DE4293400T1 - Photosensitive resin composition - Google Patents
Photosensitive resin compositionInfo
- Publication number
- DE4293400T1 DE4293400T1 DE19924293400 DE4293400T DE4293400T1 DE 4293400 T1 DE4293400 T1 DE 4293400T1 DE 19924293400 DE19924293400 DE 19924293400 DE 4293400 T DE4293400 T DE 4293400T DE 4293400 T1 DE4293400 T1 DE 4293400T1
- Authority
- DE
- Germany
- Prior art keywords
- resin composition
- photosensitive resin
- photosensitive
- composition
- resin
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Withdrawn
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP26270491A JPH0695379A (en) | 1991-09-14 | 1991-09-14 | Photosensitive resin composition |
JP26270391A JPH0683052A (en) | 1991-09-14 | 1991-09-14 | Photosensitive resin composition |
JP26270191A JPH0572735A (en) | 1991-09-14 | 1991-09-14 | Photosensitive resin composition |
Publications (1)
Publication Number | Publication Date |
---|---|
DE4293400T1 true DE4293400T1 (en) | 1993-10-07 |
Family
ID=27335155
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE19924293400 Withdrawn DE4293400T1 (en) | 1991-09-14 | 1992-09-11 | Photosensitive resin composition |
Country Status (2)
Country | Link |
---|---|
DE (1) | DE4293400T1 (en) |
WO (1) | WO1993006529A1 (en) |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6558875B1 (en) | 1999-07-27 | 2003-05-06 | Mitsubishi Chemical Corporation | Method for treating photosensitive lithographic printing plate |
Family Cites Families (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS60121444A (en) * | 1983-12-06 | 1985-06-28 | Nippon Soda Co Ltd | Alkali-developable photosensitive resin composition |
JPS62121445A (en) * | 1985-11-21 | 1987-06-02 | Kuraray Co Ltd | Photosensitive composition |
DE3619129A1 (en) * | 1986-06-06 | 1987-12-10 | Basf Ag | LIGHT SENSITIVE RECORDING ELEMENT |
JP2678761B2 (en) * | 1988-02-27 | 1997-11-17 | 日本合成化学工業株式会社 | Image forming method |
-
1992
- 1992-09-11 DE DE19924293400 patent/DE4293400T1/en not_active Withdrawn
- 1992-09-11 WO PCT/JP1992/001166 patent/WO1993006529A1/en active Application Filing
Also Published As
Publication number | Publication date |
---|---|
WO1993006529A1 (en) | 1993-04-01 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
8180 | Miscellaneous part 1 |
Free format text: ALS MITANMELDER IST NACHZUTRAGEN: IBIDEN CO., LTD., OGAKI, GIFU, JP |
|
8130 | Withdrawal |