DE59602769D1 - Ionenquelle - Google Patents
IonenquelleInfo
- Publication number
- DE59602769D1 DE59602769D1 DE59602769T DE59602769T DE59602769D1 DE 59602769 D1 DE59602769 D1 DE 59602769D1 DE 59602769 T DE59602769 T DE 59602769T DE 59602769 T DE59602769 T DE 59602769T DE 59602769 D1 DE59602769 D1 DE 59602769D1
- Authority
- DE
- Germany
- Prior art keywords
- ion source
- ion
- source
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J27/00—Ion beam tubes
- H01J27/02—Ion sources; Ion guns
- H01J27/08—Ion sources; Ion guns using arc discharge
- H01J27/14—Other arc discharge ion sources using an applied magnetic field
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/06—Sources
- H01J2237/08—Ion sources
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/30—Electron or ion beam tubes for processing objects
- H01J2237/31—Processing objects on a macro-scale
- H01J2237/3142—Ion plating
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Combustion & Propulsion (AREA)
- Electron Sources, Ion Sources (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
BY950242 | 1995-05-16 | ||
DE19531141A DE19531141C2 (de) | 1995-05-16 | 1995-08-24 | Ionenquelle |
Publications (1)
Publication Number | Publication Date |
---|---|
DE59602769D1 true DE59602769D1 (de) | 1999-09-23 |
Family
ID=25665740
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE59602769T Expired - Fee Related DE59602769D1 (de) | 1995-05-16 | 1996-05-11 | Ionenquelle |
Country Status (3)
Country | Link |
---|---|
EP (1) | EP0743669B1 (de) |
DE (1) | DE59602769D1 (de) |
EA (1) | EA000064B1 (de) |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN109216151B (zh) * | 2018-08-16 | 2024-07-09 | 兰州大学 | 一种内置天线式高频离子源装置 |
Family Cites Families (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4862032A (en) * | 1986-10-20 | 1989-08-29 | Kaufman Harold R | End-Hall ion source |
DE69207720T2 (de) * | 1991-11-04 | 1996-05-30 | Fakel Enterprise | Plasmabeschleuniger mit geschlossener Elektronenlaufbahn |
-
1996
- 1996-05-11 EP EP96107544A patent/EP0743669B1/de not_active Expired - Lifetime
- 1996-05-11 DE DE59602769T patent/DE59602769D1/de not_active Expired - Fee Related
- 1996-07-19 EA EA199600050A patent/EA000064B1/ru not_active IP Right Cessation
Also Published As
Publication number | Publication date |
---|---|
EA000064B1 (ru) | 1998-04-30 |
EP0743669A1 (de) | 1996-11-20 |
EP0743669B1 (de) | 1999-08-18 |
EA199600050A3 (ru) | 1996-12-30 |
EA199600050A1 (ru) | 1997-03-31 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
8364 | No opposition during term of opposition | ||
8320 | Willingness to grant licences declared (paragraph 23) | ||
8339 | Ceased/non-payment of the annual fee |