DE60020928D1 - Verschleissfeste Federkontakte - Google Patents
Verschleissfeste FederkontakteInfo
- Publication number
- DE60020928D1 DE60020928D1 DE60020928T DE60020928T DE60020928D1 DE 60020928 D1 DE60020928 D1 DE 60020928D1 DE 60020928 T DE60020928 T DE 60020928T DE 60020928 T DE60020928 T DE 60020928T DE 60020928 D1 DE60020928 D1 DE 60020928D1
- Authority
- DE
- Germany
- Prior art keywords
- wear
- spring contacts
- resistant spring
- resistant
- contacts
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01R—MEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
- G01R1/00—Details of instruments or arrangements of the types included in groups G01R5/00 - G01R13/00 and G01R31/00
- G01R1/02—General constructional details
- G01R1/06—Measuring leads; Measuring probes
- G01R1/067—Measuring probes
- G01R1/073—Multiple probes
- G01R1/07307—Multiple probes with individual probe elements, e.g. needles, cantilever beams or bump contacts, fixed in relation to each other, e.g. bed of nails fixture or probe card
- G01R1/07342—Multiple probes with individual probe elements, e.g. needles, cantilever beams or bump contacts, fixed in relation to each other, e.g. bed of nails fixture or probe card the body of the probe being at an angle other than perpendicular to test object, e.g. probe card
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01R—MEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
- G01R1/00—Details of instruments or arrangements of the types included in groups G01R5/00 - G01R13/00 and G01R31/00
- G01R1/02—General constructional details
- G01R1/06—Measuring leads; Measuring probes
- G01R1/067—Measuring probes
- G01R1/06711—Probe needles; Cantilever beams; "Bump" contacts; Replaceable probe pins
- G01R1/06716—Elastic
- G01R1/06727—Cantilever beams
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01R—MEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
- G01R1/00—Details of instruments or arrangements of the types included in groups G01R5/00 - G01R13/00 and G01R31/00
- G01R1/02—General constructional details
- G01R1/06—Measuring leads; Measuring probes
- G01R1/067—Measuring probes
- G01R1/06711—Probe needles; Cantilever beams; "Bump" contacts; Replaceable probe pins
- G01R1/06733—Geometry aspects
- G01R1/06738—Geometry aspects related to tip portion
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01R—MEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
- G01R1/00—Details of instruments or arrangements of the types included in groups G01R5/00 - G01R13/00 and G01R31/00
- G01R1/02—General constructional details
- G01R1/06—Measuring leads; Measuring probes
- G01R1/067—Measuring probes
- G01R1/06711—Probe needles; Cantilever beams; "Bump" contacts; Replaceable probe pins
- G01R1/06755—Material aspects
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T29/00—Metal working
- Y10T29/49—Method of mechanical manufacture
- Y10T29/49002—Electrical device making
- Y10T29/49117—Conductor or circuit manufacturing
- Y10T29/49204—Contact or terminal manufacturing
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T29/00—Metal working
- Y10T29/49—Method of mechanical manufacture
- Y10T29/49002—Electrical device making
- Y10T29/49117—Conductor or circuit manufacturing
- Y10T29/49204—Contact or terminal manufacturing
- Y10T29/49208—Contact or terminal manufacturing by assembling plural parts
- Y10T29/49218—Contact or terminal manufacturing by assembling plural parts with deforming
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Measuring Leads Or Probes (AREA)
- Testing Or Measuring Of Semiconductors Or The Like (AREA)
- Multi-Conductor Connections (AREA)
- Coupling Device And Connection With Printed Circuit (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US09/421,389 US6352454B1 (en) | 1999-10-20 | 1999-10-20 | Wear-resistant spring contacts |
US421389 | 1999-10-20 |
Publications (2)
Publication Number | Publication Date |
---|---|
DE60020928D1 true DE60020928D1 (de) | 2005-07-28 |
DE60020928T2 DE60020928T2 (de) | 2006-05-11 |
Family
ID=23670316
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE60020928T Expired - Lifetime DE60020928T2 (de) | 1999-10-20 | 2000-10-17 | Verschleissfeste Federkontakte |
Country Status (4)
Country | Link |
---|---|
US (1) | US6352454B1 (de) |
EP (1) | EP1094319B1 (de) |
JP (1) | JP4530517B2 (de) |
DE (1) | DE60020928T2 (de) |
Families Citing this family (53)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5914613A (en) * | 1996-08-08 | 1999-06-22 | Cascade Microtech, Inc. | Membrane probing system with local contact scrub |
US6256882B1 (en) * | 1998-07-14 | 2001-07-10 | Cascade Microtech, Inc. | Membrane probing system |
US20070245553A1 (en) * | 1999-05-27 | 2007-10-25 | Chong Fu C | Fine pitch microfabricated spring contact structure & method |
US6710609B2 (en) * | 2002-07-15 | 2004-03-23 | Nanonexus, Inc. | Mosaic decal probe |
US6812718B1 (en) | 1999-05-27 | 2004-11-02 | Nanonexus, Inc. | Massively parallel interface for electronic circuits |
US6799976B1 (en) * | 1999-07-28 | 2004-10-05 | Nanonexus, Inc. | Construction structures and manufacturing processes for integrated circuit wafer probe card assemblies |
US7382142B2 (en) * | 2000-05-23 | 2008-06-03 | Nanonexus, Inc. | High density interconnect system having rapid fabrication cycle |
US7247035B2 (en) * | 2000-06-20 | 2007-07-24 | Nanonexus, Inc. | Enhanced stress metal spring contactor |
US6838890B2 (en) * | 2000-02-25 | 2005-01-04 | Cascade Microtech, Inc. | Membrane probing system |
US7579848B2 (en) * | 2000-05-23 | 2009-08-25 | Nanonexus, Inc. | High density interconnect system for IC packages and interconnect assemblies |
US7952373B2 (en) | 2000-05-23 | 2011-05-31 | Verigy (Singapore) Pte. Ltd. | Construction structures and manufacturing processes for integrated circuit wafer probe card assemblies |
US20050068054A1 (en) * | 2000-05-23 | 2005-03-31 | Sammy Mok | Standardized layout patterns and routing structures for integrated circuit wafer probe card assemblies |
KR100600092B1 (ko) * | 2000-06-28 | 2006-07-13 | 닛폰 하츠죠 가부시키가이샤 | 도전성 접촉자 |
DE20114544U1 (de) | 2000-12-04 | 2002-02-21 | Cascade Microtech Inc | Wafersonde |
WO2003052435A1 (en) | 2001-08-21 | 2003-06-26 | Cascade Microtech, Inc. | Membrane probing system |
CN1575350A (zh) * | 2001-08-24 | 2005-02-02 | 纳米纳克斯公司 | 用于在溅射薄膜中产生均匀、各向同性应力的方法和装置 |
DE10150291A1 (de) * | 2001-10-15 | 2003-05-08 | Infineon Technologies Ag | Sondennadel zum Testen von Halbleiterchips und Verfahren zu ihrer Herstellung |
US6866255B2 (en) * | 2002-04-12 | 2005-03-15 | Xerox Corporation | Sputtered spring films with low stress anisotropy |
US7006720B2 (en) * | 2002-04-30 | 2006-02-28 | Xerox Corporation | Optical switching system |
US6891240B2 (en) | 2002-04-30 | 2005-05-10 | Xerox Corporation | Electrode design and positioning for controlled movement of a moveable electrode and associated support structure |
US7047638B2 (en) * | 2002-07-24 | 2006-05-23 | Formfactor, Inc | Method of making microelectronic spring contact array |
US6793544B2 (en) * | 2003-02-05 | 2004-09-21 | General Motors Corporation | Corrosion resistant fuel cell terminal plates |
US7057404B2 (en) | 2003-05-23 | 2006-06-06 | Sharp Laboratories Of America, Inc. | Shielded probe for testing a device under test |
US7015584B2 (en) * | 2003-07-08 | 2006-03-21 | Xerox Corporation | High force metal plated spring structure |
WO2006017078A2 (en) * | 2004-07-07 | 2006-02-16 | Cascade Microtech, Inc. | Probe head having a membrane suspended probe |
US6973722B2 (en) * | 2003-11-17 | 2005-12-13 | Palo Alto Research Center Incorporated | Release height adjustment of stressy metal devices by annealing before and after release |
US7427868B2 (en) | 2003-12-24 | 2008-09-23 | Cascade Microtech, Inc. | Active wafer probe |
JP4723195B2 (ja) * | 2004-03-05 | 2011-07-13 | 株式会社オクテック | プローブの製造方法 |
US20060074836A1 (en) * | 2004-09-03 | 2006-04-06 | Biowisdom Limited | System and method for graphically displaying ontology data |
JP2008512680A (ja) | 2004-09-13 | 2008-04-24 | カスケード マイクロテック インコーポレイテッド | 両面プロービング構造体 |
US20060058821A1 (en) * | 2004-09-15 | 2006-03-16 | Jansheski John M | Tongue scraper |
JP2006084450A (ja) * | 2004-09-17 | 2006-03-30 | Sumitomo Electric Ind Ltd | コンタクトプローブおよびプローブカード |
US7230440B2 (en) | 2004-10-21 | 2007-06-12 | Palo Alto Research Center Incorporated | Curved spring structure with elongated section located under cantilevered section |
US8330485B2 (en) * | 2004-10-21 | 2012-12-11 | Palo Alto Research Center Incorporated | Curved spring structure with downturned tip |
US7656172B2 (en) | 2005-01-31 | 2010-02-02 | Cascade Microtech, Inc. | System for testing semiconductors |
US7535247B2 (en) | 2005-01-31 | 2009-05-19 | Cascade Microtech, Inc. | Interface for testing semiconductors |
US7550855B2 (en) * | 2005-12-02 | 2009-06-23 | Palo Alto Research Center Incorporated | Vertically spaced plural microsprings |
US7764072B2 (en) | 2006-06-12 | 2010-07-27 | Cascade Microtech, Inc. | Differential signal probing system |
US7403028B2 (en) | 2006-06-12 | 2008-07-22 | Cascade Microtech, Inc. | Test structure and probe for differential signals |
US7723999B2 (en) | 2006-06-12 | 2010-05-25 | Cascade Microtech, Inc. | Calibration structures for differential signal probing |
US7876114B2 (en) | 2007-08-08 | 2011-01-25 | Cascade Microtech, Inc. | Differential waveguide probe |
EP2060921A1 (de) * | 2007-11-16 | 2009-05-20 | Technoprobe S.p.A | Kontaktsonde für Prüfkopf mit vertikalen Sonden und dazugehöriger Prüfkopf zur Prüfung der elektrischen Eigenschaft von Mikrostrukturen |
US20090140433A1 (en) * | 2007-11-30 | 2009-06-04 | Alces Technology, Inc. | MEMS chip-to-chip interconnects |
US7888957B2 (en) | 2008-10-06 | 2011-02-15 | Cascade Microtech, Inc. | Probing apparatus with impedance optimized interface |
WO2010059247A2 (en) | 2008-11-21 | 2010-05-27 | Cascade Microtech, Inc. | Replaceable coupon for a probing apparatus |
US8441808B2 (en) | 2010-09-22 | 2013-05-14 | Palo Alto Research Center Incorporated | Interposer with microspring contacts |
US8519534B2 (en) | 2010-09-22 | 2013-08-27 | Palo Alto Research Center Incorporated | Microsprings partially embedded in a laminate structure and methods for producing same |
US9735066B2 (en) * | 2014-01-30 | 2017-08-15 | Fei Company | Surface delayering with a programmed manipulator |
CN104124495B (zh) * | 2014-07-08 | 2018-08-14 | 中国电子科技集团公司第四十一研究所 | 一种射频机械开关及微波程控步进衰减器 |
CN104730298B (zh) * | 2015-03-19 | 2017-12-12 | 西安福科材料科技有限公司 | 用于电子测试探针的耐磨导电多层复合薄膜及其工业制备方法 |
KR101717567B1 (ko) * | 2015-08-05 | 2017-03-20 | 주식회사 유진텍 | 연료전지 전압측정단자용 지르코니아-니켈 핀 및 그 제조방법 |
US20190273341A1 (en) * | 2018-03-01 | 2019-09-05 | Dell Products L.P. | High Speed Connector |
KR102114210B1 (ko) * | 2018-12-17 | 2020-05-25 | 주식회사 코리아 인스트루먼트 | 프로브 빔 및 프로브 모듈 |
Family Cites Families (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3780247A (en) * | 1972-05-18 | 1973-12-18 | Bunker Ramo | Contact element having noble wear area |
US3842189A (en) | 1973-01-08 | 1974-10-15 | Rca Corp | Contact array and method of making the same |
JPH06289056A (ja) * | 1993-04-02 | 1994-10-18 | Kobe Steel Ltd | プローブユニット |
US5475318A (en) * | 1993-10-29 | 1995-12-12 | Robert B. Marcus | Microprobe |
JPH08240598A (ja) * | 1995-03-02 | 1996-09-17 | Nikon Corp | 導電性プローブ |
US5720098A (en) * | 1995-05-12 | 1998-02-24 | Probe Technology | Method for making a probe preserving a uniform stress distribution under deflection |
US5613861A (en) * | 1995-06-07 | 1997-03-25 | Xerox Corporation | Photolithographically patterned spring contact |
US5665648A (en) | 1995-12-21 | 1997-09-09 | Hughes Electronics | Integrated circuit spring contact fabrication methods |
US5944537A (en) | 1997-12-15 | 1999-08-31 | Xerox Corporation | Photolithographically patterned spring contact and apparatus and methods for electrically contacting devices |
-
1999
- 1999-10-20 US US09/421,389 patent/US6352454B1/en not_active Expired - Lifetime
-
2000
- 2000-10-17 EP EP00309109A patent/EP1094319B1/de not_active Expired - Lifetime
- 2000-10-17 DE DE60020928T patent/DE60020928T2/de not_active Expired - Lifetime
- 2000-10-20 JP JP2000321533A patent/JP4530517B2/ja not_active Expired - Fee Related
Also Published As
Publication number | Publication date |
---|---|
EP1094319A2 (de) | 2001-04-25 |
US6352454B1 (en) | 2002-03-05 |
EP1094319B1 (de) | 2005-06-22 |
DE60020928T2 (de) | 2006-05-11 |
JP2001165959A (ja) | 2001-06-22 |
JP4530517B2 (ja) | 2010-08-25 |
EP1094319A3 (de) | 2004-01-02 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
8364 | No opposition during term of opposition |