DE4294247T1 - Two-layer etching process - Google Patents

Two-layer etching process

Info

Publication number
DE4294247T1
DE4294247T1 DE19924294247 DE4294247T DE4294247T1 DE 4294247 T1 DE4294247 T1 DE 4294247T1 DE 19924294247 DE19924294247 DE 19924294247 DE 4294247 T DE4294247 T DE 4294247T DE 4294247 T1 DE4294247 T1 DE 4294247T1
Authority
DE
Germany
Prior art keywords
etching process
layer etching
layer
etching
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
DE19924294247
Other languages
German (de)
Inventor
Alan L Sidman
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Digital Equipment Corp
Original Assignee
Digital Equipment Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Digital Equipment Corp filed Critical Digital Equipment Corp
Publication of DE4294247T1 publication Critical patent/DE4294247T1/en
Withdrawn legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23F—NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
    • C23F1/00—Etching metallic material by chemical means
    • C23F1/44—Compositions for etching metallic material from a metallic material substrate of different composition
    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
    • G11B5/127—Structure or manufacture of heads, e.g. inductive
    • G11B5/31—Structure or manufacture of heads, e.g. inductive using thin films
    • G11B5/3163—Fabrication methods or processes specially adapted for a particular head structure, e.g. using base layers for electroplating, using functional layers for masking, using energy or particle beams for shaping the structure or modifying the properties of the basic layers

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Weting (AREA)
  • ing And Chemical Polishing (AREA)
DE19924294247 1991-11-25 1992-11-24 Two-layer etching process Withdrawn DE4294247T1 (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US79753991A 1991-11-25 1991-11-25

Publications (1)

Publication Number Publication Date
DE4294247T1 true DE4294247T1 (en) 1994-01-13

Family

ID=25171128

Family Applications (1)

Application Number Title Priority Date Filing Date
DE19924294247 Withdrawn DE4294247T1 (en) 1991-11-25 1992-11-24 Two-layer etching process

Country Status (3)

Country Link
DE (1) DE4294247T1 (en)
GB (1) GB2267256A (en)
WO (1) WO1993011532A1 (en)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1273664A (en) * 1998-07-13 2000-11-15 皇家菲利浦电子有限公司 Method of manufacturing thin-film magnetic head
US20040112868A1 (en) 2002-12-13 2004-06-17 Phipps Peter Beverley Powell Etchant solution for removing a thin metallic layer

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4481071A (en) * 1983-12-29 1984-11-06 International Business Machines Corporation Process of lift off of material
US5059278A (en) * 1990-09-28 1991-10-22 Seagate Technology Selective chemical removal of coil seed-layer in thin film head magnetic transducer

Also Published As

Publication number Publication date
GB9314080D0 (en) 1993-09-01
WO1993011532A1 (en) 1993-06-10
GB2267256A (en) 1993-12-01

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Legal Events

Date Code Title Description
8139 Disposal/non-payment of the annual fee