DE60130161D1 - Behandlung von Gasen aus der Halbleiterherstellung - Google Patents

Behandlung von Gasen aus der Halbleiterherstellung

Info

Publication number
DE60130161D1
DE60130161D1 DE60130161T DE60130161T DE60130161D1 DE 60130161 D1 DE60130161 D1 DE 60130161D1 DE 60130161 T DE60130161 T DE 60130161T DE 60130161 T DE60130161 T DE 60130161T DE 60130161 D1 DE60130161 D1 DE 60130161D1
Authority
DE
Germany
Prior art keywords
gases
treatment
semiconductor manufacturing
gas stream
pyrophoric gases
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE60130161T
Other languages
English (en)
Other versions
DE60130161T2 (de
Inventor
Andrew James Seeley
James Robert Smith
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Edwards Ltd
Original Assignee
Edwards Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Edwards Ltd filed Critical Edwards Ltd
Application granted granted Critical
Publication of DE60130161D1 publication Critical patent/DE60130161D1/de
Publication of DE60130161T2 publication Critical patent/DE60130161T2/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D53/00—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
    • B01D53/34—Chemical or biological purification of waste gases
    • B01D53/46—Removing components of defined structure
    • B01D53/68—Halogens or halogen compounds
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D53/00—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
    • B01D53/34—Chemical or biological purification of waste gases
    • B01D53/46—Removing components of defined structure
    • B01D53/68—Halogens or halogen compounds
    • B01D53/70—Organic halogen compounds
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D2258/00—Sources of waste gases
    • B01D2258/02—Other waste gases
    • B01D2258/0216—Other waste gases from CVD treatment or semi-conductor manufacturing

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • General Chemical & Material Sciences (AREA)
  • Environmental & Geological Engineering (AREA)
  • Biomedical Technology (AREA)
  • Analytical Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Oil, Petroleum & Natural Gas (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Treating Waste Gases (AREA)
  • Chemical Vapour Deposition (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)
  • Silicon Compounds (AREA)
DE60130161T 2000-03-03 2001-02-21 Behandlung von Gasen aus der Halbleiterherstellung Expired - Lifetime DE60130161T2 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
GBGB0005231.6A GB0005231D0 (en) 2000-03-03 2000-03-03 Abatement of semiconductor processing gases
GB0005231 2000-03-03

Publications (2)

Publication Number Publication Date
DE60130161D1 true DE60130161D1 (de) 2007-10-11
DE60130161T2 DE60130161T2 (de) 2008-05-21

Family

ID=9886963

Family Applications (1)

Application Number Title Priority Date Filing Date
DE60130161T Expired - Lifetime DE60130161T2 (de) 2000-03-03 2001-02-21 Behandlung von Gasen aus der Halbleiterherstellung

Country Status (7)

Country Link
US (1) US6530977B2 (de)
EP (1) EP1129763B1 (de)
JP (1) JP5265828B2 (de)
AT (1) ATE371483T1 (de)
DE (1) DE60130161T2 (de)
GB (1) GB0005231D0 (de)
TW (1) TW575455B (de)

Families Citing this family (20)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB0005231D0 (en) * 2000-03-03 2000-04-26 Boc Group Plc Abatement of semiconductor processing gases
US6527828B2 (en) * 2001-03-19 2003-03-04 Advanced Technology Materials, Inc. Oxygen enhanced CDA modification to a CDO integrated scrubber
US6596054B2 (en) * 2001-07-23 2003-07-22 Advanced Technology Materials, Inc. Method for carbon monoxide reduction during thermal/wet abatement of organic compounds
US6551381B2 (en) * 2001-07-23 2003-04-22 Advanced Technology Materials, Inc. Method for carbon monoxide reduction during thermal/wet abatement of organic compounds
GB0207284D0 (en) 2002-03-27 2002-05-08 Boc Group Plc Semiconductor exhaust gas treatment
US7771514B1 (en) * 2004-02-03 2010-08-10 Airgard, Inc. Apparatus and method for providing heated effluent gases to a scrubber
GB0417378D0 (en) * 2004-08-04 2004-09-08 Boc Group Plc Gas abatement
US7736599B2 (en) 2004-11-12 2010-06-15 Applied Materials, Inc. Reactor design to reduce particle deposition during process abatement
US20070020115A1 (en) * 2005-07-01 2007-01-25 The Boc Group, Inc. Integrated pump apparatus for semiconductor processing
WO2007053626A2 (en) 2005-10-31 2007-05-10 Applied Materials, Inc. Process abatement reactor
DE102005059481B3 (de) * 2005-12-07 2007-07-12 DAS - Dünnschicht Anlagen Systeme GmbH Vorrichtung und Verfahren zur Reinigung von Reaktionsraumwänden im Inneren eines Reaktionsraums einer thermischen Nachbehandlung von Prozessabgasen
US7638106B2 (en) * 2006-04-21 2009-12-29 Edwards Limited Method of treating a gas stream
US20110017140A1 (en) * 2006-07-21 2011-01-27 Christopher Mark Bailey Method of treating a gas stream
US7611684B2 (en) * 2006-08-09 2009-11-03 Airgard, Inc. Effluent gas scrubber and method of scrubbing effluent gasses
GB0724717D0 (en) * 2007-12-19 2008-01-30 Edwards Ltd Method of treating a gas stream
US7854792B2 (en) 2008-09-17 2010-12-21 Airgard, Inc. Reactive gas control
GB2504335A (en) * 2012-07-26 2014-01-29 Edwards Ltd Radiant burner for the combustion of manufacturing effluent gases.
JP6151945B2 (ja) * 2013-03-28 2017-06-21 株式会社荏原製作所 除害機能付真空ポンプ
GB2608820A (en) * 2021-07-13 2023-01-18 Edwards Ltd Inlet assembly
DE102022212009A1 (de) 2022-11-11 2024-05-16 Ebara Precision Machinery Europe Gmbh Vorrichtung und Verfahren zum Abreinigen eines mindestens ein Schadgas enthaltenden Prozessgases

Family Cites Families (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3036418A (en) * 1958-10-29 1962-05-29 Basf Ag Apparatus for the production of hydrochloric acid from waste gases containing hydrogen chloride
DE2005010B2 (de) * 1970-02-04 1979-08-02 Bayer Ag, 5090 Leverkusen Vorrichtung zum Abkühlen und Naßabscheiden heißer metalloxidhaltiger Reaktionsgase
US4968336A (en) * 1989-05-16 1990-11-06 Nec Electronics Incorporated Plasma etch vaporous exhaust collection system
DE3921255A1 (de) * 1989-06-29 1991-01-03 Krebsoege Gmbh Sintermetall Verfahren zur erzeugung eines in einem traegergasstrom foerderbaren fluessigkeitsnebels und vorrichtung zur durchfuehrung des verfahrens
DE4320044A1 (de) * 1993-06-17 1994-12-22 Das Duennschicht Anlagen Sys Verfahren und Einrichtung zur Reinigung von Abgasen
JP3280173B2 (ja) * 1994-11-29 2002-04-30 日本エア・リキード株式会社 排ガス処理装置
US5649985A (en) * 1995-11-29 1997-07-22 Kanken Techno Co., Ltd. Apparatus for removing harmful substances of exhaust gas discharged from semiconductor manufacturing process
TW299453B (en) * 1996-07-29 1997-03-01 United Microelectronics The dust processor
TW342436B (en) * 1996-08-14 1998-10-11 Nippon Oxygen Co Ltd Combustion type harm removal apparatus (1)
JP3242875B2 (ja) * 1997-12-26 2001-12-25 カンケンテクノ株式会社 排ガス除害装置及び排ガスの除害方法
US6153150A (en) * 1998-01-12 2000-11-28 Advanced Technology Materials, Inc. Apparatus and method for controlled decomposition oxidation of gaseous pollutants
JP3866412B2 (ja) * 1998-05-28 2007-01-10 カンケンテクノ株式会社 半導体製造排ガスの除害方法及び除害装置
AU5313699A (en) * 1998-07-07 2000-01-24 Techarmonic, Inc. System and method for oxidizing toxic, flammable, and pyrophoric gases
EP1143197B1 (de) * 1998-12-01 2017-03-29 Ebara Corporation Abgasbehandlungsvorrichtung
GB0005231D0 (en) * 2000-03-03 2000-04-26 Boc Group Plc Abatement of semiconductor processing gases

Also Published As

Publication number Publication date
DE60130161T2 (de) 2008-05-21
GB0005231D0 (en) 2000-04-26
EP1129763B1 (de) 2007-08-29
TW575455B (en) 2004-02-11
EP1129763A1 (de) 2001-09-05
JP5265828B2 (ja) 2013-08-14
US20010032543A1 (en) 2001-10-25
ATE371483T1 (de) 2007-09-15
JP2001313263A (ja) 2001-11-09
US6530977B2 (en) 2003-03-11

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition