DE60013208D1 - Suzeptordeckel sowohl für Gasphaseninfiltration bzw. -Beschichtung als auch Wärmebehandlung - Google Patents

Suzeptordeckel sowohl für Gasphaseninfiltration bzw. -Beschichtung als auch Wärmebehandlung

Info

Publication number
DE60013208D1
DE60013208D1 DE60013208T DE60013208T DE60013208D1 DE 60013208 D1 DE60013208 D1 DE 60013208D1 DE 60013208 T DE60013208 T DE 60013208T DE 60013208 T DE60013208 T DE 60013208T DE 60013208 D1 DE60013208 D1 DE 60013208D1
Authority
DE
Germany
Prior art keywords
suceptor
coating
cover
well
heat treatment
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE60013208T
Other languages
English (en)
Other versions
DE60013208T2 (de
Inventor
Real Jose Del
Robert A Fiala
Dary M Zeigler
James W Rudolph
Darren Welson
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Goodrich Corp
Original Assignee
Goodrich Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Goodrich Corp filed Critical Goodrich Corp
Publication of DE60013208D1 publication Critical patent/DE60013208D1/de
Application granted granted Critical
Publication of DE60013208T2 publication Critical patent/DE60013208T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/04—Coating on selected surface areas, e.g. using masks
    • C23C16/045—Coating cavities or hollow spaces, e.g. interior of tubes; Infiltration of porous substrates
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/4412—Details relating to the exhausts, e.g. pumps, filters, scrubbers, particle traps

Landscapes

  • Chemical & Material Sciences (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Chemical Vapour Deposition (AREA)
DE60013208T 1999-06-04 2000-06-02 Suzeptordeckel sowohl für Gasphaseninfiltration bzw. -Beschichtung als auch Wärmebehandlung Expired - Fee Related DE60013208T2 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US13759199P 1999-06-04 1999-06-04
US137591P 1999-06-04

Publications (2)

Publication Number Publication Date
DE60013208D1 true DE60013208D1 (de) 2004-09-30
DE60013208T2 DE60013208T2 (de) 2005-08-11

Family

ID=22478153

Family Applications (1)

Application Number Title Priority Date Filing Date
DE60013208T Expired - Fee Related DE60013208T2 (de) 1999-06-04 2000-06-02 Suzeptordeckel sowohl für Gasphaseninfiltration bzw. -Beschichtung als auch Wärmebehandlung

Country Status (3)

Country Link
US (1) US6257881B1 (de)
EP (1) EP1063318B1 (de)
DE (1) DE60013208T2 (de)

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP1065294B1 (de) * 1999-06-04 2003-10-15 Goodrich Corporation Verfahren und Vorrichtung zur Druckmessung in einer CVD/CVI-Kammer
US6758909B2 (en) * 2001-06-05 2004-07-06 Honeywell International Inc. Gas port sealing for CVD/CVI furnace hearth plates
US7122844B2 (en) * 2002-05-13 2006-10-17 Cree, Inc. Susceptor for MOCVD reactor
FR2842193B1 (fr) 2002-07-12 2004-10-01 Messier Bugatti Procede et installation pour le traitement thermique a haute temperature et la densification par infiltration chimique en phase vapeur de textures en carbone
US8366830B2 (en) * 2003-03-04 2013-02-05 Cree, Inc. Susceptor apparatus for inverted type MOCVD reactor
US10689753B1 (en) 2009-04-21 2020-06-23 Goodrich Corporation System having a cooling element for densifying a substrate
US10131985B2 (en) 2016-03-21 2018-11-20 Goodrich Corporation System and method for enhancing a diffusion limited CVI/CVD process
JP7065857B2 (ja) * 2016-09-19 2022-05-12 キング・アブドゥッラー・ユニバーシティ・オブ・サイエンス・アンド・テクノロジー サセプター
DE102020126101A1 (de) * 2020-10-06 2022-04-07 Thyssenkrupp Steel Europe Ag Beschichtungsvorrichtung zum Ablagern eines Beschichtungsmaterials auf einem Substrat

Family Cites Families (19)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US1933461A (en) 1932-09-07 1933-10-31 American Steel & Wire Co Annealing apparatus
US4030996A (en) 1971-09-07 1977-06-21 Telic Corporation Electrode type glow discharge method and apparatus
US4031424A (en) 1971-09-07 1977-06-21 Telic Corporation Electrode type glow discharge apparatus
US3884793A (en) 1971-09-07 1975-05-20 Telic Corp Electrode type glow discharge apparatus
US3995187A (en) 1971-09-07 1976-11-30 Telic Corporation Electrode type glow discharge apparatus
FR2490246A1 (fr) 1980-09-17 1982-03-19 Cit Alcatel Dispositif de deposition chimique activee sous plasma
US4573431A (en) 1983-11-16 1986-03-04 Btu Engineering Corporation Modular V-CVD diffusion furnace
US4606650A (en) 1984-11-26 1986-08-19 Domtar Inc. Microwave, a closed vessel and methods of determining volatile material content
US5073241A (en) 1986-01-31 1991-12-17 Kabushiki Kaisha Meidenshae Method for carbon film production
JPS6312128A (ja) 1986-03-20 1988-01-19 Toshiba Mach Co Ltd バレル型気相成長装置
US4854266A (en) 1987-11-02 1989-08-08 Btu Engineering Corporation Cross-flow diffusion furnace
US4993358A (en) 1989-07-28 1991-02-19 Watkins-Johnson Company Chemical vapor deposition reactor and method of operation
SE465358B (sv) 1990-01-15 1991-09-02 Asea Brown Boveri Varmisostatisk hoegtryckspress anordnad foer snabbkylning av lastutrymmet
WO1992002659A1 (en) 1990-08-10 1992-02-20 Viratec Thin Films, Inc. Shielding for arc suppression in rotating magnetron sputtering systems
FI87272B (fi) 1990-12-31 1992-08-31 Suomen Vuolukivi Oy Foerfarande foer kombinering av eluppvaermning till en murad vedeldad eldstad.
US5625170A (en) 1994-01-18 1997-04-29 Nanometrics Incorporated Precision weighing to monitor the thickness and uniformity of deposited or etched thin film
ATE215518T1 (de) 1994-11-16 2002-04-15 Goodrich Co B F Vorrichtung zur druckfeld cvd/cvi, verfahren und produkt
US5480678A (en) 1994-11-16 1996-01-02 The B. F. Goodrich Company Apparatus for use with CVI/CVD processes
US5910006A (en) 1997-06-01 1999-06-08 Michael D. Conroy Kiln lid mounting assembly

Also Published As

Publication number Publication date
EP1063318B1 (de) 2004-08-25
EP1063318A1 (de) 2000-12-27
US6257881B1 (en) 2001-07-10
DE60013208T2 (de) 2005-08-11

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee