DE49115C - Steam dryer - Google Patents

Steam dryer

Info

Publication number
DE49115C
DE49115C DENDAT49115D DE49115DA DE49115C DE 49115 C DE49115 C DE 49115C DE NDAT49115 D DENDAT49115 D DE NDAT49115D DE 49115D A DE49115D A DE 49115DA DE 49115 C DE49115 C DE 49115C
Authority
DE
Germany
Prior art keywords
steam dryer
attached
disks
funnel
insert
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DENDAT49115D
Other languages
German (de)
Original Assignee
J. fleischer in Frankfurt a. M., Sandweg 82 II
Publication of DE49115C publication Critical patent/DE49115C/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F22—STEAM GENERATION
    • F22B—METHODS OF STEAM GENERATION; STEAM BOILERS
    • F22B37/00—Component parts or details of steam boilers
    • F22B37/02—Component parts or details of steam boilers applicable to more than one kind or type of steam boiler
    • F22B37/26—Steam-separating arrangements
    • F22B37/30—Steam-separating arrangements using impingement against baffle separators

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Thermal Sciences (AREA)
  • Mechanical Engineering (AREA)
  • General Engineering & Computer Science (AREA)
  • Drying Of Solid Materials (AREA)

Description

Hierzu 1 Blatt Zeichnungen.1 sheet of drawings.

BERLIN. GEDRUCKT IN DER REICHSDRUCKEREI.BERLIN. PRINTED IN THE REICH PRINTING COMPANY.

Claims (1)

Patent-Anspruch:Patent claim: In einem geschlossenen Behälter (A), Fig. 1 und 2-, die Anordnung des cylindrischen, durchlochten Einsatzes (B) mit Abschlufstrichter, bezw. flach gewölbtem Boden (C) und mit auf ersterem befestigten Scheiben (4, 5 und 6), Fig. ι, oder, wie in Fig. 2, an dem Einsatz (B) befindlichen, sowie die im Trichter (D), Fig. 1, befestigten Ringeinsätze (1, 2 und 3), bezw. die an der Innenwand des Behälters (A), Fig. 2, angebrachten Scheiben gleicher Bezeichnung.In a closed container (A), Fig. 1 and 2-, the arrangement of the cylindrical, perforated insert (B) with final funnel, respectively. Flat arched bottom (C) and with disks (4, 5 and 6) attached to the former, Fig. ι, or, as in Fig. 2, located on the insert (B) , as well as those in the funnel (D), Fig. 1, attached ring inserts (1, 2 and 3), respectively. the disks of the same name attached to the inner wall of the container (A), Fig. 2.
DENDAT49115D Steam dryer Expired - Lifetime DE49115C (en)

Publications (1)

Publication Number Publication Date
DE49115C true DE49115C (en)

Family

ID=324061

Family Applications (1)

Application Number Title Priority Date Filing Date
DENDAT49115D Expired - Lifetime DE49115C (en) Steam dryer

Country Status (1)

Country Link
DE (1) DE49115C (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2737261A (en) * 1952-09-15 1956-03-06 Farr Co Multiple stage separator
US2937712A (en) * 1958-09-22 1960-05-24 James H Woods Air de-contaminator
DE102008053596A1 (en) 2008-10-15 2010-04-22 Gebr. Schmid Gmbh & Co. Method for cleaning wafer block, involves dissecting wafer block in individual thin wafers, where wafer block has wafers held on carrier device, where wafer block is driven in cleaning device, and wafer block is moved on transport level

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2737261A (en) * 1952-09-15 1956-03-06 Farr Co Multiple stage separator
US2937712A (en) * 1958-09-22 1960-05-24 James H Woods Air de-contaminator
DE102008053596A1 (en) 2008-10-15 2010-04-22 Gebr. Schmid Gmbh & Co. Method for cleaning wafer block, involves dissecting wafer block in individual thin wafers, where wafer block has wafers held on carrier device, where wafer block is driven in cleaning device, and wafer block is moved on transport level

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