B2 (en) 2014-04-18 2017-07-04 Melephant Inc. Device and method for managing lifespan of content, and system using the same
WO2023219862A1 (en) 2022-05-10 2023-11-16 Zygo Corporation Data age reduction

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4083229B2 (en) 1976-09-28 1984-09-11 Method and apparatus for detecting and locating fluid leaks
US4688940A (en) 1985-03-12 1987-08-25 Zygo Corporation Heterodyne interferometer system
US5249030A (en) 1991-12-06 1993-09-28 Zygo Corporation Method and apparatus for determining the position of a moving body and the time of the position measurement
US5767972A (en) * 1996-06-04 1998-06-16 Zygo Corporation Method and apparatus for providing data age compensation in an interferometer
NO305499B1 (no) 1996-11-06 1999-06-07 Nera Asa System og fremgangsmÕte ved nedomforming hvor det mottatte signalet nedomformes
JP3825921B2 (ja) 1998-07-23 2006-09-27 キヤノン株式会社 走査露光装置およびデバイス製造方法

Also Published As

Publication number Publication date
JP2004501362A (ja) 2004-01-15
WO2001088467A3 (en) 2002-03-21
EP1285223A2 (de) 2003-02-26
EP1285223B1 (de) 2009-04-08
US6597459B2 (en) 2003-07-22
US20020021449A1 (en) 2002-02-21
JP4873817B2 (ja) 2012-02-08
WO2001088467A2 (en) 2001-11-22
WO2001088467A9 (en) 2003-01-30

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition