DE60042468D1 - Lithographiegerät mit Elektronenkanone - Google Patents

Lithographiegerät mit Elektronenkanone

Info

Publication number
DE60042468D1
DE60042468D1 DE60042468T DE60042468T DE60042468D1 DE 60042468 D1 DE60042468 D1 DE 60042468D1 DE 60042468 T DE60042468 T DE 60042468T DE 60042468 T DE60042468 T DE 60042468T DE 60042468 D1 DE60042468 D1 DE 60042468D1
Authority
DE
Germany
Prior art keywords
lithograph
electron gun
gun
electron
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE60042468T
Other languages
English (en)
Inventor
Victor Katsap
James Alexander Lidlle
Warren Kazmir Waskiewicz
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nokia of America Corp
Original Assignee
Lucent Technologies Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Lucent Technologies Inc filed Critical Lucent Technologies Inc
Application granted granted Critical
Publication of DE60042468D1 publication Critical patent/DE60042468D1/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement, ion-optical arrangement
    • H01J37/06—Electron sources; Electron guns
    • H01J37/065—Construction of guns or parts thereof
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/30—Electron or ion beam tubes for processing objects
    • H01J2237/317—Processing objects on a microscale
    • H01J2237/3175—Lithography
    • H01J2237/31777—Lithography by projection
    • H01J2237/31791—Scattering mask
DE60042468T 1999-05-07 2000-05-05 Lithographiegerät mit Elektronenkanone Expired - Lifetime DE60042468D1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US09/310,701 US6492647B1 (en) 1999-05-07 1999-05-07 Electron guns for lithography tools

Publications (1)

Publication Number Publication Date
DE60042468D1 true DE60042468D1 (de) 2009-08-13

Family

ID=23203735

Family Applications (1)

Application Number Title Priority Date Filing Date
DE60042468T Expired - Lifetime DE60042468D1 (de) 1999-05-07 2000-05-05 Lithographiegerät mit Elektronenkanone

Country Status (6)

Country Link
US (1) US6492647B1 (de)
EP (1) EP1052678B1 (de)
JP (1) JP3492978B2 (de)
KR (1) KR100850034B1 (de)
DE (1) DE60042468D1 (de)
TW (1) TW497145B (de)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE60033767T2 (de) * 1999-06-22 2007-11-15 Fei Co., Hillsboro Korpuskularoptisches gerät mit einer teilchenquelle umschaltbar zwischen hoher helligkeit und grossem strahlstrom
JP4134000B2 (ja) * 2004-10-28 2008-08-13 Ｎｅｃマイクロ波管株式会社 電子銃
US7576341B2 (en) * 2004-12-08 2009-08-18 Samsung Electronics Co., Ltd. Lithography systems and methods for operating the same
JP2009146884A (ja) * 2007-11-22 2009-07-02 Mamoru Nakasuji 電子銃及び電子線装置
US10573481B1 (en) 2018-11-28 2020-02-25 Nuflare Technology, Inc. Electron guns for electron beam tools

Family Cites Families (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3614422A (en) * 1969-08-01 1971-10-19 Hitachi Ltd Surge reduction resistors between a high-voltage source and an electron microscope electron gun
US4588928A (en) * 1983-06-15 1986-05-13 At&T Bell Laboratories Electron emission system
JPS6049545A (ja) * 1983-08-29 1985-03-18 Nippon Telegr & Teleph Corp <Ntt> 電子銃のビ−ム発生法
JPS61142645A (ja) * 1984-12-17 1986-06-30 Hitachi Ltd 正，負兼用イオン源
US5029259A (en) * 1988-08-04 1991-07-02 Mitsubishi Denki Kabushiki Kaisha Microwave electron gun
US5079112A (en) * 1989-08-07 1992-01-07 At&T Bell Laboratories Device manufacture involving lithographic processing
US5258246A (en) * 1989-08-07 1993-11-02 At&T Bell Laboratories Device manufacture involving lithographic processing
DE4430534A1 (de) * 1994-08-27 1996-04-11 Hell Ag Linotype Elektronenstrahl-Erzeuger
US5633507A (en) * 1995-09-19 1997-05-27 International Business Machines Corporation Electron beam lithography system with low brightness
US5854490A (en) * 1995-10-03 1998-12-29 Fujitsu Limited Charged-particle-beam exposure device and charged-particle-beam exposure method
JPH09129166A (ja) * 1995-11-06 1997-05-16 Nikon Corp 電子銃
GB2343546B (en) * 1995-11-08 2000-06-21 Applied Materials Inc An ion implanter with deceleration lens assembly
JPH09180663A (ja) * 1995-12-26 1997-07-11 Nikon Corp 電子銃及び該電子銃を備えた電子線転写装置
JPH1131469A (ja) * 1997-07-08 1999-02-02 Nikon Corp 電子銃

Also Published As

Publication number Publication date
EP1052678A3 (de) 2006-07-05
US6492647B1 (en) 2002-12-10
KR20010014881A (ko) 2001-02-26
JP3492978B2 (ja) 2004-02-03
EP1052678A2 (de) 2000-11-15
KR100850034B1 (ko) 2008-08-04
JP2001015429A (ja) 2001-01-19
TW497145B (en) 2002-08-01
EP1052678B1 (de) 2009-07-01

Similar Documents

Publication Publication Date Title
DE50113197D1 (de) Spritzpistole
DE60045761D1 (de) Elektronenstrahlgerät
DE60012722D1 (de) Polymerzusammensetzung mit niedriger emission
DE50000494D1 (de) Funktionsträgeranordnung
DE50001849D1 (de) Farbspritzpistole
IT1302016B1 (it) Fluoroelastomeri.
DE69925125D1 (de) Mehrstrahlelektronenröhre mit magnetischem strahlenbahnkorrekturfeld
DE69927814D1 (de) Elektronenröhre
DE69913204D1 (de) Elektronenröhre
GB9905132D0 (en) Electron emitting devices
DE29903989U1 (de) Zielfernrohr
ATA92598A (de) Gewehr
DE69819376D1 (de) Elektronenröhre
DE60042468D1 (de) Lithographiegerät mit Elektronenkanone
DE69813654D1 (de) Elektronenröhre
DE69821260D1 (de) Elektronenstrahlröhre
NL1011975A1 (nl) Elektronenkanon.
DE29800907U1 (de) Dartscheibe
DE69941131D1 (de) Elektronenstrahlröhre
DE59903647D1 (de) Strahlmittel-injektorpistole
ID29823A (id) Mengirimkan nomor yang diputar
DK1230198T3 (da) Ammunition
DE60027961D1 (de) Elektronenkanone
DE50004124D1 (de) Sprühbeschichtungspistole
DE69802123D1 (de) Verdampfbarer Getter mit reduzierter Aktivierungszeit

Legal Events

Date Code Title Description
8364 No opposition during term of opposition