DE50004783D1 - electrode assembly - Google Patents

electrode assembly

Info

Publication number
DE50004783D1
DE50004783D1 DE50004783T DE50004783T DE50004783D1 DE 50004783 D1 DE50004783 D1 DE 50004783D1 DE 50004783 T DE50004783 T DE 50004783T DE 50004783 T DE50004783 T DE 50004783T DE 50004783 D1 DE50004783 D1 DE 50004783D1
Authority
DE
Germany
Prior art keywords
electrode assembly
electrode
assembly
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE50004783T
Other languages
German (de)
Inventor
Thomas Gebele
Stefan Bangert
Dr Budke
Dr Grimm
Juergen Henrich
Juergen Honekamp
Juergen Ulrich
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Applied Materials GmbH and Co KG
Original Assignee
Applied Films GmbH and Co KG
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Applied Films GmbH and Co KG filed Critical Applied Films GmbH and Co KG
Priority to DE50004783T priority Critical patent/DE50004783D1/en
Application granted granted Critical
Publication of DE50004783D1 publication Critical patent/DE50004783D1/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32055—Arc discharge
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/32—Vacuum evaporation by explosion; by evaporation and subsequent ionisation of the vapours, e.g. ion-plating
    • C23C14/325—Electric arc evaporation
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32422—Arrangement for selecting ions or species in the plasma
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/32532—Electrodes
DE50004783T 1999-11-17 2000-11-09 electrode assembly Expired - Lifetime DE50004783D1 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
DE50004783T DE50004783D1 (en) 1999-11-17 2000-11-09 electrode assembly

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
DE19955373 1999-11-17
DE10024827A DE10024827B4 (en) 1999-11-17 2000-05-19 Electrode arrangement and its use
DE50004783T DE50004783D1 (en) 1999-11-17 2000-11-09 electrode assembly

Publications (1)

Publication Number Publication Date
DE50004783D1 true DE50004783D1 (en) 2004-01-29

Family

ID=7929398

Family Applications (2)

Application Number Title Priority Date Filing Date
DE10024827A Expired - Fee Related DE10024827B4 (en) 1999-11-17 2000-05-19 Electrode arrangement and its use
DE50004783T Expired - Lifetime DE50004783D1 (en) 1999-11-17 2000-11-09 electrode assembly

Family Applications Before (1)

Application Number Title Priority Date Filing Date
DE10024827A Expired - Fee Related DE10024827B4 (en) 1999-11-17 2000-05-19 Electrode arrangement and its use

Country Status (1)

Country Link
DE (2) DE10024827B4 (en)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102007049649B4 (en) * 2007-10-10 2011-12-08 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Apparatus and method for forming coatings on substrates within vacuum chambers
DE102009037326A1 (en) * 2009-08-14 2011-02-17 Von Ardenne Anlagentechnik Gmbh Method for the vacuum deposition of substrates comprises forming an active electrode surface of an electrode of an electrode arrangement in the process chamber whilst the electrode surface is added and removed

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6251233B1 (en) * 1998-08-03 2001-06-26 The Coca-Cola Company Plasma-enhanced vacuum vapor deposition system including systems for evaporation of a solid, producing an electric arc discharge and measuring ionization and evaporation
AU2522299A (en) * 1999-02-05 2000-08-25 Applied Films Gmbh & Co. Kg Device for coating substrates with a vaporized material under low pressure or ina vacuum using a vaporized material source

Also Published As

Publication number Publication date
DE10024827B4 (en) 2008-03-27
DE10024827A1 (en) 2001-05-23

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8327 Change in the person/name/address of the patent owner

Owner name: APPLIED MATERIALS GMBH & CO. KG, 63755 ALZENAU, DE