DE509335C - Process for the production of photomechanical printing forms in which the areas of an exposed chromate colloid layer that have been washed out by development print - Google Patents

Process for the production of photomechanical printing forms in which the areas of an exposed chromate colloid layer that have been washed out by development print

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Publication number
DE509335C
DE509335C DEM113037D DEM0113037D DE509335C DE 509335 C DE509335 C DE 509335C DE M113037 D DEM113037 D DE M113037D DE M0113037 D DEM0113037 D DE M0113037D DE 509335 C DE509335 C DE 509335C
Authority
DE
Germany
Prior art keywords
washed out
exposed
areas
production
development
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
DEM113037D
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German (de)
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Meisenbach Riffarth & Co Akt G
Original Assignee
Meisenbach Riffarth & Co Akt G
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Meisenbach Riffarth & Co Akt G filed Critical Meisenbach Riffarth & Co Akt G
Priority to DEM113037D priority Critical patent/DE509335C/en
Application granted granted Critical
Publication of DE509335C publication Critical patent/DE509335C/en
Expired legal-status Critical Current

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Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/04Chromates

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)

Description

Verfahren zur Herstellung photomechanischer Druckformen, bei denen die durch Entwicklung ausgewaschenen Stellen einer belichteten Chromatkolloidschicht drucken ''ach dem Hauptpatent 508 360 wird als Ätzmittel zur Tieflegung der Druckelemente nach der Entwicklung eine Mischung von Alkohol (Spiritus) mit Salpetersäure vorgeSchlagen. Der Spiritus bewirkt die Härtung der belichteten Chromkolloidschicht durch den Entzug von Wasser aus der Schicht; die Säure dagegen greift das Zink an und legt die Druckelemente tief.Process for the production of photomechanical printing forms in which the areas of an exposed chromate colloid layer that have been washed out by development print '' according to the main patent 508 360 , a mixture of alcohol (spirit) with nitric acid is proposed as an etching agent for deepening the printing elements after development. The alcohol hardens the exposed chromium colloid layer by removing water from the layer; the acid, on the other hand, attacks the zinc and deepens the pressure elements.

lm Verfolg dieses Verfahrens hat sich ergebeii, daß der Entzug von Wasser aus der belichteten Kolloidschicht sekundärer Art ist; primär dagegen ist die Fernhaltung von Wasser vor Beginn der Tiefätzung.In the course of this proceeding, it turned out that the withdrawal of Water from the exposed colloid layer is secondary; is primarily against it keeping water away from the start of deep etching.

Als vorteilhaft hat sich bei dem Umkehrverfahren mittels nur einer Schicht erwiesen, (laß man der Chromkolloidschiclit hygroskopische Mittel zusetzt, um ein Reißen der Schicht zu vermeiden. Diese Mittel haben nun (las Bestreben, der kopierten Platte Wasser aus der Luft zuzuführen, wodurch dann beim Tieflitzen die Schutzschicht von der ritze angegriffen werden kann.In the case of the reversal process, it has proven to be advantageous by means of only one Layer proved, (let the chromium colloid schiclite add hygroscopic agents, to avoid tearing the layer. These means have now (read aspiration, the copied plate to supply water from the air, which then when deep-running the Protective layer can be attacked by the crack.

Uni dies zu vermeiden, verwendet man zweckmäßig außer der Alkoholsalpetersäuremischung eine Mischung von Salpetersäure mit wasserfreien Flüssigkeiten, wie z. B. Benzin, Petroleum, Äther, Chloroform u, dgl. Bei Verwendung von Benzin wird außerdem noch wirtschaftlicher gearbeitet werden können, da dieses Mittel sich wesentlich billiger als Spiritus stellt.To avoid this, it is expedient to use the alcohol-nitric acid mixture as well a mixture of nitric acid with anhydrous liquids, such as B. gasoline, Petroleum, ether, chloroform and the like. When using gasoline is also still can be worked more economically, since this means is much cheaper than alcohol.

Bei der Herstellung ein- und zweischichtiger Offsetdruckplatten wird bekanntlich nach der Tieflegung der Druckelemente die ganze Druckfläche mit Farbe eingerieben, wobei die belichteten Stellen die Farbe abstoßen und nur die unbelichteten, auf.entwickelten und tiefgelegten Druckelemente die Farbe annehmen. Dieser Vorgang erfordert eine gewisse Zeit, eine besondere Fertigkeit und beim Zweischichtverfahren eine besondere Heizvorrichtung.In the production of one- and two-layer offset printing plates, as is well known, after the lowering of the printing elements, the entire printing area is covered with color rubbed in, whereby the exposed areas repel the color and only the unexposed, on. developed and deep-set printing elements take on the color. This process requires a certain amount of time, a special skill and the two-shift process a special heating device.

Nach vorliegendem Verfahren kommt dieses Einfärben in Wegfall. Die tiefgeätzte Druckplatte wird mit Auswaschtinktur ausgewaschen, entschichtet und nun mit der bekannten Zinkätze geätzt, worauf sie gummiert, über dem Gummi ausgewaschen und eingewalzt wird; hierauf ist sie maschinenfertig. Es fällt somit ein umständlicher und besondere Übung erfordernder Arbeitsgang weg. Fehlresultate, wie sie bei eingeriebenen tiefgeätzten, besonders aber bei dem einfachen ITmkehrverfahren ohne Tiefätzung häufig in Erscheinung treten, sind bei diesem Verfahren ausgeschlossen, vorausgesetzt, daß die Entwicklung der belichteten. Platte sachgemäß vorgenommen wurde.According to the present method, this coloring is no longer necessary. the deep-etched printing plate is washed out, decoated and with a washout tincture now etched with the well-known zinc etch, whereupon it is gummed, washed out over the gum and is rolled in; then it is machine-ready. It is therefore a cumbersome one and work that requires special practice. Incorrect results, such as those rubbed in deeply etched, but especially with the simple IT reversal process without deep etching occur frequently with this procedure locked out, provided that the development of the exposed. Plate made properly became.

Claims (1)

PATENTANSPRÜCHE: i. Verfahren zur Herstellung photomechanischer Druckformen, bei denen die durch Entwicklung ausgewaschenen Stellen einer belichteten Chromatkolloi.dschicht drucken, nach Patent 50836o, dadurch gekennzeichnet, daß als Ätze zur Tieflegung der Druckelemente nach der Entwicklung Salpetersäure verwendet wird, die durch wasserfreie Flüssigkeiten, wie Benzin, Benzol, Petroleum, Äther, Chloroform u. dgl., verdünnt wird. a. Verfahren nach Anspruch i, dadurch gekennzeichnet, daß beim Umkehrverfahren mit und ohne Tiefätzung das Einreiben der Druckplatte mit Farbe nach der Entwicklung bzw. Tiefätzung in Wegfall kommt, und daß nach dem bekannten Einreiben mit Auswaschtinktur die Platte entschichtet, geätzt, gummiert, über Gummi ausgewaschen und eingewalzt wird, wie (lies beim Fertigmachen der Druckplatte für die Maschine bereits bekannt ist.PATENT CLAIMS: i. Process for the production of photomechanical printing forms, where the areas of an exposed Chromatkolloi.dschicht washed out by development print, according to patent 50836o, characterized in that as etching for lowering the printing elements after developing nitric acid is used by anhydrous Liquids such as gasoline, benzene, petroleum, ether, chloroform and the like are diluted will. a. Method according to Claim i, characterized in that in the case of the reverse method with and without deep etching, rubbing the printing plate with ink after development or deep etching is omitted, and that after the known rubbing with tincture washed out the plate is decoated, etched, rubberized, washed out over rubber and rolled in becomes known as (read when preparing the printing plate for the machine is.
DEM113037D 1928-06-28 1929-12-08 Process for the production of photomechanical printing forms in which the areas of an exposed chromate colloid layer that have been washed out by development print Expired DE509335C (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
DEM113037D DE509335C (en) 1928-06-28 1929-12-08 Process for the production of photomechanical printing forms in which the areas of an exposed chromate colloid layer that have been washed out by development print

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
DEM0105476 1928-06-28
DEM0113037 1929-12-07
DEM113037D DE509335C (en) 1928-06-28 1929-12-08 Process for the production of photomechanical printing forms in which the areas of an exposed chromate colloid layer that have been washed out by development print

Publications (1)

Publication Number Publication Date
DE509335C true DE509335C (en) 1930-10-08

Family

ID=27211731

Family Applications (1)

Application Number Title Priority Date Filing Date
DEM113037D Expired DE509335C (en) 1928-06-28 1929-12-08 Process for the production of photomechanical printing forms in which the areas of an exposed chromate colloid layer that have been washed out by development print

Country Status (1)

Country Link
DE (1) DE509335C (en)

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